Linear evaporation source and deposition apparatus having the same

1. A linear evaporation source comprising:

a crucible having a length in a length direction and a width in a width direction, the crucible comprising an internal space between at least two length sides, being open on one side thereof, and configured to store a deposition material; and

a plurality of partitions dividing the internal space of the crucible into a plurality of internal spaces, wherein each of the partitions extends between the two length sides and has at least one opening substantially centered between the two length sides in a lower portion thereof and at least one stepped recess formed substantially above and separated from the at least one opening by a portion of the partition;

wherein for each partition, a width of the at least one stepped recess in the width direction is greater than a width of the at least one opening in the width direction.

2. The linear evaporation source according to claim 1 , wherein each partition comprises a bottom surface, and the at least one opening of each partition is separated from the bottom surface of each partition.

3. The linear evaporation source according to claim 2 , wherein a first distance between the at least one opening of each partition and the at least one stepped recess of each partition is longer than a second distance between the at least one opening of each partition and the bottom surface of each partition.

4. The linear evaporation source according to claim 1 , wherein the at least one opening of each partition has a rectangular shape.

5. The linear evaporation source according to claim 4 , wherein the rectangular shape has a length in a length direction and a width in a width direction, and

the length of the rectangular shape is longer than the width of the rectangular shape.

6. The linear evaporation source according to claim 1 , further comprising a nozzle section located on the open side of the crucible and comprising a plurality of nozzles.

7. The linear evaporation source according to claim 6 , wherein the at least one stepped recess of each partition faces the nozzle section located on the open side of the crucible.

8. The linear evaporation source according to claim 6 , wherein an evaporated deposition material is sprayed through each nozzle of the plurality of nozzles, and each nozzle corresponds to a corresponding one of the plurality of internal spaces divided by the plurality of partitions.

9. The linear evaporation source according to claim 1 , further comprising a heater configured to heat the crucible.

10. The linear evaporation source according to claim 9 , wherein the heater is located at sides of the crucible when the crucible has the open side.

11. A deposition apparatus comprising:

a process chamber;

an evaporation source located inside the process chamber and configured to contain and spray a deposition material onto a substrate; and

a substrate holder located inside the process chamber and configured to hold the substrate, wherein the substrate holder is spaced apart from the evaporation source, and

wherein the evaporation source comprises i) a crucible having a length in a length direction and a width in a width direction, the crucible comprising an internal space between at least two length sides, being open on one side thereof, and configured to store the deposition material, and ii) a plurality of partitions dividing the internal space of the crucible into a plurality of internal spaces, wherein each of the partitions extends between the two length sides and has at least one opening substantially centered between the two length sides in a lower portion thereof and at least one stepped recess formed substantially above and separated from the at least one opening by a portion of the partition,

wherein for each partition, a width of the at least one stepped recess in the width direction is greater than a width of the at least one opening in the width direction.

12. The deposition apparatus according to claim 11 , wherein each partition comprises a bottom surface, and the at least one opening of each partition is separated from the bottom surface of each partition.

13. The deposition apparatus according to claim 12 , wherein a first distance between the at least one opening of each partition and the at least one stepped recess of each partition is longer than a second distance between the at least one opening of each partition and the bottom surface of each partition.

14. The deposition apparatus according to claim 11 , wherein the at least one opening of each partition has a rectangular shape.

15. The deposition apparatus according to claim 14 , wherein the rectangular shape has a length in a length direction and a width in a width direction, and

the length of the rectangular shape is longer than the width of the rectangular shape.

16. The deposition apparatus according to claim 11 , wherein the evaporation source further comprises a nozzle section located at the open side of the crucible and comprising a plurality of nozzles.

17. The deposition apparatus according to claim 16 , wherein the at least one stepped recess of each partition faces the nozzle section located at the open side of the crucible.

18. The deposition apparatus according to claim 16 , wherein an evaporated deposition material is sprayed through each nozzle of the plurality of nozzles, and each nozzle corresponds to a corresponding one of the plurality of internal spaces divided by the plurality of partitions.

19. The deposition apparatus according to claim 11 , wherein the evaporation source further comprises a heater configured to heat the crucible.

20. The deposition apparatus according to claim 19 , wherein the heater is located at sides of the crucible when the crucible has the open side.