IP Library Granted Patent US 10,854,653
Granted Patent B2
US 10,854,653 · App. 16/460,715 · Granted Dec 1, 2020

Imaging systems with improved near-infrared detection pixels

Inventors: Stanley Micinski (Meridian, ID); Swarnal Borthakur (Boise, ID)
Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
H01L27/14629H01L27/14603H01L27/14621H01L27/14627H01L27/14649
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,854,653
App. No.
16/460,715
Granted
Dec 1, 2020
Kind
B2
Abstract

An imaging device may have an array of image sensor pixels that includes infrared image pixels. Backside and frontside reflectors may be incorporated into the infrared pixels to increase effective thicknesses of photosensitive regions within the pixels. In other words, light incident on each pixel may be reflected and traverse the photosensitive region multiple times, thereby allowing silicon in the photosensitive region to absorb infrared light more efficiently. The backside reflector may be interposed between the silicon and a microlens, which may have a toroidal shape to direct light around the backside reflector. If desired, the toroidal lens may have a concave opening. Alternatively, the backside reflector may be ring-shaped, and a spherical microlens may focus light through a center portion of the reflector. A top surface of the silicon layer may be curved to focus light toward the center of the photosensitive region and improve pixel efficiency.

Claims (34)

1. An image sensor pixel configured to generate charge in response to incident light, the image sensor pixel comprising:

a semiconductor layer having opposing first and second surfaces, wherein the incident light passes through the first surface, wherein the semiconductor layer is formed from silicon, and wherein the first surface of the silicon layer is curved to form a silicon lens that is configured to focus light toward a center portion of the silicon layer;

first and second reflectors, wherein the semiconductor layer is interposed between the first and second reflectors; and

a microlens that is configured to direct light into the semiconductor layer.

2. The image sensor pixel defined in claim 1 further comprising a color filter interposed between the first surface of the semiconductor layer and the microlens, wherein the first reflector is a backside reflector.

3. The image sensor pixel defined in claim 2 wherein a portion of the first surface of the semiconductor forms a recess and wherein at least a portion of the backside reflector extends into the recess.

4. The image sensor pixel defined in claim 2 further comprising a dielectric layer coupled to the second surface of the semiconductor layer, wherein the second reflector is a frontside reflector embedded in the dielectric layer.

5. The image sensor pixel defined in claim 4 wherein the microlens is a toroidal microlens and wherein the toroidal microlens is configured to direct the light around the backside reflector and into the semiconductor layer.

6. The image sensor pixel defined in claim 5 further comprising a planarization layer between the toroidal microlens and the color filter, wherein the planarization layer has an opening, and wherein the opening in the planarization layer and a central opening in the toroidal microlens form a concave structure to focus light around the backside reflector and into the semiconductor layer.

7. The image sensor pixel defined in claim 4 wherein the backside reflector is a ring-shaped backside reflector and wherein the microlens is a spherical microlens that is configured to direct the light through a center portion of the ring-shaped backside reflector and into the semiconductor layer.

8. The image sensor pixel defined in claim 1 further comprising:

third and fourth reflectors formed on side surfaces of the semiconductor layer, wherein the third and fourth reflectors are selected from the group consisting of: backside deep trench isolation reflectors and frontside deep trench isolation reflectors.

9. The image sensor pixel defined in claim 1 wherein the first and second reflectors are formed from material selected from the group consisting of: tungsten, aluminum, titanium, titanium nitride, tantalum, tantalum nitride, ceramic, and polymer.

10. The image sensor pixel defined in claim 1 wherein the silicon lens has a portion that forms a recess and wherein at least a portion of the first reflector extends into the recess.

11. An array of image sensor pixels that are configured to generate charge in response to incident light, the array of image sensor pixels comprising:

first image sensor pixels that are configured to generate charge in response to light of a first color;

second image sensor pixels that are configured to generate charge in response to light of a second color;

infrared image sensor pixels that are configured to generate charge in response to infrared light, wherein each of the infrared image sensor pixels comprises:

a semiconductor layer having opposing first and second surfaces, wherein the incident light passes through the first surface,

a frontside reflector and a backside reflector, wherein the semiconductor layer is interposed between the frontside reflector and the backside reflector, and

a microlens that overlaps the semiconductor layer, the frontside reflector, and the backside reflector and that is configured to direct light into the semiconductor layer; and

third image sensor pixels that are configured to generate charge in response to light of a third color, wherein the first, second, third, and infrared image sensor pixels are arranged in a two-by-two unit cell that repeats across the array of image sensor pixels.

12. The array of image sensor pixels defined in claim 11 wherein at least one of the first, second, and third image sensor pixels do not have backside reflectors.

13. The array of image sensor pixels defined in claim 12 wherein the first color is red, the second color is blue, and the third color is green.

14. The array of image sensor pixels defined in claim 11 wherein the semiconductor layer is a silicon layer and wherein the first surface of the silicon layer is curved to form a lens that directs light toward a center portion of the silicon layer.

15. The array of image sensor pixels defined in claim 11 wherein each of the first and second image sensor pixels comprises a semiconductor layer and wherein the semiconductor layers of the first, second, and infrared image sensor pixels are less than five microns thick.

16. An image sensor pixel that is configured to generate charge in response to infrared light, the image sensor pixel comprising:

a photosensitive region having opposing first and second surfaces, wherein a portion of the first surface of the photosensitive region forms a recess;

a toroidal microlens overlapping the photosensitive region;

a first reflector interposed between the toroidal microlens and the first surface of the photosensitive region, wherein at least a portion of the first reflector extends into the recess; and

a second reflector adjacent to the second surface of the photosensitive region.

17. The image sensor pixel defined in claim 16 wherein the photosensitive region further comprises edge surfaces that extend from the first surface to the second surface, the image sensor pixel further comprising:

third and fourth reflectors on at least some of the edge surfaces of the photosensitive region.

18. The image sensor pixel defined in claim 16 wherein the first surface of the photosensitive region is curved to form a lens that is configured to direct light toward a center portion of the photosensitive region.

Assignments (4)
RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT REEL 051145, FRAME 0062 Recorded Jun 23, 2023
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
Reel/Frame 064079/0474 →
CORRECTIVE ASSIGNMENT TO CORRECT THE EXCLUSION OF FAIRCHILD SEMICONDUCTOR CORPORATION OF CONVEYING PARTY PREVIOUSLY RECORDED ON REEL 051145 FRAME 0062. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Dec 3, 2019
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 051170/0781 →
SECURITY INTEREST Recorded Nov 26, 2019
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 051145/0062 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 2, 2019
From: MICINSKI, STANLEY; BORTHAKUR, SWARNAL
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 049657/0875 →