Polishing liquid and polishing method
A polishing liquid is provided containing manganese oxide abrasive grains, permanganate ions, and a cellulosic surfactant or a cationic surfactant. The polishing liquid has a pH of 5 or more and 11 or less. The cellulosic surfactant is preferably a carboxymethyl cellulose or a derivative thereof. The cationic surfactant preferably has a quaternary ammonium ion site. The content of the cellulosic surfactant or the cationic surfactant is preferably 0.01 mass % or more and 1.0 mass % or less based on the total amount of the polishing liquid.
1. A polishing method comprising a step of polishing a silicon carbide substrate with a polishing liquid, wherein the polishing liquid comprises:
manganese dioxide (MnO 2 ) abrasive grains having a zeta potential of −28 mV or less and −100 mV or more;
permanganate ions; and
a carboxymethyl cellulose or a derivative thereof,
wherein the polishing liquid has a pH of 5 or more and 11 or less,
wherein a degree of etherification of the carboxymethyl cellulose or the derivative thereof is in a range of 0.3 to 0.8,
wherein the manganese dioxide (MnO 2 ) abrasive grains have a particle size at 50% cumulative volume percentage of 0.1 μm or more and 5.0 μm or less in a particle size distribution determined by a laser diffraction/scattering method,
wherein a content of manganese dioxide (MnO 2 ) abrasive grains in the polishing liquid is 0.1 mass % or more and 10 mass % or less,
wherein a content of permanganate ions in the polishing liquid is 0.1 mass % or more and 20.0 mass % or less, and
wherein a content of a carboxymethyl cellulose or a derivative thereof in the polishing liquid is 0.01 mass % or more and 1.0 mass % or less.