Vapor deposition mask
A first region of a valid portion formed on a mask sheet has a shape corresponding to a shape of each of active regions and provided for each active region of a vapor target substrate. A second region of the valid portion is located outside of the first region, and includes a plurality of vapor deposition holes (H) covered with a hauling sheet.
1. A vapor deposition mask configured to be used to vapor-deposit a vapor-deposition layer on each of pixels of a vapor target substrate provided with a plurality of active regions on which the pixels contributing to displaying are arranged, the vapor deposition mask comprising:
a mask sheet provided with a valid portion extending across the plurality of active regions and including a plurality of vapor deposition holes formed to be arranged; and
a plurality of hauling sheets configured to support the mask sheet,
wherein the valid portion includes a first region and a second region,
the first region has a shape corresponding to a shape of each of the plurality of active regions, and is provided for each of the plurality of active regions,
the second region defines a shape of the first region, and overlaps with the plurality of hauling sheets to cause a portion of the plurality of vapor deposition holes to be covered, and
a region of the valid portion between hauling sheets located at both ends has a constant width,
the mask sheet includes a region having a width gradually increasing outward in a region outside of the region of the valid portion having a constant width, and
the region having the width gradually increasing outward overlaps with the plurality of hauling sheets.
2. The vapor deposition mask according to claim 1 ,
wherein the plurality of hauling sheets extend in a direction perpendicular to an extending direction of the valid portion.
3. The vapor deposition mask according to claim 1 ,
wherein the plurality of hauling sheets are in contact with a second surface of the mask sheet located on an opposite side to a first surface facing the vapor target substrate.
4. The vapor deposition mask according to claim 1 ,
wherein a pitch at which a plurality of vapor deposition holes present in the second region are arranged is an integral multiple of a pitch at which a plurality of vapor deposition holes present in the first region are arranged.
5. The vapor deposition mask according to claim 1 ,
wherein a width between the first regions is an integral multiple of a pitch of the plurality of vapor deposition holes.
6. The vapor deposition mask according to claim 1 , further comprising:
at least one cover sheet which fills a gap between the mask sheet and an additional mask sheet adjacent to the mask sheet.