Charged particle beam device
The purpose of the present invention is to provide a charged particle beam device which suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature different from the suctioning surface. Proposed is a charged particle beam device which has an electrostatic chuck mechanism, the charged particle beam device being provided with: a stage ( 200 ) which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam; an insulating body ( 203 ) which is disposed on the stage and constitutes a dielectric layer of the electrostatic chuck; a first support member ( 402 ) which supports the insulating body on the stage; a ring-shaped electrode ( 400 ) which encloses the surroundings of the sample and is installed on the insulating body in a contactless manner, and to which a predetermined voltage is applied; and a second support member ( 405 ) which supports the ring-shaped electrode.
1. A charged particle beam device including an electrostatic chuck mechanism, the charged particle beam device comprising:
a stage which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam;
an insulating body which is disposed on the stage and constitutes a dielectric layer of the electrostatic chuck;
a first support member which supports the insulating body on the stage;
a ring-shaped electrode which encloses the surroundings of the sample and is not in contact with the insulating body, and to which a predetermined voltage is applied; and
a second support member which supports the ring-shaped electrode at a position different from the first support member on the stage.
2. The charged particle beam device according to claim 1 , further comprising a control device which controls a power supply applying a voltage to the ring-shaped electrode, wherein
the control device applies a voltage corresponding to the irradiation position of the charged particle beam based on information stored in a storage medium.
3. The charged particle beam device according to claim 1 , wherein
the first support member and the second support member are columnar members disposed on the stage.
4. The charged particle beam device according to claim 1 , wherein
a ring-shaped plate-like body having a flat surface is disposed between the ring-shaped electrode and the second support member.
5. The charged particle beam device according to claim 4 , wherein
the ring-shaped plate-like body is formed of a material containing a ceramic.
6. A charged particle beam device including an electrostatic chuck mechanism, the charged particle beam device comprising:
a stage which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam;
a ceramic which is supported by a first support member at a first position on the stage and constitutes a dielectric layer of the electrostatic chuck; and
a ring-shaped electrode which is supported by a second support member at a second position different from the first position on the stage and encloses the surroundings of the sample, and to which a predetermined voltage is applied, wherein
the ring-shaped electrode is made of a mixture of aluminum and metal silicon.
7. The charged particle beam device according to claim 6 , wherein
the ring-shaped electrode is subjected to metal plating.
8. The charged particle beam device according to claim 7 , wherein
a metal used for the metal plating is nickel.
9. A charged particle beam device including an electrostatic chuck mechanism, the charged particle beam device comprising:
a stage which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam;
a ceramic which is supported by a first support member at a first position on the stage and constitutes a dielectric layer of the electrostatic chuck; and
a ring-shaped electrode which is supported by a second support member at a second position different from the first position on the stage and encloses the surroundings of the sample, and to which a predetermined voltage is applied, wherein
the ring-shaped electrode is subjected to metal plating.
10. The charged particle beam device according to claim 9 , wherein
a metal used for the metal plating is nickel.