IP Library › Granted Patent US 11,974,094
Granted Patent B2
US 11,974,094 · App. 16/475,506 · Granted Apr 30, 2024

MEMS microphone

Inventors: Junkai Zhan (Weifang, CN); Jun Li (Weifang, CN); Mengjin Cai (Weifang, CN)
Assignee: Goertek, Inc.
H04R19/04H04R7/04H04R19/005H04R2201/003
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Quick Facts
Patent No.
US 11,974,094
App. No.
16/475,506
Granted
Apr 30, 2024
Kind
B2
Abstract

A MEMS microphone is provided, comprising a substrate having a back cavity, and a plate capacitor structure arranged on the substrate, the plate capacitor structure being formed by a vibration diaphragm, a backplate and a support portion; wherein a pressure relief device is provided in the vibration diaphragm, a pressure maintaining channel is formed between the vibration diaphragm and the backplate; and the pressure relief device in the vibration diaphragm constitutes an inlet of the pressure maintaining channel.

Claims (8)

1. A MEMS microphone, comprising a substrate having a back cavity, and a plate capacitor structure arranged on the substrate, the plate capacitor structure being formed by a vibration diaphragm, a backplate and a support portion; wherein a pressure relief device is provided in the vibration diaphragm, a main pressure relief hole is provided in the backplate only at a position that is relatively away from the pressure relief device, the main pressure relief hole has a diameter between 5-10 μm, a pressure maintaining channel is formed between the vibration diaphragm and the backplate; the pressure maintaining channel is delimited by the vibration diaphragm and the backplate in an area between the pressure relief device and the main pressure relief hole, the pressure relief device in the vibration diaphragm constitutes an inlet of the pressure maintaining channel, and the main pressure relief hole constitutes an outlet of the pressure maintaining channel,

wherein the pressure relief device comprises a valve flap structure, the valve flap structure being located at a left side of the vibration diaphragm, and the main pressure relief hole is positioned solely at a right side of the backplate, such that a passage of the pressure maintaining channel is elongated.

2. The MEMS microphone of claim 1 , wherein the main pressure relief hole is distributed in an edge of the backplate in a circumferential direction.

3. The MEMS microphone of claim 1 , wherein the pressure relief device comprises a plurality of pressure relief devices evenly distributed in an edge of the vibration diaphragm.

4. The MEMS microphone of claim 1 , wherein the pressure relief device and the main pressure relief hole are arranged at two opposite ends of the vibration diaphragm and the backplate respectively.

5. The MEMS microphone of claim 1 , wherein auxiliary pressure relief holes are further formed in the backplate in addition to the main pressure relief holes, and the diameters of the auxiliary pressure relief holes are smaller than the diameter of the main pressure relief hole.

6. The MEMS microphone of claim 5 , wherein the auxiliary relief holes in the backplate which are located in an area of the pressure maintaining channel has a diameter between 2.5-5 μm.

7. The MEMS microphone of claim 6 , wherein the auxiliary pressure relief holes are distributed at a distance to the pressure relief device within a range of 50 μm.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2020
From: GOERTEK, INC.
To: WEIFANG GOERTEK MICROELECTRONICS CO., LTD.
Reel/Frame 052846/0443 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 2, 2019
From: ZHAN, JUNKAI; LI, JUN; CAI, MENGJIN
To: GOERTEK, INC.
Reel/Frame 049654/0814 →
Priority Claims (1)
CN 201720106652.2 · Jan 25, 2017 · national
Continuity (1)
Related Publication 20230199406A1 · Jun 22, 2023