High responsivity high bandwidth photodiode and method of manufacture

1. A high responsivity, high bandwidth photodiode, comprising:

at least one substrate;

at least one n+ type layer formed on the at least one substrate and configured to receive at least a portion of at least one incident optical signal from the at least one substrate;

at least one supplemental layer formed on the at least one n+ type layer and configured to receive at least a portion of the incident optical signal from the at least one n+ type layer;

at least one absorbing layer formed on the at least one supplemental layer and configured to receive at least a portion of the at least one incident optical signal from the at least one supplemental layer; and

at least one angled facet formed on the at least one substrate, the at least one angled facet configured to direct at least a portion of the at least one incident optical signal to at least one of the at least one n+ type layer, the at least one supplemental layer, and the at least one absorbing layer at an angle of incidence A, between 55° and 89° relative to an optical axis A o that normal to a surface of the at least one substrate.

2. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one substrate is manufactured from InP.

3. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one substrate is manufactured from at least one material selected from the group consisting of GaAs, Ge, and Si, GaN.

4. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one substrate has an index of refraction ranging from 3.0 to 4.5.

5. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one substrate has an index of refraction ranging from 3.10 to 3.30.

6. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one angled facet formed on the at least one substrate comprises at least one polished surface.

7. The high responsivity, high bandwidth photodiode of claim 1 wherein the one angled facet formed on the at least one substrate includes at least one anti-reflective coating applied thereto.

8. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one angled facet formed on the at least one substrate is configured to refract at least one incident optical signal to at least one of the at least one n+ type layer, at least one supplemental layer, and at least one absorbing layer.

9. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one n+ type layer has an index of refraction ranging from 2.75 to 4.00.

10. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one n+ type layer has an index of refraction ranging from 3.10 to 3.35.

11. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one n+ type layer has an index of refraction ranging from 3.25 to 3.30.

12. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one supplemental layer has an index of refraction ranging from 3.00 to 4.0.

13. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one supplemental layer has an index of refraction ranging from 3.25 to 3.75.

14. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one supplemental layer has an index of refraction ranging from 3.30 to 3.60.

15. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one supplemental layer is applied to the at least one n+ type layer and to the at least one absorbing layer.

16. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one absorbing layer has an index of refraction ranging from 3.00 to 4.00.

17. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one absorbing layer has an index of refraction ranging from 3.50 to 3.75.

18. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one absorbing layer has an index of refraction ranging from 3.60 to 3.70.

19. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one absorbing layer is manufactured from InGaAs+.

20. The high responsivity, high bandwidth photodiode of claim 1 wherein the at least one absorbing layer is manufactured from at least one material selected from the group consisting of GaAs, Ge, Si, PbSe, InAs, PbS, HgCdTe, HgCdZnTe, InAs, InSb, and AgOCs, InGaAsP, and InAlAsP.

21. The high responsivity, high bandwidth photodiode of claim 1 further comprising at least one p+ type layer formed on at least one of the at least one absorbing layer and the at least one supplemental layer, the at least one p+ type layer configured to receive at least a portion of the at least one incident optical signal from at least one of the at least one absorbing layer and the at least one supplemental layer.

22. The high responsivity, high bandwidth photodiode of claim 21 wherein the at least one p+ type layer has an index of refraction ranging from 3.00 to 3.50.

23. The high responsivity, high bandwidth photodiode of claim 21 wherein the at least one p+ type layer has an index of refraction ranging from 3.15 to 3.30.

24. The high responsivity, high bandwidth photodiode of claim 21 wherein at least one of the at least one n+ type layer, the at least one supplemental layer, and the at least one p+ type layer is manufactured from InP.

25. The high responsivity, high bandwidth photodiode of claim 21 wherein the at least one of the at least one n+ type layer, the at least one supplemental layer, and the at least one p+ type layer is manufactured from InGaAsP.

26. The high responsivity, high bandwidth photodiode of claim 21 further comprising at least one additional layer applied to the at least one p+ type layer, wherein the at least one additional layer is configured to reflect the at least one incident optical signal toward the at least one absorbing layer.

27. The high responsivity, high bandwidth photodiode of claim 26 wherein the at least one additional layer has an index of refraction from 1.00 to 2.5.

28. The high responsivity, high bandwidth photodiode of claim 26 wherein the at least one additional layer comprises multiple layers of materials, wherein at least one of the at least one additional layers is manufactured from a metal.

29. The high responsivity, high bandwidth photodiode of claim 1 further comprising at least one metal layer applied to at least one of the at least one absorbing layer and at least one supplemental layer, wherein the high responsivity, high bandwidth photodiode is configured using a Schottky architecture.

30. The high responsivity, high bandwidth photodiode of claim 29 wherein the at least one metal layer comprises gold.

31. The high responsivity, high bandwidth photodiode of claim 29 wherein the at least one metal layer is selected from the group consisting of silver, copper, and conductive alloys.

32. A high responsivity, high bandwidth photodiode, comprising:

at least one substrate having an index of refraction from 3.10 to 3.35;

at least one n+ type layer formed on the at least one substrate and configured to receive at least a portion of at least one incident optical signal from the at least one substrate, the at least one n+ type layer having an index of refraction from 3.10 to 3.35;

at least one supplemental layer formed on the at least one n+ type layer and configured to receive at least a portion of the at least one incident optical signal from the at least one n+ type layer, the at least one supplemental layer having an index of refraction from 3.30 to 3.60;

at least one absorbing layer formed on the at least one supplemental layer and configured to receive at least a portion of the incident optical signal from the at least one supplemental layer, the at least one absorbing layer having an index of refraction from 3.55 to 3.75; and

at least one angled facet formed on the at least one substrate, the at least one angled facet configured to direct at least a portion of the at least one incident optical signal to at least one of the at least one n+ type layer, the at least one supplemental layer, and the at least one absorbing layer at an angle of incidence A i between 55° and 89° relative to an optical axis A o that normal to a surface of the at least one substrate.

33. A high responsivity, high bandwidth photodiode of claim 32 further comprising at least one p+ type layer applied to at least one of the at least one absorbing layer and the at least one supplemental layer, the at least one p+ type layer having an index of refraction ranging from 3.15 to 3.30, the at least one p+ type layer configured to receive at least a portion of the incident optical signal from at least one of the at least one absorbing layer and the at least one supplemental layer.

34. A high responsivity, high bandwidth photodiode of claim 32 further comprising at least one metal layer applied to at least one of the at least one absorbing layer and at least one supplemental layer, wherein the high responsivity, high bandwidth photodiode is configured using a Schottky architecture.

35. A high responsivity, high bandwidth photodiode of claim 32 further comprising at least one n-ohmic device in communication with at least one of the at least one n+ type layer and the at least one supplemental layer.

36. A high responsivity, high bandwidth photodiode of claim 32 further comprising at least one p-ohmic device in communication with at least one of the at least one p+ type layer and the at least one supplemental layer.

37. The high responsivity, high bandwidth photodiode of claim 32 wherein the at least one supplemental layer is applied to the at least one n+ type layer and to the at least one absorbing layer.

38. A high responsivity, high bandwidth photodiode, comprising:

at least one substrate having an index of refraction from 3.10 to 3.35;

at least one n+ type layer formed on the at least one substrate and configured to receive at least a portion of at least one incident optical signal from the at least one substrate, the at least one n+ type layer having an index of refraction from 3.10 to 3.35;

at least one supplemental layer formed on the at least one n+ type layer and configured to receive at least a portion of the at least one incident optical signal from the at least one n+ type layer, the at least one supplemental layer having an index of refraction from 3.30 to 3.60;

at least one absorbing layer formed on the at least one supplemental layer and configured to receive at least a portion of the at least one incident optical signal from the at least one supplemental layer, the at least one absorbing layer having an index of refraction from 3.55 to 3.75;

at least one p+ type layer applied to at least one of the at least one absorbing layer and the at least one supplemental layer, the at least one p+ type layer having an index of refraction ranging from 3.15 to 3.30; and

at least one angled facet formed on the at least one substrate, the at least one angled facet configured to direct at least a portion of the at least one incident optical signal to at least one of the at least one n+ type layer, the at least one supplemental layer, the at least one absorbing layer, and the at least one p+ type layer at an angle of incidence A, between 55° and 89° relative to an optical axis A o that normal to a surface of the at least one substrate.

39. The high responsivity, high bandwidth photodiode of claim 38 wherein the at least one supplemental layer is applied to the at least one n+ type layer and to the at least one absorbing layer.

40. A high responsivity, high bandwidth photodiode, comprising:

at least one substrate;

at least one n+ type layer formed on the at least one substrate and configured to receive at least a portion of at least one incident optical signal from the at least one substrate;

at least one supplemental layer formed on the at least one n+ type layer and configured to receive at least a portion of the at least one incident optical signal from the at least one n+ type layer;

at least one absorbing layer formed on the at least one supplemental layer and configured to receive at least a portion of the incident optical signal from the at least one supplemental layer;

at least one p+ type layer formed on at least one of the at least one absorbing layer and the at least one supplemental layer, the at least one p+ type layer configured to receive at least a portion of the at least one incident optical signal from at least one of the at least one absorbing layer and the at least one supplemental layer;

at least one additional layer applied to the at least one p+ type layer, wherein the at least one additional layer is configured to reflect the at least one incident optical signal to the at least one absorbing layer so that the at least one incident optical signal traverses through the at least one absorbing layer for at least a second time; and

at least one angled facet formed on the at least one substrate, the at least one angled facet configured to direct at least a portion of the at least one incident optical signal to at least one of the at least one n+ type layer, the at least one supplemental layer, and the at least one absorbing layer at an angle of incidence A, between 55° and 89° relative to an optical axis A o that normal to a surface of the at least one substrate.

41. The high responsivity, high bandwidth photodiode of claim 40 , wherein the at least one incident optical signal received by reflection from the at least one additional layer is reflected by the at least one supplemental layer so that the at least one incident optical signal traverses through the at least one absorbing layer for at least a third time.