IP Library Granted Patent US 10,707,046
Granted Patent B2
US 10,707,046 · App. 16/480,405 · Granted Jul 7, 2020

Electron source and electron beam device using the same

Inventors: Toshiaki Kusunoki (Tokyo, JP); Keigo Kasuya (Tokyo, JP); Takashi Ohshima (Tokyo, JP); Tomihiro Hashizume (Tokyo, JP); Noriaki Arai (Tokyo, JP); Yoichi Ose (Tokyo, JP)
Assignee: Hitachi High-Tech Corporation
H01J37/073H01J37/20H01J2237/061
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,707,046
App. No.
16/480,405
Granted
Jul 7, 2020
Kind
B2
Abstract

An electron source that can be used stably for a long time even when hexaboride is used, and an electron beam device using the electron source are provided. The invention is directed to an electron source which includes a filament made of a metal, a metal tube that is fixed to the filament and has a plurality of recesses disposed at least in two axial directions so as to surround a central axis at an outer periphery, and a columnar hexaboride tip that emits an electron, is disposed so as to protrude from the inside of the metal tube to a side opposite to the filament, and is in contact with a bottom of each of the plurality of recesses of the metal tube.

Claims (44)

1. An electron source comprising:

a filament made of a metal;

a metal tube that is fixed to the filament and has a plurality of recesses disposed at least in two axial directions so as to surround a central axis at an outer periphery; and

a columnar hexaboride tip that emits an electron, is disposed so as to protrude from the inside of the metal tube to a side opposite to the filament, and is in contact with a bottom of each of the plurality of recesses of the metal tube.

2. The electron source according to claim 1 , wherein

the metal tube is joined to the filament by spot welding.

3. The electron source according to claim 1 , wherein

the metal tube has a plurality of other recesses at other positions of the metal tube in the axial direction, in addition to the plurality of recesses.

4. The electron source according to claim 1 , wherein

the hexaboride tip has a square pole shape, and

the plurality of recesses are formed in two axes and four directions with respect to the hexaboride tip having the square pole shape.

5. The electron source according to claim 1 , wherein

the hexaboride tip has a circular cylindrical shape, and

the plurality of recesses are formed in three axes and three directions with respect to the hexaboride tip having the circular cylindrical shape.

6. The electron source according to claim 1 , wherein

the metal tube is made of tantalum or niobium.

7. The electron source according to claim 1 , wherein

an inner diameter of the metal tube is in a range of 1.1 to 1.5 times the largest diameter of the hexaboride tip.

8. The electron source according to claim 1 , wherein

a thickness of the metal tube is in a range of 100 to 200 μm.

9. An electron beam device comprising:

an electron source;

a sample stand on which a sample is placed; and

an electron optical system for irradiating a sample on the sample stand with an electron emitted from the electron source, wherein

the electron source is the electron source according to claim 1 .

10. An electron source comprising:

a filament made of a metal;

a metal tube that is fixed to the filament and has a plurality of recesses disposed at least in two axial directions so as to surround a central axis at an outer periphery;

a graphite sheet or rhenium foil disposed inside the metal tube; and

a columnar hexaboride tip that emits an electron, is disposed so as to protrude from the inside of the metal tube to a side opposite to the filament, and is in contact with the graphite sheet or rhenium foil disposed at the bottom of each of the plurality of recesses of the metal tube.

11. An electron beam device comprising:

an electron source;

a sample stand on which a sample is placed; and

an electron optical system for irradiating a sample on the sample stand with an electron emitted from the electron source, wherein

the electron source is the electron source according to claim 10 .

12. An electron source comprising:

a filament made of a metal;

a metal tube that is fixed to the filament and has a plurality of recesses disposed at least in two axial directions so as to surround a central axis at an outer periphery; and

a columnar hexaboride tip that emits an electron, is disposed so as to protrude from the inside of the metal tube to a side opposite to the filament, and is coated with glassy carbon or a mixture of glassy carbon and boride carbon and is in contact with the plurality of recesses of the metal tube.

13. An electron beam device comprising:

an electron source;

a sample stand on which a sample is placed; and

an electron optical system for irradiating a sample on the sample stand with an electron emitted from the electron source, wherein

the electron source is the electron source according to claim 12 .

Assignments (2)
CHANGE OF NAME Recorded Apr 14, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052398/0249 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 25, 2019
From: KUSUNOKI, TOSHIAKI; KASUYA, KEIGO; OHSHIMA, TAKASHI; HASHIZUME, TOMIHIRO; ARAI, NORIAKI; OSE, YOICHI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 049856/0299 →
Priority Claims (1)
JP 2017-035882 · Feb 28, 2017 · national
Continuity (1)
Related Publication 20190385809A1 · Dec 19, 2019
Cited By (1)
US 12,525,420