IP Library Granted Patent US 11,127,772
Granted Patent B2
US 11,127,772 · App. 16/487,453 · Granted Sep 21, 2021

Sensor chip and electronic apparatus

Inventor: Akira Matsumoto (Kanagawa, JP)
Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
H01L27/14627H01L27/1464H01L27/14629H01L27/1463H01L27/14621H01L27/14623H01L27/14645
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Quick Facts
Patent No.
US 11,127,772
App. No.
16/487,453
Granted
Sep 21, 2021
Kind
B2
Abstract

The present disclosure relates to a sensor chip and an electronic apparatus each of which enables carriers generated through photoelectric conversion to be efficiently used. At least one or more avalanche multiplication regions multiplying carriers generated through photoelectric conversion are provided in each of a plurality of pixel regions in a semiconductor substrate, and light incident on the semiconductor substrate is condensed by an on-chip lens. Then, a plurality of on-chip lenses is arranged in one pixel region. The present technology, for example, can be applied to a back-illuminated type CMOS image sensor.

Claims (51)

1. A sensor chip, comprising:

a plurality of pixel regions;

a semiconductor substrate that includes an avalanche multiplication region configured to multiply carriers generated through photoelectric conversion of a light incident on the semiconductor substrate, wherein

the avalanche multiplication region is in each pixel region of the plurality of pixel regions;

a plurality of on-chip lenses on a first surface side of the semiconductor substrate, wherein

the plurality of on-chip lenses includes a first on-chip lens, a second on-chip lens, and a third on-chip lens in a pixel region of the plurality of pixel regions, and

each of the first on-chip lens, the second on-chip lens, and the third on-chip lens of the plurality of on-chip lenses is configured to condense the light incident on the semiconductor substrate; and

a wiring layer on a second surface side of the semiconductor substrate opposite to the first surface side, wherein

the wiring layer comprises a plurality of light-reflecting wirings including a first light-reflecting wiring, a second light-reflecting wiring, and a third light-reflecting wiring,

the second on-chip lens is at a central portion of each pixel region of the plurality of pixel regions,

the second light-reflecting wiring is at a position that corresponds to the second on-chip lens, and

the second light-reflecting wiring has a wider area than each of the first light-reflecting wiring and the third light-reflecting wiring.

2. The sensor chip according to claim 1 ,

wherein the sensor chip is of a back-illuminated type in which a back surface of the semiconductor substrate is illuminated with the light.

3. The sensor chip according to claim 1 , wherein the semiconductor substrate comprises silicon.

4. The sensor chip according to claim 1 , wherein the semiconductor substrate is configured to detect an infrared light.

5. The sensor chip according to claim 1 , wherein when the semiconductor substrate is viewed in plan, a number of on-chip lenses of the plurality of on-chip lenses in a longitudinal direction is equal to a number of on-chip lenses of the plurality of on-chip lenses in a transverse direction.

6. The sensor chip according to claim 1 , wherein each on-chip lens of the plurality of on-chip lenses has a same size.

7. The sensor chip according to claim 1 , further comprising an inner lens between the semiconductor substrate and the plurality of on-chip lenses,

wherein the inner lens is configured to condense, on a center of the pixel region, the light condensed by the plurality of on-chip lenses.

8. The sensor chip according to claim 1 , further comprising a band-pass filter between the semiconductor substrate and the plurality of on-chip lenses,

wherein the band-pass filter is configured to allow only light in a specific wavelength range to pass therethrough.

9. The sensor chip according to claim 1 , further comprising a light shielding film on a light illumination surface of the semiconductor substrate,

wherein the light shielding film surrounds the plurality of on-chip lenses in the pixel region.

10. The sensor chip according to claim 1 , further comprising an inter-lens partition on a light illumination surface of the semiconductor substrate,

wherein the inter-lens partition separates adjacent on-chip lenses of the plurality of on-chip lenses from each other.

11. The sensor chip according to claim 1 , further comprising:

a trench in the semiconductor substrate,

wherein the trench surrounds each pixel region of the plurality of pixel regions; and

an insulating film embedded in the trench.

12. The sensor chip according to claim 1 , further comprising:

a trench in the semiconductor substrate,

wherein the trench surrounds each pixel region of the plurality of pixel regions; and

a metal film embedded in the trench.

13. An electronic apparatus, comprising:

a sensor chip that includes:

a plurality of pixel regions;

a semiconductor substrate that includes an avalanche multiplication region configured to multiply carriers generated through photoelectric conversion of a light incident on the semiconductor substrate, wherein

the avalanche multiplication region is in each pixel region of the plurality of pixel regions;

a plurality of on-chip lenses on a first surface side of the semiconductor substrate, wherein

the plurality of on-chip lenses includes a first on-chip lens, a second on-chip lens, and a third on-chip lens in each pixel region of the plurality of pixel regions, and

each of the first on-chip lens, the second on-chip lens, and the third on-chip lens of the plurality of on-chip lenses is configured to condense the light incident on the semiconductor substrate; and

a wiring layer on a second surface side of the semiconductor substrate opposite to the first surface side, wherein

the wiring layer comprises a plurality of light-reflecting wirings including a first light-reflecting wiring, a second light-reflecting wiring, and a third light-reflecting wiring,

the second on-chip lens is at a central portion of each pixel region of the plurality of pixel regions,

the second light-reflecting wiring is at a position that corresponds to the second on-chip lens, and

the second light-reflecting wiring has a wider area than each of the first light-reflecting wiring and the third light-reflecting wiring.

14. The sensor chip according to claim 1 , wherein

the first light-reflecting wiring is at a position that corresponds to the first on-chip lens, and

the third light-reflecting wiring is at a position that corresponds to the third on-chip lens.

15. The sensor chip according to claim 1 , wherein the avalanche multiplication region is in a specific portion that corresponds to the central portion of each pixel region of the plurality of pixel regions.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 21, 2019
From: MATSUMOTO, AKIRA
To: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
Reel/Frame 050111/0534 →
Priority Claims (1)
JP JP2017-059100 · Mar 24, 2017 · national
Continuity (1)
Related Publication 20200066775A1 · Feb 27, 2020