IP Library Patent Application 16487566
Patent Application
App. No. 16/487,566

Charged Particle Beam Device

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Quick Facts
Patent No.
US None
App. No.
16/487,566
Abstract

The charged particle beam device includes a charged particle beam source which emits a primary charged particle beam, an objective lens which focuses the primary charged particle beam on a sample, a passage electrode which is formed of a metal material and is disposed between the charged particle beam source and a tip end of the objective lens, a detector which detects a secondary charged particle emitted from the sample, and an electrostatic field electrode which is electrically insulated from the passage electrode. The passage electrode is formed such that the primary charged particle beam passes through the inside of the passage electrode. The electrostatic field electrode is formed to cover an outer periphery of the passage electrode.

Claims (64)

1 . A charged particle beam device comprising:

a charged particle beam source which emits a primary charged particle beam;

an objective lens which focuses the primary charged particle beam on a sample;

a passage electrode which is formed of a metal material and is disposed between the charged particle beam source and a tip end of the objective lens;

a first detector which detects a secondary charged particle emitted from the sample; and

an electrostatic field electrode which is electrically insulated from the passage electrode, wherein

the passage electrode is formed such that the primary charged particle beam passes through an inside of the passage electrode, and

the electrostatic field electrode is formed to cover an outer periphery of the passage electrode.

2 . The charged particle beam device according to claim 1 , wherein

the electrostatic field electrode includes an aperture on a side wall, and

a sensitive surface of the first detector faces the aperture.

3 . The charged particle beam device according to claim 1 , wherein

the electrostatic field electrode is disposed on a side of the objective lens and a side of the charged particle source, respectively,

the electrostatic field electrode includes an aperture between the electrostatic field electrode on the side of the objective lens and the electrostatic field electrode on the side of the charged particle source, and

a sensitive surface of the first detector faces the aperture.

4 . The charged particle beam device according to claim 2 , wherein

the electrostatic field electrode includes a first electrostatic field electrode on a side including the aperture and a second electrostatic field electrode disposed between the first electrostatic field electrode and the passage electrode,

the passage electrode and the second electrostatic field electrode are electrically insulated, and

the first electrostatic field electrode is formed to cover an outer periphery of the second electrostatic field electrode.

5 . The charged particle beam device according to claim 1 , further comprising:

a first grid electrode which is disposed between the objective lens and the detector and has the same potential as the passage electrode.

6 . The charged particle beam device according to claim 4 , further comprising:

a high-resistance material in contact with the passage electrode and the second electrostatic field electrode.

7 . The charged particle beam device according to claim 6 , wherein

the high-resistance material has a resistance value of 10 13 Ω or less.

8 . The charged particle beam device according to claim 7 , further comprising:

a second grid electrode in contact with the second electrostatic field electrode.

9 . The charged particle beam apparatus according to claim 2 , wherein

the electrostatic field electrode includes a plurality of the apertures, and detectors are provided corresponding to each of the apertures.

10 . The charged particle beam device according to claim 3 , further comprising:

a plurality of detectors.

11 . The charged particle beam device according to claim 10 , further comprising:

a system which adds and/or subtracts signals obtained by the plurality of detectors.

12 . The charged particle beam device according to claim 2 , wherein

the sensitive face is a scintillator which converts the secondary charged particle into light

the first detector includes a photodetector which detects converted light,

the charged particle beam device includes a high voltage power supply which applies a positive voltage to the scintillator, and

a part of the secondary charged particle decelerated by the electrostatic field electrode via the positive voltage of the scintillator is deflected to the first detector.

13 . The charged particle beam device according to claim 1 , further comprising:

a deflector which deflects the secondary charged particle to the first detector.

14 . The charged particle beam device according to claim 1 , further comprising:

a second deflector which deflects the secondary charged particle between the passage electrode and the objective lens.

15 . The charged particle beam device according to claim 1 , further comprising:

a second detector between the first detector and the charged particle beam source to detect a part of the secondary charged particle not detected by the first detector.

16 . The charged particle beam device according to claim 15 , further comprising:

a conversion electrode which collides with the part of the secondary charged particle not detected by the first detector, wherein

the second detector detects a charged particle generated at the conversion electrode by a collision of the secondary charged particle.

17 . The charged particle beam device of claim 15 , further comprising:

a track control electrode between the second detector and the first detector.

18 . The charged particle beam device according to claim 1 , further comprising:

a display unit which displays a charged particle image, wherein

the display unit includes a first input unit which sets a gradation of brightness and/or contrast of the charged particle image and/or a second input unit which sets an energy band of the secondary charged particle detected by the detector.

19 . A charged particle beam device comprising:

a charged particle beam source which emits a primary charged particle beam;

an objective lens which focuses the primary charged particle beam on a sample,

a passage electrode which is formed of a metal material and is disposed between the charged particle beam source and a tip end of the objective lens;

a first detector which detects a secondary charged particle emitted from the sample; and

an electrostatic field electrode which is electrically insulated from the passage electrode, wherein

the primary charged particle beam passes through an inside of the passage electrode,

a deceleration space is formed between the passage electrode and the detector, which decelerates the secondary charged particle emitted from the sample to an potential extent of the sample,

a deflection field is formed in the deceleration space, and

a part of the secondary charged particle decelerated in the deceleration space is deflected to the detector by the deflection field.

20 . The charged particle beam device according to claim 19 , wherein

potential of the deceleration space is adjustable such that energy of the secondary charged particle detected by the first detector is 50 eV or less in the deceleration space.

Assignments (2)
CHANGE OF NAME Recorded Apr 14, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052398/0249 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 21, 2019
From: SATO, RYUJU; AGEMURA, TOSHIHIDE; NOMAGUCHI, TSUNENORI
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 050120/0333 →