Semiconductor body
A semiconductor body is disclosed. In an embodiment a semiconductor body includes a p-doped region, an active region, an intermediate layer and a layer stack containing indium, wherein an indium concentration in the layer stack changes along a stacking direction, wherein the layer stack is formed with exactly one nitride compound semiconductor material apart from dopants, wherein the intermediate layer is nominally free of indium, arranged between the layer stack and the active region, and directly adjoins the layer stack, wherein the intermediate layer and/or the layer stack are n-doped at least in places, wherein a dopant concentration of the layer stack is at least 5*10 17 1/cm 3 and at most 2*10 18 1/cm 3 , and wherein a dopant concentration of the intermediate layer is at least 2*10 18 1/cm 3 and at most 3*10 19 1/cm 3 .
1. A semiconductor body comprising:
a p-doped region;
an active region;
an intermediate layer; and
a layer stack containing indium,
wherein an indium concentration in the layer stack changes along a stacking direction,
wherein the layer stack is formed with exactly one nitride compound semiconductor material apart from dopants,
wherein the intermediate layer is nominally free of indium, arranged between the layer stack and the active region, and directly adjoins the layer stack,
wherein the intermediate layer and/or the layer stack are n-doped at least in places, and
wherein an indium concentration in a second region of the layer stack increases at least to a threshold value in a direction of the intermediate layer and decreases below the threshold value again in the layer stack only within a first region.
2. The semiconductor body according to claim 1 , wherein the second region of the layer stack directly adjoins the first region of the layer stack.
3. The semiconductor body according to claim 1 , wherein the active region is configured to generate or detect electromagnetic radiation.
4. The semiconductor body according to claim 1 , wherein a layer thickness of the layer stack in the stacking direction is at least 5 nm and less than 20 nm.
5. The semiconductor body according to claim 1 , wherein the indium concentration in the layer stack is less than 5%.