Optoelectronic component and method for producing an optoelectronic component
An optoelectronic component and a method for producing an optoelectronic component are disclosed. In an embodiment an optoelectronic component includes a semiconductor layer sequence having an active region configured to emit radiation, a dielectric layer, a solder layer including a first metal arranged on the dielectric layer and a seed layer arranged between the solder layer and the dielectric layer, wherein the seed layer includes the first metal and a second metal, wherein the second metal is less noble than the first metal, wherein an amount of the second metal in the seed layer is between 0.5 wt % and 10 wt %, and wherein the first metal is Au and the second metal is Zn.
1. A method for producing an optoelectronic component, the method comprising:
providing a semiconductor layer sequence having an active region for emitting radiation;
applying a dielectric layer to the semiconductor layer sequence;
applying a seed layer to the dielectric layer, wherein the seed layer comprises a first metal and a second metal, wherein the second metal is less noble than the first metal, wherein an amount of the second metal in the seed layer is between 0.5 wt % and 10 wt %, or a ratio of the first metal to the second metal in the seed layer is between 95:5 and 99:1; and
applying a solder layer comprising the first metal to the seed layer.
2. The method according to claim 1 , wherein the seed layer is reflective for the radiation generated in the active region.
3. The method according to claim 1 , wherein the first metal is Au and the second metal is Zn.
4. The method according to claim 1 , wherein the second metal is zinc, tin or aluminum.
5. The method according to claim 1 , wherein the seed layer is a monolayer layer.
6. The method according to claim 1 , wherein the seed layer is free of titanium.
7. The method according to claim 1 , wherein the first metal is Au, Ag, Pt or Cu.
8. The method according to claim 1 , further comprising:
applying a second dielectric layer to the seed layer in a structured manner before applying the solder layer;
covering the second dielectric layer with a photoresist layer, wherein the solder layer is applied to the seed layer;
exposing the photoresist layer; and
removing the photoresist layer so that depressions are formed up to the second dielectric layer or the dielectric layer.
9. The method according to claim 8 , wherein the second dielectric layer and regions of the seed layer, which are located below the second dielectric layer, are removed so that the depressions extend to the semiconductor layer sequence and/or an n-contacting and/or a p-contacting.
10. An optoelectronic component comprising:
a semiconductor layer sequence having an active region configured to emit radiation;
a dielectric layer;
a solder layer comprising a first metal arranged on the dielectric layer; and
a seed layer arranged between the solder layer and the dielectric layer,
wherein the seed layer comprises the first metal and a second metal, wherein the second metal is less noble than the first metal,
wherein an amount of the second metal in the seed layer is between 0.5 wt % and 10 wt %, and
wherein the first metal is Au and the second metal is Zn.
11. The optoelectronic component according to claim 10 , wherein the optoelectronic component comprises a plurality of light generation regions, each light generation region having a p-contacting and an n-contacting, and wherein the light generation regions are arranged in a matrix shape.
12. The optoelectronic component according to claim 10 , wherein the dielectric layer comprises a material which is selected from the group consisting of silicon oxide, silicon nitride, aluminum oxide, zirconium oxide, titanium oxide, yttrium oxide, and silicon.
13. The optoelectronic component according to claim 10 , further comprising an n-contacting and a p-contacting, wherein the dielectric layer provides isolation for the two contactings.
14. The optoelectronic component according to claim 10 , wherein the seed layer has a layer thickness of between 50 nm and 5000 nm inclusive.
15. The optoelectronic component according to claim 10 , wherein the seed layer is reflective for the radiation generated in the active region.
16. The optoelectronic component according to claim 10 , wherein the first metal of the solder layer is galvanically deposited.
17. The optoelectronic component according to claim 10 , wherein the seed layer is a monolayer layer.
18. The optoelectronic component according to claim 10 , wherein the seed layer is free of titanium.
19. An adaptive headlamp comprising:
the optoelectronic component according to claim 10 .
20. An optoelectronic component comprising:
a semiconductor layer sequence having an active region configured to emit radiation;
a dielectric layer;
a solder layer comprising a first metal arranged on the dielectric layer, the solder layer configured to create a bond between the semiconductor layer sequence and an external substrate; and
a seed layer arranged between the solder layer and the dielectric layer, the seed layer being directly adjacent to both the solder layer and the dielectric layer so that no further layers are arranged between the solder layer and the seed layer,
wherein the seed layer comprises the first metal and a second metal, wherein the second metal is less noble than the first metal,
wherein an amount of the second metal in the seed layer is between 0.5 wt % and 10 wt %, and
wherein the first metal is Au and the second metal is Zn.