IP Library Granted Patent US 11,262,640
Granted Patent B2
US 11,262,640 · App. 16/492,261 · Granted Mar 1, 2022

Nonlinear optical material

Inventors: P. Shiv Halasyamani (Houston, TX); Hongwei Yu (Houston, TX); Hongping Wu (Houston, TX); Weiguo Zhang (Houston, TX)
Assignee: UNIVERSITY OF HOUSTON SYSTEM
G02F1/3551C01F7/54C30B29/12C01P2002/20C01P2002/60C01P2002/80C01P2004/61
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,262,640
App. No.
16/492,261
Granted
Mar 1, 2022
Kind
B2
Abstract

A device comprising a nonlinear optical (NLO) material according to the formula XLi 2 Al 4 B 6 O 20 F. A device comprising a nonlinear optical material (NLO) according to the formula KSrCO 3 F, wherein the NLO comprises at least one single crystal. A nonlinear optical material selected from the group consisting of KSrCO 3 F Rb 3 Ba 3 Li 2 Al 4 B 6 O 20 F and K 3 Sr 3 Li 2 Al 4 B 6 O 20 F.

Claims (14)

1. A device comprising a nonlinear optical (NLO) material according to the formula XLi 2 Al 4 B 6 O 20 F.

2. The device of claim 1 , wherein X comprises potassium (K) and strontium (Sr).

3. The device of claim 1 , wherein X comprises K 3 Sr 3 .

4. The device of claim 1 , wherein X comprises rubidium (Rb) and barium (Ba).

5. The device of claim 1 , wherein X comprises Rb 3 Ba 3 .

6. The device of claim 1 , wherein the NLO exhibits a walkoff of from about 200 mrad to about 1 mrad.

7. The device of claim 1 , wherein the NLO forms single crystals with a minimum diameter of from about 2 mm to about 20 mm in at least two directions.

8. The device of claim 1 , wherein the NLO exhibits a second harmonic generation coefficient of greater than 0.39 pm/V.

9. The device of claim 1 , wherein the NLO exhibits a band gap of greater than 6.2 eV.

10. The device of claim 1 , wherein the NLO exhibits an adsorption edge of less than 200 nm.

11. The device of claim 1 , wherein the NLO exhibits a laser damage threshold of greater than 5.0 GW/cm 2 .

12. The device of claim 1 , wherein the NLO exhibits a birefringence at 1064 nm ranging from about 0.05 to about 0.09.

13. A nonlinear optical material selected from the group consisting of Rb 3 Ba 3 Li 2 Al 4 B 6 O 20 F and K 3 Sr 3 Li 2 Al 4 B 6 O 20 F.

14. A device comprising the nonlinear optical material of claim 13 .

Assignments (2)
CONFIRMATORY LICENSE Recorded Mar 3, 2025
From: UNIVERSITY OF HOUSTON
To: NATIONAL SCIENCE FOUNDATION
Reel/Frame 070388/0271 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 9, 2019
From: HALASYAMANI, P. SHIV; YU, HONGWEI; WU, HONGPING; ZHANG, WEIGUO
To: UNIVERSITY OF HOUSTON SYSTEM
Reel/Frame 050312/0001 →
Continuity (2)
Provisional Application 62469956 · Mar 10, 2017
Related Publication 20210200058A1 · Jul 1, 2021