IP Library Granted Patent US 10,892,270
Granted Patent B2
US 10,892,270 · App. 16/508,577 · Granted Jan 12, 2021

Semiconductor memory device having an array chip bonded to a circuit chip by a bonding metal

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Quick Facts
Patent No.
US 10,892,270
App. No.
16/508,577
Granted
Jan 12, 2021
Kind
B2
Abstract

According to one embodiment, the array chip includes a three-dimensionally disposed plurality of memory cells and a memory-side interconnection layer connected to the memory cells. The circuit chip includes a substrate, a control circuit provided on the substrate, and a circuit-side interconnection layer provided on the control circuit and connected to the control circuit. The circuit chip is stuck to the array chip with the circuit-side interconnection layer facing to the memory-side interconnection layer. The bonding metal is provided between the memory-side interconnection layer and the circuit-side interconnection layer. The bonding metal is bonded to the memory-side interconnection layer and the circuit-side interconnection layer.

Claims (59)

1. A semiconductor memory device comprising:

an array chip including

a three-dimensionally disposed plurality of memory cells,

a memory-side interconnection layer provided below the memory cells and connected to the memory cells,

a stacked body including a plurality of electrode layers stacked via an insulating layer,

a semiconductor body extending in a stacking direction of the stacked body in the stacked body,

a charge storage film provided between the semiconductor body and the electrode layers,

a bit line connected to an end portion of the semiconductor body, and

a source line connected to another end portion of the semiconductor body;

a circuit chip including a substrate, a MOS transistor provided on the substrate, and a circuit-side interconnection layer provided above the MOS transistor and connected to the MOS transistor, the circuit chip provided below the array chip and stuck to the array chip, the circuit-side interconnection layer provided below the memory-side interconnection layer of the array chip;

a bonding metal provided between the memory-side interconnection layer and the circuit-side interconnection layer, and bonded to the memory-side interconnection layer and the circuit-side interconnection layer;

a pad included in the memory-side interconnection layer of the array chip; and

an external connection electrode provided on the array chip, the external connection electrode electrically connected to the pad, wherein

the electrode layers are formed in a step shape at an end of a memory cell array region where the memory cells are disposed,

the memory-side interconnection layer includes word interconnection layers connected to the electrode layers formed in the step shape,

the bonding metal includes a bit-line lead-out section electrically connected to the bit line, and

the bit-line lead-out section is disposed in a region overlapping the memory cell array region in the stacking direction.

2. The device according to claim 1 , wherein the pad is provided in a same layer as the word interconnection layers and formed of a same material as the word interconnection layers.

3. The device according to claim 1 , wherein

a gate layer is provided in a layer on an opposite side of the memory-side interconnection layer in the stacked body.

4. The device according to claim 1 , further comprising an insulating film provided around the bonding metal.

5. A semiconductor memory device comprising:

an array chip including

a three-dimensionally disposed plurality of memory cells,

a memory-side interconnection layer provided below the memory cells and connected to the memory cells,

a stacked body including a plurality of electrode layers stacked via an insulating layer,

a semiconductor body extending in a stacking direction of the stacked body in the stacked body,

a charge storage film provided between the semiconductor body and the electrode layers,

a bit line connected to an end portion of the semiconductor body, and

a source line connected to another end portion of the semiconductor body;

a circuit chip including a substrate, a MOS transistor provided on the substrate, and a circuit-side interconnection layer provided above the MOS transistor and connected to the MOS transistor, the circuit chip provided below the array chip and stuck to the array chip, the circuit-side interconnection layer provided below the memory-side interconnection layer of the array chip;

a bonding metal provided between the memory-side interconnection layer and the circuit-side interconnection layer, and bonded to the memory-side interconnection layer and the circuit-side interconnection layer;

a pad included in the memory-side interconnection layer of the array chip; and

an external connection electrode provided on the array chip, the external connection electrode electrically connected to the pad, wherein

the electrode layers are formed in a step shape at an end of a memory cell array region where the memory cells are disposed,

the memory-side interconnection layer includes word interconnection layers connected to the electrode layers formed in the step shape,

the bonding metal includes a plurality of word-line lead-out sections electrically connected to the word interconnection layers, and

the pad is provided in a region overlapping the word-line lead-out sections in the stacking direction.

6. The device according to claim 5 , wherein the pad is provided in a same layer as the word interconnection layers and formed of a same material as the word interconnection layers.

7. The device according to claim 5 , wherein

a gate layer is provided in a layer on an opposite side of the memory-side interconnection layer in the stacked body.

8. The device according to claim 5 , further comprising an insulating film provided around the bonding metal.

9. A semiconductor memory device comprising:

an array chip including

a three-dimensionally disposed plurality of memory cells,

a memory-side interconnection layer provided below the memory cells and connected to the memory cells,

a stacked body including a plurality of electrode layers stacked via an insulating layer,

a semiconductor body extending in a stacking direction of the stacked body in the stacked body,

a charge storage film provided between the semiconductor body and the electrode layers,

a bit line connected to an end portion of the semiconductor body, and

a source line connected to another end portion of the semiconductor body;

a circuit chip including a substrate, a MOS transistor provided on the substrate, and a circuit-side interconnection layer provided above the MOS transistor and connected to the MOS transistor, the circuit chip provided below the array chip and stuck to the array chip, the circuit-side interconnection layer provided below the memory-side interconnection layer of the array chip;

a bonding metal provided between the memory-side interconnection layer and the circuit-side interconnection layer, and bonded to the memory-side interconnection layer and the circuit-side interconnection layer;

a pad included in the memory-side interconnection layer of the array chip, wherein

the pad is provided in a same layer as the source line and formed of a same material as the source line; and

an external connection electrode provided on the array chip, the external connection electrode electrically connected to the pad.

10. The device according to claim 9 , wherein

a gate layer is provided in a layer on an opposite side of the memory-side interconnection layer in the stacked body.

11. The device according to claim 9 , further comprising an insulating film provided around the bonding metal.

Assignments (3)
CHANGE OF NAME AND ADDRESS Recorded Feb 4, 2022
From: K.K PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 058957/0124 →
CHANGE OF NAME AND ADDRESS Recorded Jan 31, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 058905/0582 →
MERGER Recorded Jan 31, 2022
From: TOSHIBA MEMORY CORPORATION
To: K.K PANGEA
Reel/Frame 058946/0675 →