Method and apparatus for X-ray scatterometry
A method for X-ray scatterometry includes receiving a first distribution of an X-ray beam scattered from a sample. The first distribution exhibits asymmetry with respect to a reference axis. A correction is applied to the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution. One or more parameters of the sample are estimated based on the second distribution.
1. A method for X-ray scatterometry, comprising:
receiving a first distribution of an X-ray beam scattered from a sample, wherein the first distribution is acquired while a beam-stopper that is partially-opaque to the X-ray beam is placed in the X-ray beam, and wherein the first distribution exhibits asymmetry with respect to a reference axis;
applying a correction to the first distribution by correcting an angular position or an intensity of the X-ray beam based on the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution; and
estimating one or more parameters of the sample based on the second distribution.
2. The method according to claim 1 , wherein the reference axis is normal to the sample.
3. The method according to claim 1 , wherein applying the correction comprises averaging intensities of the first distribution that are located at a corresponding angular distance on opposite sides of the reference axis.
4. The method according to claim 1 , wherein receiving the first distribution comprises receiving at least first and second versions of the first distribution, acquired by positioning the sample at respective first and second orientations relative to an incident X-ray beam, and wherein applying the correction comprises choosing a version of the first distribution, having a lowest level of the asymmetry, to serve as the second distribution.
5. The method according to claim 1 , wherein applying the correction comprises applying to the first distribution an asymmetric correcting function with respect to the reference axis.
6. The method according to claim 5 , wherein the asymmetry in the first distribution is caused by background signals, and wherein the correcting function is based on an empirical correction applied to compensate for the background signals.
7. The method according to claim 5 , wherein the correcting function is based on a calculated model.
8. The method according to claim 1 , wherein estimating the parameters comprises measuring a dimension of a feature on the sample.
9. The method according to claim 1 , wherein estimating the parameters comprises measuring a distance between features on the sample.
10. An apparatus for X-ray scatterometry, comprising:
an interface, configured to receive a first distribution of an X-ray beam scattered from a sample, wherein the first distribution is acquired while a beam-stopper that is partially-opaque to the X-ray beam is placed in the X-ray beam, and wherein the first distribution exhibits asymmetry with respect to a reference axis; and
a processor, configured to apply a correction to the first distribution by correcting an angular position or an intensity of the X-ray beam based on the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution, and to estimate one or more parameters of the sample based on the second distribution.
11. The apparatus according to claim 10 , wherein the reference axis is normal to the sample.
12. The apparatus according to claim 10 , wherein the processor is configured to apply the correction by averaging intensities of the first distribution that are located at a corresponding angular distance on opposite sides of the reference axis.
13. The apparatus according to claim 10 , wherein the interface is configured to receive at least first and second versions of the first distribution, acquired by positioning the sample at respective first and second orientations relative to an incident X-ray beam, and wherein the processor is configured to apply the correction by choosing a version of the first distribution, having a lowest level of the asymmetry, to serve as the second distribution.
14. The apparatus according to claim 10 , wherein the processor is configured to apply to the first distribution an asymmetric correcting function with respect to the reference axis.
15. The apparatus according to claim 14 , wherein the asymmetry in the first distribution is caused by background signals, and wherein the correcting function is based on an empirical correction applied to compensate for the background signals.
16. The apparatus according to claim 14 , wherein the correcting function is based on a calculated model.
17. The apparatus according to claim 10 , wherein the processor is configured to measure a dimension of a feature on the sample.
18. The apparatus according to claim 10 , wherein the processor is configured to measure a distance between features on the sample.
19. A computer software product, the product comprising a tangible non-transitory computer-readable medium in which program instructions are stored, which instructions, when read by a processor, causes the processor to receive a first distribution of an X-ray beam scattered from a sample, wherein the first distribution is acquired while a beam-stopper that is partially-opaque to the X-ray beam is placed in the X-ray beam, and wherein the first distribution exhibits asymmetry with respect to a reference axis, to apply a correction to the first distribution by correcting an angular position or an intensity of the X-ray beam based on the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution, and to estimate one or more parameters of the sample based on the second distribution.