Method of manufacturing pattern and article manufacturing method

1. A method comprising:

first forming of forming a first pattern in each of a plurality of first regions of a first substrate by using a scanning exposure apparatus, wherein the scanning exposure apparatus includes a first corrector configured to correct a first pattern to be formed;

second forming of forming a second pattern in each of a plurality of second regions of the first substrate having undergone the first forming;

third forming of forming a first pattern in each of a plurality of first regions of a second substrate by using the scanning exposure apparatus while correcting the first pattern formed in each of the plurality of first regions of the second substrate using the first corrector, based on a difference between the first pattern formed in the first forming and the second pattern formed in the second forming; and

fourth forming of forming a second pattern in each of a plurality of second regions of the second substrate having undergone the third forming,

wherein each of the plurality of second regions includes at least two first regions of the plurality of first regions, and in the first forming, a scanning direction in scanning exposure performed by the scanning exposure apparatus is allocated to each of the at least two first regions,

a combination of the scanning directions allocated to the at least two first regions is common to the plurality of second regions, and

the combination is determined such that the scanning directions of at least first regions, of the at least two first regions, which are arranged in a direction perpendicular to the scanning directions are alternately changed one by one.

2. The method according to claim 1 , wherein the combination is determined such that the scanning directions are alternately changed one by one for first regions arranged in the direction perpendicular to the scanning directions and forming a first row, and the scanning directions are alternately changed one by one for first regions forming a second row adjacent to the first row.

3. The method according to claim 2 , wherein the scanning directions allocated to the first region of the first row, and the first region of the second row, which is adjacent to the first region of the first row, are opposite to each other.

4. The method according to claim 1 , wherein in the second forming, a pattern of a mold is transferred to the at least two first regions at the same time by using an imprint apparatus.

5. The method according to claim 4 , wherein the second forming includes forming a part of the second pattern in a third region of the substrate having undergone the first forming, and the third region includes at least one first region of the plurality of first regions,

in the first forming, a scanning direction of scanning exposure performed by the scanning exposure apparatus is allocated to the at least one first region forming the third region, and

the same scanning direction is allocated to the first region forming the third region and the first region forming the second region, to which a pattern of the same region of a pattern region of the mold is to be transferred.

6. The method according to claim 1 , wherein

a step direction to be set between the at least two first regions by the scanning exposure apparatus is allocated to the at least two first regions, and

the step direction allocated to the at least two first regions is common to the plurality of second regions.

7. The method according to claim 1 , wherein in the fourth forming, the second pattern is formed in each of the plurality of second regions of the second substrate while correcting the second pattern formed in each of the plurality of second regions of the second substrate using a second corrector, and

wherein a correction amount of correcting the first pattern in the third forming is determined in accordance with (i) a correction amount of correcting the second pattern in the fourth forming and (ii) the difference between the first pattern formed in the first forming and the second pattern formed in the second forming.

8. The method according to claim 1 , wherein the first forming includes performing scanning exposure on each of the plurality of first regions of the substrate by using the scanning exposure apparatus, forming a resist pattern by developing the substrate thereafter, and forming the first pattern by processing the substrate by using the resist pattern thereafter.

9. The method according to claim 1 , wherein the scanning exposure apparatus is an apparatus for performing scanning exposure on the substrate while scanning an original and the substrate.

10. An article manufacturing method comprising:

forming the first pattern and the second pattern on the second substrate by using a method as defined in claim 1 ; and

processing the second substrate having undergone the forming, thereby obtaining an article.

11. The method according to claim 7 , wherein the correction amount of correcting the second pattern in the fourth forming is determined based on a correction capacity of the second corrector, before the correction amount of correcting the first pattern in the third forming is determined.

12. A method of manufacturing a pattern on a substrate, comprising:

first forming of forming a first pattern in each of a plurality of first regions of the substrate by using a scanning exposure apparatus; and

second forming of forming a second pattern in each of a plurality of second regions of the substrate having undergone the first forming,

wherein each of the plurality of second regions includes at least two first regions of the plurality of first regions, and in the first forming, a scanning direction in scanning exposure performed by the scanning exposure apparatus is allocated to each of the at least two first regions,

a combination of the scanning directions allocated to the at least two first regions is common to the plurality of second regions,

the combination is determined such that the scanning directions of at least first regions, of the at least two first regions, which are arranged in a direction perpendicular to the scanning directions are alternately changed one by one, and

wherein a determination is made whether a combination of the scanning directions allocated to the plurality of first regions should be common to the plurality of second regions.

13. The method according to claim 12 , wherein the determination is made using a first array of the second regions in the direction perpendicular to the scanning directions and a second array of the second regions determined by one first region by shifting the first array.