Electrochemical deposition systems
An electrochemical deposition system for depositing metal onto a workpiece, comprises a deposition chamber adapted to receive plating solution, a workpiece holder for holding a workpiece in a first plane, a shield holder for holding a shield in a second plane substantially parallel to the first plane, an agitation plate having a profiled surface to agitate plating solution, wherein the workpiece holder, shield holder and agitation plate are all adapted for insertion into and removal from the deposition chamber, and further comprising an actuator operable to change a relative distance between the workpiece holder and shield holder, in a direction normal to the first and second planes, while they are located within the deposition chamber.
1. An electrochemical deposition system for depositing metal onto a deposition region of a workpiece, comprising:
a deposition chamber adapted to receive plating solution in use,
a workpiece holder for holding a workpiece in a first plane,
a shield,
a shield holder for holding the shield in a second plane substantially parallel to the first plane facing the deposition region in use, the shield holder separating the shield and deposited material on the workpiece by a gap distance of more than one millimetre during deposition, wherein the shield comprises a substantially planar plate having a pattern of apertures formed therein, the pattern of apertures substantially corresponding to a location of features located on the workpiece during deposition,
an agitation plate having a profiled surface to agitate plating solution in use,
wherein the workpiece holder, shield holder and agitation plate are all adapted for insertion into and removal from the deposition chamber,
wherein the electrochemical deposition system further comprises an actuator operable to change a relative distance between the workpiece holder and shield holder, and hence the gap distance between the shield and the deposited material on the workpiece during deposition, in a direction normal to the first and second planes, while they are located within the deposition chamber, and
wherein the agitation plate and shield holder are assembled together as a cartridge, for insertion into and removal from the deposition chamber.
2. The system of claim 1 , wherein the agitation plate is mounted on the shield holder.
3. The system of claim 2 , wherein the agitation plate is movably mounted on the shield holder, to permit relative motion therebetween, in a direction parallel to the first plane.
4. The system of claim 1 , comprising at least one additional cartridge for insertion into and removal from the deposition chamber.
5. The system of claim 1 , wherein the pattern comprises a plurality of sub-patterns which periodically repeat across the planar extent of the plate.
6. The system of claim 5 , wherein the period is in the range 5 to 100 mm.
7. The system of claim 1 , wherein the actuator is operable to change the relative distance between the workpiece holder and shield holder so that facing surfaces of the shield and the workpiece are brought within a gap distance ranging from 2 to 6 mm within the deposition chamber in use.
8. The system of claim 1 , wherein the actuator comprises one of the group consisting of electrical actuators, pneumatic actuators and hydraulic actuators.
9. The system of claim 1 , comprising an agitation actuator, the agitation actuator being operatively connected to the agitation plate when it is inserted in the deposition chamber, for effecting reciprocal linear motion of the inserted agitation plate in a direction parallel to the first plane.
10. The system of claim 9 , comprising a coupling between the agitation plate and the agitation actuator, the coupling engaging when the agitation plate is inserted into the deposition chamber and disengaging when the agitation plate is removed from the deposition chamber.
11. The system of claim 10 , wherein the coupling comprises a magnetic coupling.
12. The system of claim 1 , wherein the agitation plate is located between the shield holder and the workpiece holder.
13. A cartridge for use in an electrochemical deposition system for depositing target material onto a deposition region of a workpiece, comprising:
an agitation plate having a profiled surface to agitate a liquid in use,
a shield comprising a substantially planar plate having a pattern of apertures formed therein, the pattern of apertures substantially corresponding to a location of features located on the workpiece during deposition, and
a shield holder that holds the shield facing the deposition region in use and separates the shield from deposited material on the workpiece by a gap distance of more than one millimeter during deposition.
14. The cartridge of claim 13 , wherein the pattern comprises a plurality of sub-patterns which periodically repeat across the planar extent of the plate.
15. The system of claim 14 , wherein the period is in the range 5 to 100 mm.
16. The cartridge of claim 13 , wherein the agitation plate is located between the shield holder and the workpiece.
17. A system for electrochemical deposition comprising: a deposition chamber and the cartridge of claim 13 removably received in the deposition chamber.