Semiconductor memory device and method of fabricating the same

1. A semiconductor memory device, comprising:

a first substrate comprising a cell array region;

a first interlayer insulating layer covering the first substrate;

a second substrate disposed on the first interlayer insulating layer, the second substrate comprising a core region electrically connected to the cell array region;

a first adhesive insulating layer interposed between the first interlayer insulating layer and the second substrate; and

first and second contact plugs penetrating the second substrate, the first adhesive insulating layer, and the first interlayer insulating layer and electrically connecting the cell array region with the core region,

wherein bottom surfaces of the first contact plugs are above a top surface of the first substrate, and

wherein bottom surfaces of the second contact plugs are below the top surface of the first substrate.

2. The semiconductor memory device of claim 1 , further comprising:

word lines provided on the cell array region to be parallel to each other;

bit lines provided on the cell array region to cross the word lines and to be parallel to each other;

a word line driver provided on the core region to apply an electrical signal to the word lines; and

a sense amplifier provided on the core region to apply an electrical signal to the bit lines,

wherein the first contact plugs connect the sense amplifier to end portions of the bit lines, and

wherein the second contact plugs connect the word line driver to end portions of the word lines.

3. The semiconductor memory device of claim 2 ,

wherein the word lines are buried in the first substrate, and

wherein the bit lines are provided on the first substrate.

4. The semiconductor memory device of claim 1 , wherein the second substrate contacts the first adhesive insulating layer.

5. The semiconductor memory device of claim 1 , wherein the second substrate further comprises a peripheral circuit region electrically connected to the core region.

6. The semiconductor memory device of claim 1 , further comprising:

a third substrate provided on the second substrate, wherein the third substrate comprises a peripheral circuit region electrically connected to the core region.

7. The semiconductor memory device of claim 6 , further comprising:

first transistors disposed on the second substrate; and

second transistors disposed on the third substrate,

wherein the first transistors are low-voltage transistors, and

wherein the second transistors are high-voltage transistors.

8. The semiconductor memory device of claim 7 , wherein a density of the first transistors on the second substrate is greater than a density of the second transistors on the third substrate.

9. The semiconductor memory device of claim 6 , further comprising:

first transistors disposed on the second substrate; and

second transistors disposed on the third substrate,

wherein the first transistors comprise first gate insulating layers,

wherein the second transistors comprise second gate insulating layers, and

wherein the first gate insulating layers are thinner than the second gate insulating layers.

10. The semiconductor memory device of claim 6 , further comprising:

a second interlayer insulating layer covering the second substrate; and

a third interlayer insulating layer covering the third substrate,

wherein the second interlayer insulating layer contacts the third interlayer insulating layer.

11. The semiconductor memory device of claim 10 , further comprising:

a first interconnection line disposed in the second interlayer insulating layer;

a second interconnection line disposed in the third interlayer insulating layer; and

a conductive structure penetrating the third substrate, the third interlayer insulating layer, and a portion of the second interlayer insulating layer and contacting both of the first interconnection line and the second interconnection line.

12. The semiconductor memory device of claim 6 , further comprising:

a second interlayer insulating layer covering the second substrate;

a second adhesive insulating layer interposed between the second interlayer insulating layer and the third substrate; and

an upper contact plug penetrating the third substrate, the second adhesive insulating layer, and a portion of the second interlayer insulating layer to electrically connect the peripheral circuit region to the core region.

13. A semiconductor memory device, comprising:

a first substrate comprising a cell array region;

word lines provided on the cell array region to be parallel to each other;

bit lines provided on the cell array region to cross the word lines and to be parallel to each other;

a first interlayer insulating layer covering the first substrate;

a second substrate disposed on the first interlayer insulating layer, the second substrate comprising a core region electrically connected to the cell array region;

a first adhesive insulating layer interposed between the first interlayer insulating layer and the second substrate;

contact plugs penetrating the second substrate, the first adhesive insulating layer, and the first interlayer insulating layer and electrically connecting the cell array region with the core region; and

contact insulating layers successively interposed between the contact plugs and the second substrate, between the contact plugs and the first adhesive insulating layer, and between the contact plugs and the first interlayer insulating layer, respectively,

wherein the word lines are buried in the first substrate, and

wherein the bit lines are provided on the first substrate.

14. The semiconductor memory device of claim 13 , further comprising:

a word line driver provided on the core region to apply an electrical signal to the word lines; and

a sense amplifier provided on the core region to apply an electrical signal to the bit lines,

wherein the contact plugs comprise:

first contact plugs connecting the sense amplifier to end portions of the bit lines; and

second contact plugs connecting the word line driver to end portions of the word lines.

15. A semiconductor memory device, comprising:

a first substrate comprising a cell array region;

a first interlayer insulating layer covering the first substrate;

a second substrate disposed on the first interlayer insulating layer, the second substrate comprising a core region electrically connected to the cell array region;

a first adhesive insulating layer interposed between the first interlayer insulating layer and the second substrate;

contact plugs penetrating the second substrate, the first adhesive insulating layer, and the first interlayer insulating layer and electrically connecting the cell array region with the core region; and

a third substrate disposed on the second substrate,

wherein the third substrate comprises a peripheral circuit region electrically connected to the core region.

16. The semiconductor memory device of claim 15 , further comprising:

first transistors disposed on the second substrate; and

second transistors disposed on the third substrate,

wherein the first transistors are low-voltage transistors, and

wherein the second transistors are high-voltage transistors, wherein a density of the first transistors on the second substrate is greater than a density of the second transistors on the third substrate.

17. The semiconductor memory device of claim 15 , further comprising:

first transistors disposed on the second substrate; and

second transistors disposed on the third substrate,

wherein the first transistors comprise first gate insulating layers,

wherein the second transistors comprise second gate insulating layers, and

wherein the first gate insulating layers are thinner than the second gate insulating layers.

18. The semiconductor memory device of claim 15 , further comprising:

a second interlayer insulating layer covering the second substrate; and

a third interlayer insulating layer covering the third substrate,

wherein the second interlayer insulating layer contacts the third interlayer insulating layer.

19. The semiconductor memory device of claim 18 , further comprising:

a first interconnection line disposed in the second interlayer insulating layer;

a second interconnection line disposed in the third interlayer insulating layer; and

a conductive structure penetrating the third substrate, the third interlayer insulating layer, and a portion of the second interlayer insulating layer and contacting both of the first interconnection line and the second interconnection line.

20. The semiconductor memory device of claim 15 , further comprising:

a second interlayer insulating layer covering the second substrate;

a second adhesive insulating layer interposed between the second interlayer insulating layer and the third substrate; and

an upper contact plug penetrating the third substrate, the second adhesive insulating layer, and a portion of the second interlayer insulating layer to electrically connect the peripheral circuit region to the core region.