Display device, manufacturing method of display device, and electronic device
A display device in which a peripheral circuit portion has high operation stability is provided. The display device includes a first substrate and a second substrate. A first insulating layer is provided over a first surface of the first substrate. A second insulating layer is provided over a first surface of the second substrate. The first surface of the first substrate and the first surface of the second substrate face each other. An adhesive layer is provided between the first insulating layer and the second insulating layer. A protective film in contact with the first substrate, the first insulating layer, the adhesive layer, the second insulating layer, and the second substrate is formed in the vicinity of a peripheral portion of the first substrate and the second substrate.
1. A display device comprising:
a first substrate; and
a second substrate,
wherein a first surface of the first substrate is provided with a first insulating layer,
wherein a first surface of the second substrate is provided with a second insulating layer,
wherein the first surface of the first substrate and the first surface of the second substrate face each other,
wherein the first substrate has a second surface opposite to the first surface,
wherein the second substrate has a second surface opposite to the first surface,
wherein an adhesive layer is positioned between the first insulating layer and the second insulating layer,
wherein, in the vicinity of a peripheral portion of the first substrate and the second substrate, a protective film covers the first surface, a side surface and the second surface of the first substrate, a side surface of the adhesive layer, and the first surface of the second substrate, and does not cover a side surface of the second substrate, and
wherein a portion of the protective film that covers the side surface of the first substrate overlaps and extends past the side surface of the second substrate.
2. The display device according to claim 1 ,
wherein the protective film is in contact with the side surface of the first substrate and is not in contact with the side surface of the second substrate.
3. The display device according to claim 1 , wherein a transistor, a capacitor, a display element, a light-blocking layer, a coloring layer, and a spacer are between the first surface of the first substrate and the first surface of the second substrate.
4. The display device according to claim 1 , wherein the protective film comprises any one of oxygen, nitrogen and a metal.
5. The display device according to claim 4 , wherein the protective film comprises one selected from the group consisting of aluminum oxide, hafnium oxide, zirconium oxide, titanium oxide, zinc oxide, indium oxide, tin oxide, indium tin oxide, tantalum oxide, silicon oxide, manganese oxide, nickel oxide, erbium oxide, cobalt oxide, tellurium oxide, barium titanate, titanium nitride, tantalum nitride, aluminum nitride, tungsten nitride, cobalt nitride, manganese nitride, hafnium nitride, ruthenium, platinum, nickel, cobalt, manganese and copper.
6. The display device according to claim 2 ,
wherein the protective film is not in contact with the second surface of the second substrate.
7. The display device according to claim 3 , wherein the display element is a liquid crystal element.
8. The display device according to claim 3 , wherein the display element is an organic EL element.
9. An electronic device comprising:
the display device according to claim 1 ; and
a microphone or a speaker.
10. A method for manufacturing a display device, comprising the steps of:
forming a transistor and a first insulating layer over a first surface of a first substrate;
bonding the first substrate and a second substrate with an adhesive layer in a manner that the first surface of the first substrate and a first surface of the second surface face each other;
forming a groove portion by performing a first cutting treatment on the second substrate after bonding the first substrate and the second substrate; and
forming a protective film in the vicinity of a peripheral portion of the first substrate and the second substrate after forming the groove portion, the protective film being in contact with the first substrate, the adhesive layer and the second substrate in the vicinity of the groove portion.
11. The method for manufacturing a display device according to claim 10 ,
wherein the protective film is in contact with the first surface of the first substrate and a second surface of the first substrate, and
wherein the second surface of the first substrate is an opposite surface of the first substrate to the first surface of the first substrate.
12. The method for manufacturing a display device according to claim 10 , wherein the protective film is formed by an atomic layer deposition method.
13. The method for manufacturing a display device according to claim 10 , wherein the protective film comprises one selected from the group consisting of aluminum oxide, hafnium oxide, zirconium oxide, titanium oxide, zinc oxide, indium oxide, tin oxide, indium tin oxide, tantalum oxide, silicon oxide, manganese oxide, nickel oxide, erbium oxide, cobalt oxide, tellurium oxide, barium titanate, titanium nitride, tantalum nitride, aluminum nitride, tungsten nitride, cobalt nitride, manganese nitride, hafnium nitride, ruthenium, platinum, nickel, cobalt, manganese and copper.
14. The method for manufacturing a display device according to claim 11 ,
wherein the protective film is not in contact with a second surface of the second substrate, and
wherein the second surface of the second substrate is an opposite surface of the second substrate to the first surface of the second substrate.