IP Library › Granted Patent US 11,222,884
Granted Patent B2
US 11,222,884 · App. 16/530,631 · Granted Jan 11, 2022

Layout design methodology for stacked devices

Inventors: Fong-Yuan Chang (Hsinchu County, TW); Chin-Chou Liu (Hsinchu County, TW); Chin-Her Chien (Taoyuan County, TW); Po-Hsiang Huang (Tainan, TW); Ka Fai Chang (Hsinchu, TW)
Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
H01L27/0207G11C8/18H01L23/481H01L25/0657H01L27/0688
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,222,884
App. No.
16/530,631
Granted
Jan 11, 2022
Kind
B2
Abstract

A layout design methodology is provided for a device that includes two or more identical structures. Each device can have a first die, a second die stacked over the first die and a third die stacked over the second die. The second die can include a first through-silicon via (TSV) and a first circuit, and the third die can include a second TSV and a second circuit. The first TSV and the second TSV can be linearly coextensive. The first and second circuit can each be a logic circuit having a comparator and counter used to generate die identifiers. The counters of respective device die can be connected in series between the dice. Each die can be manufactured using the same masks but retain unique logical identifiers. A given die in a stack of dice can thereby be addressed by a single path in a same die layout.

Claims (57)

1. A device, comprising:

a first die;

a second die stacked over the first die, wherein the second die comprises:

a first through-silicon via (TSV); and

a first circuit including a first memory and a first counter configured to assign a first binary address to the first memory; and

a third die stacked over the second die, wherein the third die comprises:

a second TSV; and

a second circuit including a second memory and a second counter configured to assign a second binary address to the second memory,

wherein the first TSV and the second TSV are linearly coextensive.

2. The device of claim 1 , wherein the second die and the third die form a three dimensional integrated circuit (3DIC) memory stack.

3. The device of claim 1 , wherein the second die and the third die are stacked face to back (F2B) over the first die.

4. The device of claim 1 , wherein the second die comprises a first logic circuit and the third die comprises a second logic circuit electrically connected to the first logic circuit;

wherein the first die is configured to generate a first memory die address corresponding to the second die,

wherein the first logic circuit is configured to generate a second memory die address corresponding to the third die, and

wherein the second logic circuit is configured to generate a third memory die address different from the first memory die address and the second memory die address.

5. The device of claim 4 , wherein the first logic circuit comprises a first comparator, and the second logic circuit comprises a second comparator.

6. The device of claim 4 , wherein the first counter and the second counter are electrically connected in series.

7. The device of claim 4 , wherein the second logic circuit is electrically connected to the first logic circuit by the first TSV and the second TSV.

8. The device of claim 7 , further comprising:

a fourth die stacked over the third die, wherein the fourth die comprises a third TSV, a third logic circuit, and a third memory circuit; and

a fifth die stacked over the fourth die, wherein the fifth die comprises a fourth TSV, a fourth logic circuit, and a fourth memory circuit,

wherein the first TSV, the second TSV, the third TSV, and the fourth TSV are linearly coextensive.

9. The device of claim 8 , wherein:

the first logic circuit comprises a first comparator and a first counter;

the second logic circuit comprises a second comparator and a second counter;

the third logic circuit comprises a third comparator and a third counter; and

the fourth logic circuit comprises a fourth comparator and a fourth counter.

10. The device of claim 9 , wherein the first counter, the second counter, the third counter, and the fourth counter are electrically connected in series by the first TSV, the second TSV, and the third TSV.

11. A device, comprising:

a processor die, comprising:

a microprocessor circuit formed on a front surface of the processor die; and

electrical connectors formed on a back surface of the processor die; and

a memory stack disposed over the processor die, the memory stack comprising a plurality of memory dies, each memory die comprising:

a memory circuit formed on a front surface of the memory die;

an interconnect structure formed on a back surface of the memory die;

a through-silicon via (TSV) coupling the memory circuit to the interconnect structure; and

a counter configured to assign a binary address to the memory die.

12. The device of claim 11 , wherein each memory die further comprises address information embedded in a non-volatile storage structure.

13. The device of claim 11 , wherein two or more of the TSVs of respective memory dies in the memory stack are aligned vertically with one another.

14. The device of claim 11 , wherein the plurality of memory dies are configured to receive individual addressing signals and a common control signal.

15. The device of claim 11 , wherein the plurality of memory dies are stacked face-to-face so that respective memory circuits face one another.

16. The device of claim 11 , wherein the plurality of memory dies are stacked face-to-back so that a memory circuit of one memory die faces the interconnect structure of an adjacent memory die.

17. A memory device, comprising:

a first memory die, comprising:

a first memory circuit formed on a front surface of the first memory die,

a first interconnect structure formed on a back surface of the first memory die, and

a first through-silicon via (TSV) coupling the first memory circuit to the first interconnect structure; and

a first counter formed on a front surface of the first memory die; and

a second memory die on the first memory die, the second memory die comprising:

a second memory circuit formed on a front surface of the second memory die,

a second interconnect structure formed on a back surface of the second memory die,

a second TSV coupling the second memory circuit to the second interconnect structure; and

a second counter formed on a front surface of the second memory die, the second counter electrically connected in series with the first counter;

wherein the first and second memory circuits are different from one another.

18. The memory device of claim 17 , wherein the first and second memory dies comprise one or more of a static random-access memory (SRAM), a dynamic random-access memory (DRAM), a magneto-resistive random-access memory (MRAM), and combinations thereof.

19. The memory device of claim 17 , wherein the first and second memory circuits are configured to receive respective addressing signals.

20. The memory device of claim 17 , wherein the first and second memory circuits are configured to receive a common control signal via the first and second TSVs.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 29, 2019
From: CHANG, FONG-YUAN; LIU, CHIN-CHOU; CHIEN, CHIN-HER; HUANG, PO-HSIANG; CHANG, KA FAI
To: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 050208/0977 →
Continuity (2)
Provisional Application 62772391 · Nov 28, 2018
Related Publication 20200168595A1 · May 28, 2020
Cited By (2)
US 12,382,630 US 12,670,115