Edge seals for semiconductor packages
Implementations of semiconductor packages may include: a digital signal processor having a first side and a second side and an image sensor array, having a first side and a second side. The first side of the image sensor array may be coupled to the second side of the digital signal processor through a plurality of hybrid bond interconnect (HBI) bond pads and an edge seal. One or more openings may extend from the second side of the image sensor array into the second side of the digital signal processor to an etch stop layer in the second side of the digital signal processor. The one or more openings may form a second edge seal between the plurality of HBI bond pads and the edge of the digital signal processor.
1. A semiconductor package comprising:
a digital signal processor comprising a first side and a second side;
an image sensor array comprising a first side and a second side, the first side of the image sensor array coupled to the second side of the digital signal processor through a plurality of hybrid bond interconnect (HBI) bond pads and a first edge seal coupled directly with the plurality of HBI bond pads;
an etch stop layer comprised in the second side of the digital signal processor;
one or more first openings extending from the second side of the image sensor array into the second side of the digital signal processor and to the etch stop layer in the second side of the digital signal processor, the one or more first openings coated with sealing material, the one or more first openings forming a second edge seal between the plurality of HBI bond pads and an edge of the digital signal processor;
one or more second openings extending from the second side of the image sensor array to a second metal stack comprised in the image sensor, the one or more second openings forming a third edge seal wherein the one or more second openings each comprise sealing material therein; and
one or more third openings extending from the second side of the image sensor array to the etch stop layer in the digital signal processor forming a fourth edge seal wherein the one or more third openings may be positioned one of inside and outside the first edge seal;
wherein the first edge seal is comprised of a first metal stack comprised within the digital signal processor directly coupled to the second metal stack comprised within the image sensor array.
2. The semiconductor package of claim 1 , wherein the one or more first openings are positioned inside the first edge seal.
3. The semiconductor package of claim 1 , wherein the sealing material on the one or more first openings is one of oxynitride (ONO), silicon nitride (SiN), aluminum nitride (AlN), and any combination thereof.
4. The semiconductor package of claim 1 , wherein the sealing material on the one or more second openings is one of oxynitride (ONO), aluminum oxide (Al 2 O 3 ), silicon nitride (SiN), hafnium dioxide (HfO 2 ), tantalum oxide (Ta 2 O 5 ), and any combination thereof.
5. The semiconductor package of claim 1 , wherein the sealing material on the one or more third openings is one of oxynitride (ONO), aluminum oxide (Al 2 O 3 ), silicon nitride (SiN), hafnium dioxide (HfO 2 ), tantalum oxide (Ta 2 O 5 ), and any combination thereof.
6. A semiconductor package comprising:
a digital signal processor comprising a first side and a second side;
an image sensor array comprising a first side and a second side, the first side of the image sensor array coupled to the second side of the digital signal processor through a plurality of hybrid bond interconnect (HBI) bond pads and a first edge seal coupled directly with the plurality of HBI bond pads;
an etch stop layer comprised in the second side of the digital signal processor;
one or more first openings extending from the second side of the image sensor array into the second side of the digital signal processor and to the etch stop layer in the second side of the digital signal processor, the one or more first openings coated with sealing material, the one or more first openings forming a second edge seal between the plurality of HBI bond pads and an edge of the digital signal processor; and
one or more second openings extending from the second side of the image sensor array to a second metal stack comprised in the image sensor, the one or more second openings forming a third edge seal wherein the one or more second openings each comprise sealing material therein;
wherein the first edge seal is comprised of a first metal stack comprised within the digital signal processor directly coupled to the second metal stack comprised within the image sensor array.
7. The semiconductor package of claim 6 , wherein the one or more first openings is positioned inside the first edge seal.
8. The semiconductor package of claim 6 , one or more third openings extending from the second side of the image sensor array to the etch stop layer in the digital signal processor forming a fourth edge seal wherein the one or more third openings may be positioned one of inside and outside the first edge seal.
9. The semiconductor package of claim 6 , wherein the sealing material on the one or more first openings is one of oxynitride (ONO), silicon nitride (SiN), aluminum nitride (AlN), and any combination thereof.
10. The semiconductor package of claim 6 , wherein the sealing material on the one or more second openings is one of oxynitride (ONO), aluminum oxide (Al 2 O 3 ), silicon nitride (SiN), hafnium dioxide (HfO 2 ), tantalum oxide (Ta 2 O 5 ), and any combination thereof.
11. The semiconductor package of claim 8 , wherein the sealing material on the one or more second openings is one of oxynitride (ONO), aluminum oxide (Al 2 O 3 ), silicon nitride (SiN), hafnium dioxide (HfO 2 ), tantalum oxide (Ta 2 O 5 ), and any combination thereof.