Wafer scale packaging

1. A wafer scale package apparatus, the apparatus comprising:

a mounting substrate member, the mounting substrate member being optically transparent, the mounting substrate member comprising a surface region;

a single crystal acoustic resonator device configured overlying the surface region, the single crystal acoustic resonator device comprising a resonator structure and a contact structure;

a patterned solder structure overlying the surface region and configured between the single crystal acoustic resonator device and the surface region;

a first air gap region provided from the patterned solder structure and configured between the resonator structure and a first portion of the mounting substrate member, wherein the first air gap region has a height of 10 um to 50 um;

a metallization structure configured overlying the single crystal acoustic resonator device, the metallization structure being coupled to the contact structure and having a first electrode and a second electrode;

a repassivation material overlying the metallization structure and the single crystal acoustic resonator device, the repassivation material having a first region exposing the first electrode and a second region exposing the second electrode;

a first under metal material overlying the repassivation material and covering the first region such that the first electrode is in contact with the first under metal material;

a second under metal material overlying the repassivation material and covering the second region such that the second electrode is in contact with the second under metal material;

a first copper pillar structure overlying the first under metal material;

a second copper pillar structure overlying the second under metal material;

a first solder bump overlying the first copper pillar structure; and

a second solder bump configured overlying the second copper pillar structure.

2. The apparatus of claim 1 further comprising an epoxy material configured between the patterned solder structure and the surface region, the epoxy material being a two-stage epoxy material;

wherein the height is about 25 um;

wherein the height is measure from a first perimeter region to a second perimeter region of the first air gap region.

3. The apparatus of claim 1 further comprising a second air gap region provided from the patterned solder structure and configured between the contact structure and a second portion of the mounting substrate member.

4. The apparatus of claim 1 wherein the single crystal acoustic resonator device comprises

a silicon substrate member, a silicon surface region, and a silicon backside region;

an epitaxial material comprising single crystal piezo material overlying the silicon surface region to a desired thickness;

a trench region to form an exposed portion of the silicon surface region through a pattern provided in the epitaxial material;

a topside landing pad metal within a vicinity of the trench region and overlying the exposed portion of the silicon surface region;

a first electrode member overlying a portion of the epitaxial material;

a second electrode member overlying the topside landing pad metal;

a backside trench region exposing a backside of the epitaxial material overlying the first electrode member, and exposing a backside of the landing pad metal; and

a backside resonator metal material overlying the backside of the epitaxial material to form a connection from the epitaxial material to the to the backside of the landing pad metal to couple the second electrode member overlying the topside landing pad metal.

5. The apparatus of claim 4

wherein the mounting substrate member is characterized by a first coefficient of thermal expansion and wherein the silicon substrate member is characterized by a second coefficient of thermal expansion, the first coefficient of thermal expansion being matched to the second coefficient of thermal expansion; and

wherein the mounting substrate member comprises a borosilicate glass material or a boro-float glass material.

6. A method of manufacturing a wafer scale package apparatus, the method comprising:

forming a mounting substrate member, the mounting substrate member being optically transparent, the mounting substrate member comprising a surface region;

forming a single crystal acoustic resonator device overlying a silicon substrate, the single crystal acoustic resonator device comprising a resonator structure and a contact structure;

forming a patterned solder structure overlying the single crystal acoustic resonator device;

forming a first air gap region provided from the patterned solder structure and configured between the resonator structure and a first portion of the mounting substrate member, wherein the first air gap region has a height of 10 um to 50 um;

forming an epoxy material overlying the patterned solder structure;

curing the epoxy material to mate the single crystal acoustic resonator device to the mounting substrate member;

thinning the silicon substrate;

forming a metallization structure overlying the single crystal acoustic resonator device, a first portion of the metallization structure being coupled to the contact structure;

forming a first solder bump overlying the metallization structure and coupled to the first portion of the metallization structure; and

forming a second solder bump overlying the metallization structure and coupled to a second portion of the metallization structure.

7. The method of claim 6 wherein the epoxy material is a two-stage epoxy material;

wherein the height is about 25 um;

wherein the height is measure from a first perimeter region to a second perimeter region of the first air gap region.

8. The method of claim 6 further comprising forming a second air gap region provided from the patterned solder structure and configured between the contact structure and a second portion of the mounting substrate member.

9. The method of claim 6 wherein forming the single crystal acoustic resonator device comprises

wherein the silicon substrate has a silicon surface region, and a silicon backside region;

forming an epitaxial material comprising single crystal piezo material overlying the silicon surface region to a desired thickness;

forming a trench region to form an exposed portion of the silicon surface region through a pattern provided in the epitaxial material;

forming a topside landing pad metal within a vicinity of the trench region and overlying the exposed portion of the silicon surface region;

forming a first electrode member overlying a portion of the epitaxial material;

forming a second electrode member overlying the topside landing pad metal;

forming a backside trench region exposing a backside of the epitaxial material overlying the first electrode member, and exposing a backside of the landing pad metal; and

forming a backside resonator metal material overlying the backside of the epitaxial material to form a connection from the epitaxial material to the to the backside of the landing pad metal to couple the second electrode member overlying the topside landing pad metal.

10. The method of claim 9 wherein forming the mounting substrate member comprises forming a mounting substrate characterized by a first coefficient of thermal expansion and wherein the silicon substrate member is characterized by a second coefficient of thermal expansion, the first coefficient of thermal expansion being matched to the second coefficient of thermal expansion; and

wherein forming the mounting substrate member comprises forming a borosilicate glass material or a boro-float glass material.