Gate-all-around gradient-doped nano-sheet complementary inverter and method of making the same
The present invention provides a gate-all-around quantum gradient-doped nano-sheet complementary inverter may comprise a P-type field effect transistor (FET) and an N-type FET. The P-type FET may comprise a P-type semiconductor nano-sheet channel, a first gate dielectric layer fully surrounding the P-type semiconductor nano-sheet channel, a first gate layer, and a source and a gate area, arranged at two ends of the channel. The N-type FET may comprise an N-type semiconductor nano-sheet channel, a second gate dielectric layer fully surrounding the N-type semiconductor nano-sheet channel, a second gate layer, and a source and a gate area, arranged at two ends of the channel. A common gate electrode may be arranged to fully surround the first and second gate layers. The doping concentration of the P-type and N-type semiconductor nano-sheet channels, which are arranged laterally, side by side, may be in gradient descent from the surface to the center. The width of the P-type semiconductor nano-sheet channel may be greater than that of the N-type semiconductor nano-sheet channel. The structure of the disclosed device may be dense enough to increase the density and improve the performance and simple enough to produce.
1. A gate-all-around (GAA) gradient-doped nano-sheet complementary inverter, comprising:
a substrate;
a P-type field effect transistor (FET) and an N-type FET on the substrate, the P-type FET comprising a P-type semiconductor nano-sheet channel on the substrate, a first gate dielectric layer fully surrounding the P-type semiconductor nano-sheet channel, a first gate layer fully surrounding the first gate dielectric layer, and a first source area and a first drain area arranged at two ends of the P-type semiconductor nano-sheet channel, the N-type FET comprising an N-type semiconductor nano-sheet channel on the substrate, a second gate dielectric layer fully surrounding the N-type semiconductor nano-sheet channel, a second gate layer fully surrounding the second gate dielectric layer, and a second source area and a second drain area arranged at two ends of the N-type semiconductor nano-sheet channel; and
a common gate electrode, connecting the first gate layer and the second gate layer and fully surrounding the first gate layer and the second gate layer;
wherein the P-type semiconductor nano-sheet channel and N-type semiconductor nano-sheet channel, arranged laterally, side by side, have a width and a length, along a horizontal direction, and a height, perpendicular to the horizontal direction, the length of the P-type semiconductor nano-sheet channel defines the distance between the first source area and the first drain area, the length of the N-type semiconductor nano-sheet channel defines the distance between the second source area and the second drain area, the width of the P-type semiconductor nano-sheet channel is greater than that of the N-type semiconductor nano-sheet channel, and a doping concentration of the P-type semiconductor nano-sheet channel and the N-type semiconductor nano-sheet channel is in gradient descent, in the height, from a surface to a center of the P-type semiconductor nano-sheet channel and the N-type semiconductor nano-sheet channel.
2. The GAA gradient-doped nano-sheet complementary inverter according to claim 1 , wherein the first source area connects to a power source, the first drain area connects to the second drain area to serve as an output end, the second source area connect to ground, and the common gate electrode is served as an input end.
3. The GAA gradient-doped nano-sheet complementary inverter according to claim 1 , wherein a cross-section profile of the P-type semiconductor nano-sheet channel and N-type semiconductor nano-sheet channel along with the width are like a track which comprises two semicircles at two ends and a rectangle connecting to the semicircles in the center.
4. The GAA gradient-doped nano-sheet complementary inverter according to claim 1 , wherein the P-type semiconductor nano-sheet channel is applied with P-type silicon nano-sheet and the N-type semiconductor nano-sheet channel is applied with N-type silicon nano-sheet.
5. The GAA gradient-doped nano-sheet complementary inverter according to claim 1 , wherein the P-type FET comprises a plurality of P-type semiconductor nano-sheet channels, arranged vertically, and the N-type FET comprises a plurality of N-type semiconductor nano-sheet channels, arranged vertically.
6. The GAA gradient-doped nano-sheet complementary inverter according to claim 1 , wherein the first source area and the first drain area are applied with P-type SiGe, and the second source area and the second drain area are applied with N-type SiC.
7. The GAA gradient-doped nano-sheet complementary inverter according to claim 1 , wherein a dielectric layer is formed between the first source area and the first drain area, the first gate layer and the common gate electrode, the second source area and the second drain area, and the second gate layer and the common gate electrode.
8. The GAA gradient-doped nano-sheet complementary inverter according to claim 1 , wherein an insulation layer is formed under the P-type FET and the N-type FET to insulate the substrate.