Display panel and fabrication method thereof
A display panel and a fabrication method for forming the display panel are provided. The fabrication method includes providing a substrate disposed with a light-emitting device, and forming a first inorganic material layer. The fabrication method also includes forming a first inorganic layer by thinning the first inorganic material layer, and forming a second inorganic layer. Moreover, the fabrication method includes forming a third layer. The third layer is disposed in a first region. Further, the fabrication method includes patterning the first inorganic layer and the second inorganic layer by a dry etching using the third layer as a mask, while simultaneously thinning the third layer. The first inorganic layer and the second inorganic layer in the first region are retained to form a first inorganic encapsulation layer and a second inorganic encapsulation layer, respectively. The third layer is thinned to form a third encapsulation layer.
1. A fabrication method for forming a display panel, comprising:
providing a substrate disposed with a light-emitting device;
forming a first inorganic material layer;
forming a first inorganic layer by thinning the first inorganic material layer;
forming a second inorganic layer;
forming a third layer, wherein the third layer is disposed in a first region; and
patterning the first inorganic layer and the second inorganic layer by a dry etching using the third layer as a mask, while simultaneously thinning the third layer, wherein:
the first inorganic layer in the first region is retained to form a first inorganic encapsulation layer,
the second inorganic layer in the first region is retained to form a second inorganic encapsulation layer, and
the third layer is thinned to form a third encapsulation layer.
2. The fabrication method according to claim 1 , wherein:
the third layer is made of an inorganic material.
3. The fabrication method according to claim 2 , wherein forming the third layer includes:
forming a third material layer, and
patterning the third material layer using a first mask, wherein the third material layer in the first region is retained to form the third layer.
4. The fabrication method according to claim 1 , wherein:
the third layer is made of an organic material.
5. The fabrication method according to claim 4 , wherein forming the third layer includes:
printing the organic material in the first region by inkjet printing to form the third layer.
6. The fabrication method according to claim 1 , before forming the third layer, further including:
forming a third inorganic material layer; and
forming the third inorganic layer by thinning the third inorganic material layer,
wherein:
patterning the first inorganic layer and the second inorganic layer by the dry etching using the third layer as the mask, while simultaneously thinning the third layer includes:
patterning the third inorganic layer, the first inorganic layer, and the second inorganic layer by the dry etching using the third layer as the mask, while simultaneously thinning the third layer, wherein the third inorganic layer in the first region is retained to form a third inorganic encapsulation layer.
7. The fabrication method according to claim 6 , wherein:
the third layer is made of an organic material, wherein the fabrication method further includes:
forming a fourth inorganic encapsulation layer on a side of the third layer away from the substrate.
8. The fabrication method according to claim 6 , wherein:
the third layer is made of an inorganic material, wherein before forming the third layer, the fabrication method further includes:
forming a first organic encapsulation layer by printing the organic material in the first region by inkjet printing, wherein the first organic encapsulation layer is disposed on a side surface of the third inorganic encapsulation layer away from the substrate.
9. The fabrication method according to claim 1 , wherein:
the display panel includes a display region and a non-display region that are predetermined,
the non-display region includes a binding region,
the substrate further includes a plurality of pads, wherein the plurality of pads are disposed in the binding region, and
the binding region is disposed outside the first region.
10. The fabrication method according to claim 1 , wherein:
the first inorganic encapsulation layer is made of a material including one or more of silicon nitride and silicon oxide, and
the second inorganic encapsulation layer is made of a material including alumina.
11. The fabrication method according to claim 2 , wherein:
the third layer is made of a material including silicon oxynitride.
12. The fabrication method according to claim 1 , wherein:
the substrate further includes at least one blocking part, and
a blocking part of the at least one blocking part has an annular shape and is disposed around the light-emitting device, wherein the blocking part is disposed within the first region.
13. The fabrication method according to claim 1 , wherein:
a vertical cross-section of the third encapsulation layer includes an arc-shaped slope,
an end of the arc-shaped slope is coplanar with a boundary of the first region, and
along a direction oriented from the boundary of the first region to inside of the first region, a thickness of the third encapsulation layer in a location of the arc-shaped slope gradually increases.
14. The fabrication method according to claim 13 , wherein:
the third encapsulation layer is made of an inorganic material, and
a length of the arc-shaped slope is L 1 , and a height of the arc-shaped slope is H 1 , wherein 300 L 1 /H 1 600.
15. The fabrication method according to claim 13 , wherein:
the third encapsulation layer is made of an organic material, and
a length of the arc-shaped slope is L 2 , and a height of the arc-shaped slope is H 2 , wherein 80 L 2 /H 2 120.