3D semiconductor device and structure
A 3D semiconductor device, the device including: a first level; a second level; and a third level, where the first level includes single crystal silicon and a plurality of logic circuits, where the plurality of logic circuits includes a first logic circuit and a second logic circuit, where the second level is disposed directly above the first level and includes a first plurality of arrays of memory cells, where the third level is disposed directly above the second level and includes a plurality of on-chip RF circuits, and where a portion of interconnections between the first logic circuit and the second logic circuit includes the plurality of on-chip RF circuits.
1. A 3D semiconductor device, the device comprising:
a first level;
a second level; and
a third level,
wherein said first level comprises single crystal silicon and a plurality of logic circuits,
wherein said plurality of logic circuits comprises a first logic circuit and a second logic circuit,
wherein said second level is disposed directly above said first level and comprises a first plurality of arrays of memory cells,
wherein said third level is disposed directly above said second level and comprises a plurality of on-chip RF circuits, and
wherein a portion of interconnections between said first logic circuit and said second logic circuit comprises said plurality of on-chip RF circuits.
2. The 3D device according to claim 1 ,
wherein said single crystal silicon comprises channels adapted for fluid cooling.
3. The 3D device according to claim 1 ,
wherein said single crystal silicon has a rectangular shape, and
wherein said rectangular shape comprises one axis longer than 40 mm.
4. The 3D device according to claim 1 ,
wherein said first level is bonded to said second level with hybrid bonding, or said second level is bonded to said third level with hybrid bonding, or both said first level and said third level are each bonded to said second level with hybrid bonding.
5. The 3D device according to claim 1 , further comprising:
a thermal isolation layer,
wherein said thermal isolation layer provides a greater than 20° C. differential temperature between said first level and said second level or between said second level and said third level.
6. The 3D device according to claim 1 , further comprising:
a fourth level,
wherein said fourth level comprises control circuits designed to control at least said first plurality of arrays of memory cells, and
wherein said control circuits comprise decoders.
7. The 3D device according to claim 1 , further comprising:
a fourth level comprising a second plurality of arrays of memory cells.
8. A 3D semiconductor device, the device comprising:
a first level; and
a second level,
wherein said first level comprises single crystal silicon and a plurality of logic circuits,
wherein said logic circuits comprise a plurality of transistors,
wherein said single crystal silicon comprises portions of said transistors,
wherein said second level is disposed directly above said first level and comprises a first plurality of arrays of memory cells, and
wherein said single crystal silicon comprises channels adapted for fluid cooling.
9. The 3D device according to claim 8 , further comprising:
a third level,
wherein said third level comprises a plurality of RF circuits, and
wherein a portion of interconnections between said plurality of logic circuits comprises said RF circuits.
10. The 3D device according to claim 8 ,
wherein said single crystal silicon has a rectangular shape, and
wherein said rectangular shape comprises one axis longer than 40 mm.
11. The 3D device according to claim 8 ,
wherein said first level is bonded to said second level with hybrid bonding.
12. The 3D device according to claim 8 , further comprising:
a thermal isolation layer,
wherein said thermal isolation layer provides a greater than 20° C. differential temperature between said first level and said second level.
13. The 3D device according to claim 8 , further comprising:
a fourth level,
wherein said fourth level comprises control circuits designed to control at least said first plurality of arrays of memory cells, and
wherein said control circuits comprise decoders.
14. The 3D device according to claim 8 , further comprising:
a fourth level comprising a second plurality of arrays of memory cells.
15. A 3D semiconductor device, the device comprising:
a first level; and
a second level,
wherein said first level comprises single crystal silicon and a plurality of logic circuits,
wherein said second level is disposed directly above said first level and comprises a first plurality of arrays of memory cells,
wherein said single crystal silicon has a rectangular shape, and
wherein said rectangular shape comprises one axis longer than 40 mm.
16. The 3D device according to claim 15 , further comprising:
a third level,
wherein said third level comprises a plurality of RF circuits, and
wherein a portion of interconnections between said plurality of logic circuits comprises said RF circuits.
17. The 3D device according to claim 15 ,
wherein said first level is bonded to said second level with hybrid bonding.
18. The 3D device according to claim 15 , further comprising:
a thermal isolation layer,
wherein said thermal isolation layer provides a greater than 20° C. differential temperature between said first level and said second level.
19. The 3D device according to claim 15 , further comprising:
a fourth level,
wherein said fourth level comprises control circuits designed to control at least said first plurality of arrays of memory cells, and
wherein said control circuits comprise decoders.
20. The 3D device according to claim 15 , further comprising:
a fourth level comprising a second plurality of arrays of memory cells.