IP Library › Granted Patent US 11,056,601
Granted Patent B2
US 11,056,601 · App. 16/565,932 · Granted Jul 6, 2021

Solar cell

Inventors: Taiki Hashiguchi (Osaka, JP); Kenta Matsuyama (Osaka, JP)
Assignee: PANASONIC CORPORATION
H01L31/0747H01L31/028H01L31/03762H01L31/202
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Quick Facts
Patent No.
US 11,056,601
App. No.
16/565,932
Granted
Jul 6, 2021
Kind
B2
Abstract

A solar cell includes an n-type silicon substrate having a first main surface and a second main surface, an n-type first semiconductor layer disposed above the first main surface, a first intrinsic semiconductor layer disposed between the first main surface and the first semiconductor layer, a p-type second semiconductor layer disposed on the second main surface, and a second intrinsic semiconductor layer disposed between the second main surface and the second semiconductor layer. An oxygen concentration at an interface between the silicon substrate and the second intrinsic semiconductor layer is lower than an oxygen concentration at an interface between the silicon substrate and the second intrinsic semiconductor layer. An oxygen concentration at an interface between the second intrinsic semiconductor layer and the second semiconductor layer is higher than an oxygen concentration at an interface between the first intrinsic semiconductor layer and the first semiconductor layer.

Claims (23)

1. A solar cell, comprising:

a semiconductor substrate that includes crystalline silicon of a first conductivity type, and has a first main surface and a second main surface facing away from the first main surface;

a first semiconductor layer that includes an amorphous silicon thin film of the first conductivity type, and is disposed above the first main surface;

a first intrinsic semiconductor layer that includes an intrinsic amorphous silicon thin film, and is disposed between the first main surface and the first semiconductor layer;

a second semiconductor layer that includes an amorphous silicon thin film of a second conductivity type, and is disposed above the second main surface; and

a second intrinsic semiconductor layer that includes an intrinsic amorphous silicon thin film, and is disposed between the second main surface and the second semiconductor layer, wherein

a first oxygen concentration at an interface between the semiconductor substrate and the second intrinsic semiconductor layer is lower than a second oxygen concentration at an interface between the semiconductor substrate and the first intrinsic semiconductor layer, and

a third oxygen concentration at an interface between the second intrinsic semiconductor layer and the second semiconductor layer is higher than a fourth oxygen concentration at an interface between the first intrinsic semiconductor layer and the first semiconductor layer.

2. The solar cell according to claim 1 , wherein

the first oxygen concentration is at least 1×10 20 cm −3 and lower than 1×10 21 cm −3 ,

the second oxygen concentration is at least 1×10 21 cm −3 and lower than 1×10 22 cm −3 ,

the third oxygen concentration is at least 1×10 21 cm −3 and lower than 1×10 22 cm −3 , and

the fourth oxygen concentration is at least 1×10 20 cm −3 and lower than 1×10 21 cm −3 .

3. The solar cell according to claim 1 , wherein

an area of the second intrinsic semiconductor layer is larger than an area of the first intrinsic semiconductor layer in a plan view of the semiconductor substrate.

4. The solar cell according to claim 1 , further comprising:

a diffusion inhibition layer that inhibits diffusion of a dopant of the second semiconductor layer at the interface between the second intrinsic semiconductor layer and the second semiconductor layer, wherein

the diffusion inhibition layer includes oxygen, carbon, and nitrogen.

5. The solar cell according to claim 1 , wherein

a film thickness of the second intrinsic semiconductor layer is less uneven than a film thickness of the second semiconductor layer.

6. The solar cell according to claim 1 , wherein

the first conductivity type is n-type conductivity, and

the second conductivity type is p-type conductivity.

Assignments (2)
CHANGE OF NAME Recorded Apr 3, 2026
From: PANASONIC CORPORATION
To: PANASONIC HOLDINGS CORPORATION
Reel/Frame 075334/0989 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 5, 2019
From: HASHIGUCHI, TAIKI; MATSUYAMA, KENTA
To: PANASONIC CORPORATION
Reel/Frame 051183/0497 →
Priority Claims (1)
JP JP2018-191156 · Oct 9, 2018 · national
Continuity (1)
Related Publication 20200111928A1 · Apr 9, 2020