Forming a vertical surface
A miller, a non-transitory computer readable medium, and a method. The miller may include an ion beam column that may be configured to form a vertical surface in an object by applying a milling process that may include forming a vertical surface by irradiating, for a certain period of time, an area of an upper surface of an object by a defocused ion beam that comprises multiple rays. During the certain period of time and at a plane of the upper surface of the object, a majority of the multiple rays are closer to an edge of the defocused ion beam than to a center of the defocused ion beam. The focal plane of the defocused ion beam is located below the upper surface of the object.
1. A miller that comprises:
a controller; and
an ion beam column;
wherein the controller is configured to receive or determine milling parameters related to a milling process;
wherein the ion beam column is configured to form a vertical surface in an object by applying the milling process while maintaining the milling parameters; wherein the applying of the milling process comprises forming the vertical surface by irradiating, for a certain period of time, an area of an upper surface of the object by a defocused ion beam that comprises multiple rays, wherein during the certain period of time and at a plane of the upper surface of the object, a majority of the multiple rays are closer to an edge of the defocused ion beam than to a center of the defocused ion beam; and
wherein a focal plane of the defocused ion beam is located below the upper surface of the object.
2. The miller according to claim 1 wherein a region of least confusion of the defocused ion beam coincides with the plane of the upper surface of the object.
3. The miller according to claim 1 wherein the upper surface of the object is closer to a region of least confusion of the defocused ion beam than to the focal plane of the defocused ion beam.
4. The miller according to claim 1 wherein the irradiating of the area is executed without moving the defocused ion beam.
5. The miller according to claim 1 wherein the irradiating of the area is executed while moving the defocused ion beam.
6. A method for forming a vertical surface in an object, wherein the method comprises:
forming the vertical surface by irradiating, for a certain period, an area of an upper surface of the object by a defocused ion beam that comprises multiple rays, wherein during the certain period and at a plane of the upper surface of the object, a majority of the multiple rays are closer to an edge of the defocused ion beam than to a center of the defocused ion beam; and
wherein a focal plane of the defocused ion beam is located below the upper surface of the object.
7. The method according to claim 6 wherein a region of least confusion of the defocused ion beam is positioned within a plane of the upper surface of the object.
8. The method according to claim 6 wherein the upper surface of the object is closer to a region of least confusion of the defocused ion beam than to the focal plane of the defocused ion beam.
9. The method according to claim 6 comprising receiving or determining milling parameters to be applied during the forming of the vertical surface and maintaining the milling parameters during the forming of the vertical surface.
10. The method according to claim 6 wherein the irradiating of the area is executed without moving the defocused ion beam.
11. The method according to claim 6 wherein the irradiating of the area is executed while moving the defocused ion beam.
12. A non-transitory computer readable medium that stores instructions executable by a processor to cause a miller to:
form a vertical surface by irradiating, for a certain period of time, an area of an upper surface of an object by a defocused ion beam that comprises multiple rays, wherein during the certain period of time and at a plane of the upper surface of the object, a majority of the multiple rays are closer to an edge of the defocused ion beam than to a center of the defocused ion beam; and
wherein a focal plane of the defocused ion beam is located below the upper surface of the object.
13. The non-transitory computer readable medium according to claim 12 wherein a region of least confusion of the defocused ion beam is positioned within the plane of the upper surface of the object.
14. The non-transitory computer readable medium according to claim 12 wherein the upper surface of the object is closer to a region of least confusion of the defocused ion beam than to a focal plane of the defocused ion beam.
15. The non-transitory computer readable medium according to claim 12 comprising receiving or determining milling parameters to be applied during the forming of the vertical surface; and maintaining the milling parameters during the forming of the vertical surface.