IP Library › Granted Patent US 11,011,458
Granted Patent B2
US 11,011,458 · App. 16/579,812 · Granted May 18, 2021

Circuit board structure and manufacturing method thereof

Inventor: Chien-Chen Lin (Taoyuan, TW)
Assignee: Unimicron Technology Corp.
H01L23/49838H01L21/4857H01L23/49822H05K1/11
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Quick Facts
Patent No.
US 11,011,458
App. No.
16/579,812
Granted
May 18, 2021
Kind
B2
Abstract

A method of manufacturing circuit board structure includes forming a sacrificial layer having first openings on a substrate; forming a metal layer on the sacrificial layer; forming a patterned photoresist layer having second openings over the sacrificial layer, in which the second openings are connected to the first openings and expose a portion of the metal layer; forming a first circuit layer filling the second openings and the first openings; forming a first dielectric layer over the sacrificial layer and covering the metal layer, in which the first dielectric layer has third openings exposing the first circuit layer; forming a second circuit layer filling the third openings and covering a portion of the first dielectric layer; removing the substrate to expose the sacrificial layer, a portion of the metal layer and a portion of the first circuit layer; and removing the sacrificial layer and the metal layer.

Claims (5)

1. A circuit board structure, comprising:

at least one dielectric layer;

a first circuit layer having a first portion and a second portion, the first portion protruding from a top surface of the dielectric layer, the second portion being embedded in the dielectric layer and exposed from the top surface, wherein the first portion and the second portion are integrally formed without an interface therebetween; and

a second circuit layer disposed over the dielectric layer and electrically connecting to the first circuit layer, wherein the second circuit layer is integrally formed without an interface.

2. The circuit board structure of claim 1 , wherein the at least one dielectric layer comprises a plurality of dielectric layers.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 24, 2019
From: LIN, CHIEN-CHEN
To: UNIMICRON TECHNOLOGY CORP.
Reel/Frame 050467/0101 →
Priority Claims (1)
TW 108125490 · Jul 18, 2019 · national
Continuity (1)
Related Publication 20210020561A1 · Jan 21, 2021