IP Library Granted Patent US 10,833,385
Granted Patent B2
US 10,833,385 · App. 16/583,867 · Granted Nov 10, 2020

Radar assembly with ultra wide band waveguide to substrate integrated waveguide transition

Inventor: Sankara Narayana Mangaiahgari (Singapore, SG)
Assignee: Aptiv Technologies Limited
H01P3/121G01S13/0209H01P5/024
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Quick Facts
Patent No.
US 10,833,385
App. No.
16/583,867
Granted
Nov 10, 2020
Kind
B2
Abstract

A radar assembly includes a rectangular-waveguide (RWG) and a printed-circuit-board. The rectangular-waveguide (RWG) propagates electromagnetic energy in a transverse electric mode (TE 10 ) and in a first direction. The printed-circuit-board includes a plurality of conductor-layers oriented parallel to each other. The printed-circuit-board defines a substrate-integrated-waveguide (SIW) that propagates the electromagnetic energy in a transverse electric mode (TE 10 ) and in a second direction perpendicular to the first direction, and defines a transition that propagates the electromagnetic energy between the rectangular-wave-guide and the substrate-integrated-waveguide. The transition includes apertures defined by at least three of the plurality of conductor-layers.

Claims (26)

1. An assembly comprising:

a rectangular-waveguide (RWG) that propagates electromagnetic energy in a first direction;

a substrate-integrated-waveguide (SIW) that propagates the electromagnetic energy in a second direction perpendicular to the first direction; and

a transition that propagates the electromagnetic energy between the RWG and the SIW,

wherein the SIW and the transition are defined by a printed-circuit-board that includes a plurality of conductor-layers.

2. The assembly of claim 1 , wherein the RWG propagates the electromagnetic energy in a transverse-electric mode.

3. The assembly of claim 2 , wherein the transverse-electric mode is a TE 10 mode.

4. The assembly of claim 1 , wherein the SIW propagates the electromagnetic energy in a transverse-electric mode.

5. The assembly of claim 4 , wherein the transverse-electric mode is a TE 10 mode.

6. The assembly of claim 1 , wherein the plurality of conductor-layers includes eight conductor layers.

7. The assembly of claim 1 , wherein the plurality of conductor-layers are oriented parallel to each other.

8. The assembly of claim 1 , wherein the transition includes a plurality of apertures defined in a portion of the plurality of conductor-layers.

9. The assembly of claim 8 , wherein the plurality of apertures are defined by at least three of the plurality of conductor-layers.

10. The assembly in accordance with claim 8 , wherein a first layer of the portion of the plurality of conductor-layers is adjacent to the RWG.

11. The assembly in accordance with claim 10 , wherein the first layer defines a first aperture of the plurality of apertures having a first-size.

12. The assembly in accordance with claim 11 , wherein a last layer of the portion of the plurality of conductor-layers is adjacent to the SIW.

13. The assembly in accordance with claim 12 , wherein the last layer defines a first horizontal-boundary of the SIW.

14. The assembly in accordance with claim 13 , wherein one of the plurality of conductor-layers defines a second horizontal-boundary of the SIW opposite the first horizontal-boundary.

15. The assembly in accordance with claim 14 , wherein the second horizontal-boundary defines a slot-radiator configured to couple the electromagnetic energy from the SIW to an antenna.

16. The assembly in accordance with claim 12 , wherein the last layer defines a last aperture of the plurality of apertures having a last-size greater than the first-size.

17. The assembly in accordance with claim 16 , wherein at least one intermediate layer is located between the first layer and the last layer of the transition.

18. The assembly in accordance with claim 17 , wherein the at least one intermediate layer defines an intermediate aperture having an intermediate-size smaller than the last-size and larger than the first-size.

19. The assembly in accordance with claim 12 , wherein the transition includes a short wall.

20. The assembly in accordance with claim 19 , wherein the short wall defines a vertical-boundary of the transition.

21. The assembly in accordance with claim 20 , wherein the vertical-boundary extends between the first layer and the last layer of the transition.

22. The assembly in accordance with claim 19 , wherein the short wall is formed of an arrangement of vias.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 11, 2024
From: APTIV MANUFACTURING MANAGEMENT SERVICES S.À R.L.
To: APTIV TECHNOLOGIES AG
Reel/Frame 066551/0219 →
MERGER Recorded Feb 11, 2024
From: APTIV TECHNOLOGIES (2) S.À R.L.
To: APTIV MANUFACTURING MANAGEMENT SERVICES S.À R.L.
Reel/Frame 066566/0173 →
ENTITY CONVERSION Recorded Feb 11, 2024
From: APTIV TECHNOLOGIES LIMITED
To: APTIV TECHNOLOGIES (2) S.À R.L.
Reel/Frame 066746/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 8, 2020
From: MANGAIAHGARI, SANKARA NARAYANA
To: APTIV TECHNOLOGIES LIMITED
Reel/Frame 053157/0609 →
Continuity (2)
Continuation 15427769 · Feb 8, 2017
Related Publication 20200021001A1 · Jan 16, 2020
Cited By (11)
US 12,224,502 US 12,265,172 US 12,315,999 US 12,424,767 US 12,456,816 US 12,500,350 US 12,506,272 US 12,537,308 US 12,614,839 US 12,627,020 US 12,695,200