Semiconductor device for indirect detection of electromagnetic radiation and method of production
The semiconductor device comprises a substrate of semiconductor material having a main surface, an integrated circuit in the substrate, a photodetector element or array of photodetector elements arranged at or above the main surface, and at least one nanomaterial film arranged above the main surface. At least part of the nanomaterial film has a scintillating property. The method of production includes the use of a solvent to apply the nanomaterial film, in particular by inject printing, by silk-screen printing, by spin coating or by spray coating.
1. A semiconductor device for detection of x-rays or gamma-rays, comprising:
a substrate of semiconductor material having a main surface,
an integrated circuit in the substrate,
a nanomaterial film arranged above the main surface, at least part of the nanomaterial film having a scintillating property,
a photodetector element or array of photodetector elements arranged in the substrate at the main surface, the photodetector element or array of photodetector elements being configured to detect electromagnetic radiation transformed by the nanomaterial film, and
a dielectric layer arranged between the nanomaterial film and the photodetector element or array of photodetector elements, such that the dielectric layer is arranged on the main surface of the substrate, and the nanomaterial film is arranged on the dielectric layer, wherein a wiring is arranged in the dielectric layer.
2. The semiconductor device according to claim 1 , wherein
the nanomaterial film comprises nanodots, nanorods or nanowires or any combination thereof.
3. The semiconductor device according to claim 1 , further comprising:
a further nanomaterial film, at least part of the further nanomaterial film having an absorbing property and covering an area of the main surface outside the photodetector element or array of photodetector elements.
4. The semiconductor device according to claim 3 , wherein
the further nanomaterial film comprises nanodots, nanorods or nanowires or any combination thereof.
5. The semiconductor device according to claim 1 , further comprising:
the photodetector element or array of photodetector elements comprising at least two photodetector elements,
at least one further nanomaterial film, at least part of which has a scintillating property, and
each one of the at least two photodetector elements being covered by the nanomaterial film or the at least one further nanomaterial film.
6. The semiconductor device according to claim 5 , wherein
the nanomaterial film and the at least one further nanomaterial film are matched to two different electromagnetic energy levels, wherein the two different electromagnetic energy levels are either x-rays or gamma-rays.
7. The semiconductor device according to claim 5 , wherein
the nanomaterial film and the at least one further nanomaterial film have different emission wavelengths.
8. The semiconductor device according to claim 1 , wherein
the nanomaterial film has an emission wavelength in the range from 300 nm to 1000 nm.
9. The semiconductor device according to claim 1 , wherein
the nanomaterial film has an emission wavelength in the range from 400 nm to 850 nm.
10. The semiconductor device according to claim 1 , wherein
the nanomaterial film comprises PbS, PbSe, ZnS, ZnS, CdSe, CdTe or a combination thereof.
11. The semiconductor device according to claim 1 , wherein
the nanomaterial film comprises a core-shell structure, wherein a composition of an inner material and a composition of an outer material are different.
12. A method of producing a semiconductor device for detection of x-rays or gamma-rays, comprising:
using a solvent for applying a nanomaterial film above a main surface of a substrate of semiconductor material, at least part of the nanomaterial film having a scintillating property,
wherein an integrated circuit is arranged in the substrate, wherein a photodetector element or an array of photodetector elements is arranged in the substrate at the main surface, and wherein a dielectric layer is applied on the main surface of the substrate, the nanomaterial film being applied on the dielectric layer, and wherein a wiring is arranged in the dielectric layer.
13. The method of claim 12 , further comprising:
applying the nanomaterial film by inject printing.
14. The method of claim 12 , further comprising:
applying the nanomaterial film by silk-screen printing.
15. The method of claim 12 , further comprising:
applying the nanomaterial film by spin coating.
16. The method of claim 12 , further comprising:
applying the nanomaterial film by spray coating.
17. A semiconductor device for detection of x-rays or gamma-rays, comprising:
a substrate of semiconductor material having a main surface,
integrated circuit in the substrate,
a nanomaterial film arranged above the main surface, at least part of the nanomaterial film having a scintillating property, and
a photodetector element or array of photodetector elements arranged in a semiconductor layer between the main surface and the nanomaterial film, the photodetector element or array of photodetector elements being configured to detect electromagnetic radiation transformed by the nanomaterial film,
a dielectric layer arranged between the substrate and the semiconductor layer, wherein a wiring is arranged in the dielectric layer, and
a further dielectric layer arranged on the semiconductor layer, the nanomaterial film being arranged on the further dielectric layer.