Manufacturing method of color film substrate and color film substrate

1. A manufacturing method of a color film substrate, comprising following steps:

providing a substrate, wherein the substrate comprises a first sub-pixel region, a second sub-pixel region, and a third sub-pixel region;

forming a first patterned photoresist layer on the first sub-pixel region of the substrate, wherein the first patterned photoresist layer is a blue photoresist layer;

forming a quantum dot layer on the substrate, wherein the quantum dot layer covers the substrate and the first patterned photoresist layer, and the quantum dot layer comprises red quantum dots and green quantum dots;

forming a second patterned photoresist layer and a third patterned photoresist layer on the quantum dot layer in order, wherein the second patterned photoresist layer is disposed corresponding to the second sub-pixel region, the third patterned photoresist layer is disposed corresponding to the third sub-pixel region, the second patterned photoresist layer is a red photoresist layer, and the third patterned photoresist layer is a green photoresist layer; and

using the second patterned photoresist layer and the third patterned photoresist layer as shielding layers, and quenching the quantum dot layer to invalidate unshielded quantum dots of the quantum dot layer;

wherein the step of forming the quantum dot layer on the substrate comprises following steps:

providing a quantum dot solution mixed with at least two types of quantum dots and a solvent;

coating or inkjet printing a layer of the quantum dot solution on the substrate;

drying the quantum dot solution; and

repeating the above steps to obtain the quantum dot layer with a preset thickness.

2. The manufacturing method of the color film substrate as claimed in claim 1 , wherein the solvent is one of petroleum ether, dichloromethane, or ethyl acetate.

3. The manufacturing method of the color film substrate as claimed in claim 1 , wherein the step of quenching the quantum dot layer adopts a quencher to quench the quantum dot layer, so that a shielded portion of the quantum dot layer forms a first quantum dot layer, and an unshielded portion of the quantum dot layer is quantum dot quenched to form a second quantum dot layer.

4. The manufacturing method of the color film substrate as claimed in claim 3 , wherein the quencher is one of 12-alkyl mercaptan, 14-alkyl mercaptan, or pyridine solution.

5. The manufacturing method of the color film substrate as claimed in claim 1 , wherein a step after the step of providing the substrate, that is, before the step of forming the first patterned photoresist layer on the first sub-pixel region of the substrate, comprises forming a black matrix on the substrate.

6. A manufacturing method of a color film substrate, comprising following steps:

providing a substrate, wherein the substrate comprises a first sub-pixel region, a second sub-pixel region, and a third sub-pixel region;

forming a first patterned photoresist layer on the first sub-pixel region of the substrate;

forming a quantum dot layer on the substrate, wherein the quantum dot layer covers the substrate and the first patterned photoresist layer, the quantum dot layer comprises at least two types of quantum dots, and light emission colors of the at least two types of quantum dots are respectively different from a light emission color of the first patterned photoresist layer;

forming a second patterned photoresist layer and a third patterned photoresist layer on the quantum dot layer in order, wherein the second patterned photoresist layer is disposed corresponding to the second sub-pixel region, and the third patterned photoresist layer is disposed corresponding to the third sub-pixel region; and

using the second patterned photoresist layer and the third patterned photoresist layer as shielding layers, and quenching the quantum dot layer to invalidate unshielded quantum dots of the quantum dot layer.

7. The manufacturing method of the color film substrate as claimed in claim 6 , wherein the step of forming the quantum dot layer on the substrate comprises following steps:

providing a quantum dot solution mixed with the at least two types of quantum dots and a solvent;

coating or inkjet printing a layer of the quantum dot solution on the substrate;

drying the quantum dot solution; and

repeating the above steps to obtain the quantum dot layer with a preset thickness.

8. The manufacturing method of the color film substrate as claimed in claim 7 , wherein the solvent is one of petroleum ether, dichloromethane, or ethyl acetate.

9. The manufacturing method of the color film substrate as claimed in claim 7 , wherein the step of quenching the quantum dot layer adopts a quencher to quench the quantum dot layer, so that a shielded portion of the quantum dot layer forms a first quantum dot layer, and an unshielded portion of the quantum dot layer is quantum dot quenched to form a second quantum dot layer.

10. The manufacturing method of the color film substrate as claimed in claim 9 , wherein the quencher is one of 12-alkyl mercaptan, 14-alkyl mercaptan, or pyridine solution.

11. The manufacturing method of the color film substrate as claimed in claim 6 , wherein the first patterned photoresist layer is a blue photoresist layer, the second patterned photoresist layer is a red photoresist layer, the third patterned photoresist layer is a green photoresist layer, and the quantum dot layer comprises a red quantum dot and a green quantum dot.

12. The manufacturing method of the color film substrate as claimed in claim 6 , wherein a step after the step of providing the substrate, that is, before the step of forming the first patterned photoresist layer on the first sub-pixel region of the substrate, comprises forming a black matrix on the substrate.

13. A color film substrate, comprising:

a substrate, comprising a first sub-pixel region, a second sub-pixel region, and a third sub-pixel region;

a first photoresist layer disposed on the first sub-pixel region of the substrate;

a quantum dot layer disposed on the substrate and covering the substrate and the first photoresist layer, wherein the quantum dot layer comprises at least two types of quantum dots, and light emission colors of the at least two types of quantum dots are respectively different from a light emission color of the first photoresist layer;

a second photoresist layer disposed on a portion of the quantum dot layer corresponding to the second sub-pixel region; and

a third photoresist layer disposed on a portion of the quantum dot layer corresponding to the third sub-pixel region;

wherein the quantum dot layer comprises a first quantum dot layer disposed on the second sub-pixel region and the third sub-pixel region and a second quantum dot layer away from the first quantum dot layer; and

under light irradiation, quantum dots in the first quantum dot layer are excited to emit fluorescence of corresponding colors, and quantum dots in the second quantum dot layer are quenched into a light-transmitting state.

14. The color film substrate as claimed in claim 13 , wherein the first photoresist layer is a blue photoresist layer, the second photoresist layer is a red photoresist layer, the third photoresist layer is a green photoresist layer, and the quantum dot layer comprises red quantum dots and green quantum dots.

15. The color film substrate as claimed in claim 13 , wherein the color film substrate comprises a black matrix disposed between the substrate and the quantum dot layer.

16. The color film substrate as claimed in claim 13 , wherein a refractive index of the substrate is greater than a refractive index of the quantum dot layer.