Flash-lamp annealing method of making polycrystalline silicon

1. A method of making polycrystalline silicon comprising:

depositing amorphous silicon on at least a portion of a suitable substrate having a strain point of from 650° C. to 800° C. to produce an amorphous silicon super-mesa on the substrate;

dehydrogenating the amorphous silicon super-mesa on the substrate;

patterning the dehydrated amorphous silicon super-mesa on the substrate to produce a patterned amorphous silicon super-mesa on the substrate;

depositing a capping oxide layer on the patterned amorphous silicon super-mesa on the substrate to form a capped patterned amorphous silicon super-mesa on the substrate;

heating the capped patterned amorphous silicon super-mesa on the substrate below an intrinsic solid phase crystallization temperature of amorphous silicon, to form a heated, capped, and patterned amorphous silicon super-mesa on the substrate; and

flash lamp annealing the heated, capped, and patterned amorphous silicon super-mesa on the substrate with a xenon lamp at a voltage of from 550 to 700 V and a suitable pulse duration while continuing to heat at from 525° C. to 550° C., to produce polycrystalline silicon on the substrate, wherein the polycrystalline silicon has crystal growth that is edge initiated, the polycrystalline silicon comprising supersized grains and one or more mesa regions.

2. The method of claim 1 , wherein the suitable pulse duration is from 150 to 300 microseconds.

3. The method of claim 1 , further comprising:

removing the supersized grains outside the one or more mesa regions from the substrate.

4. The method of claim 3 , wherein removing the supersized grains outside the one or more mesa regions is accomplished by cutting, etching, ablation, or a combination thereof, and a size of the one or more mesa regions is any size suitable for a transistor article.

5. The method of claim 1 , further comprising:

forming a transistor from the one or more mesa regions, the transistor having a crystal grain direction parallel to a direction of current flow.

6. The method of claim 1 , wherein patterning the dehydrated amorphous silicon super-mesa on the substrate comprises a masking and etching including photolithography combined with aqueous or plasma etching.

7. The method of claim 1 , wherein the suitable substrate is selected from at least one of: a glass sheet, a roll-to-roll glass, a sheet-to-sheet glass, a glass-ceramic sheet, or a combination thereof.

8. A conducting device comprising:

polycrystalline silicon comprising at least two silicon crystal grains on a glass substrate, wherein the polycrystalline silicon has crystal growth that is edge initiated; and

the conducting device having an electron mobility of greater than 300 cm 2 per volt second at 25° C., a hole mobility of greater than or equal to 100 cm 2 per volt second at 25° C., and a sub-threshold swing of less than 150 mV/decade at 25° C., and wherein the conducting device is included in or selected from at least one of: a MOSFET, a diode, a capacitor, and combinations thereof.

9. The conducting device of claim 8 , wherein the electron mobility is from 350 to 450 cm 2 per volt second at 25° C. and the sub-threshold swing is from 60 to 100 mV/decade at 25° C.

10. A method of making a device comprising:

incorporating at least one of the conducting device of claim 8 into another device or platform.

11. A device comprising:

at least one of the conducting device of claim 8 .