Cleaning liquid composition and method for cleaning polymerization apparatus using same

1. A cleaning liquid composition comprising:

a transition metal compound represented by Chemical Formula 1 below; and

a hydrocarbon-based solvent, wherein the hydrocarbon-based solvent is an aliphatic hydrocarbon solvent, an aromatic hydrocarbon solvent or a combination thereof:

in Chemical Formula 1,

M is ruthenium or osmium, R 1 and R 2 are each independently a hydrogen atom or a substituent represented by Chemical Formula 2 below, at least one of R 1 or R 2 is a substituent represented by Chemical Formula 2 below, X 1 and X 2 are each independently a halogen atom, and Ph is a phenyl group,

in Chemical Formula 2,

R 3 and R 4 are each independently a C1-C10 alkyl group; or R 3 and R 4 are linked with each other to form a saturated or unsaturated 5-membered ring,

wherein the cleaning liquid composition comprises at least one first aromatic vinyl-based monomer and at least one or more vinyl-based monomers selected from the group consisting of a C2-C10 olefin monomer, a conjugated diene-based monomer, and a second aromatic vinyl-based monomer.

2. The cleaning liquid composition of claim 1 , wherein

M is ruthenium or osmium, R 1 and R 2 are each independently the substituent represented by Chemical Formula 2, and X 1 and X 2 are Cl or Br, and

R 3 and R 4 are each independently a C1-C5 alkyl group; or R 3 and R 4 are linked with each other to form a saturated or unsaturated 5-membered ring.

3. The cleaning liquid composition of claim 1 , wherein

M is ruthenium, R 1 and R 2 are each independently the substituent represented by Chemical Formula 2, and X 1 and X 2 are Cl, and

R 3 and R 4 are linked with each other to form a saturated or unsaturated 5-membered ring.

4. The cleaning liquid composition of claim 1 , wherein the transition metal compound represented by Chemical Formula 1 is a transition metal compound represented by Chemical Formula 3 below:

in Chemical Formula 3,

M is ruthenium or osmium, R 1 and R 2 are each independently a hydrogen atom or a substituent represented by Chemical Formula 2 below, at least one of R 1 or R 2 is a substituent represented by Chemical Formula 2 below, and Ph is a phenyl group,

in Chemical Formula 2,

R 3 and R 4 are each independently a C1-C10 alkyl group; or R 3 and R 4 are linked with each other to form a saturated or unsaturated 5-membered ring.

5. The cleaning liquid composition of claim 4 , wherein the transition metal compound represented by Chemical Formula 3 is one of transition metal compounds represented by Chemical Formulas 3-1 to 3-8 below:

in Chemical Formulas 3-1 to 3-8,

M is ruthenium, Ph is a phenyl group, Me is a methyl group, Et is an ethyl group, Pr is a propyl group, and Bu is a butyl group.

6. The cleaning liquid composition of claim 1 , wherein the cleaning liquid composition includes two or more of the transition metal compounds represented by Chemical Formula 1.

7. The cleaning liquid composition of claim 1 , wherein the hydrocarbon-based solvent is an aromatic hydrocarbon solvent.

8. The cleaning liquid composition of claim 1 , wherein an amount of the transition metal compound represented by Chemical Formula 1 is 0.1% by weight to 10% by weight based on a total amount of the cleaning liquid composition.

9. A cleaning method of a polymerization apparatus comprising:

swelling a diene-based polymer in a polymerization apparatus with a hydrocarbon-based solvent; and

adding and stirring the cleaning liquid composition of claim 1 in the presence of the diene-based polymer), thereby oligomerizing the diene-based polymer.

10. The cleaning method of claim 9 , wherein the diene-based polymer is one selected from the group consisting of a butadiene rubber, an isoprene rubber, a styrene-butadiene rubber, and a styrene-butadiene-styrene block copolymer.

11. The cleaning method of claim 9 , wherein the swelling is performed at 50° C. to 100° C.

12. The cleaning method of claim 9 , wherein the stirring is performed for 1 to 24 hours.