Athermal silicon optical add-drop multiplexers based on thermo-optic coefficient tuning of sol-gel material
An athermal optical waveguide structure such as an optical add drop multiplexer (OADM) or the like is fabricated by a method that includes forming a lower cladding layer on a substrate. A waveguiding core layer is formed on the lower cladding layer. An upper cladding layer is formed on the waveguiding core layer and the lower cladding layer a sol-gel material. The sol-gel material includes an organically modified siloxane and a metal oxide. A thermo-optic coefficient of the sol-gel material is adjusted by curing the sol-gel material for a selected duration of time at a selected temperature such that the thermo-optic coefficient of the sol-gel material compensates for a thermo-optic coefficient of at least the waveguiding core layer such that an effective thermo-optic coefficient of the optical waveguide structure at a specified optical wavelength and over a specified temperature range is reduced.
1. A method of forming an optical waveguide structure, comprising:
forming a lower cladding layer on a substrate;
forming a waveguiding core layer on the lower cladding layer;
applying as an upper cladding layer on the waveguiding core layer and the lower cladding layer a sol-gel material, the sol-gel material including an organically modified siloxane and a metal oxide;
adjusting a thermo-optic coefficient of the sol-gel material by curing the sol-gel material for a selected duration of time at a selected temperature such that the thermo-optic coefficient of the sol-gel material compensates for a thermo-optic coefficient of at least the waveguiding core layer such that an effective thermo-optic coefficient of the optical waveguide structure at a specified optical wavelength and over a specified temperature range is zero.
2. The method of claim 1 , wherein the substrate is a silicon-on-insulator (SOI) substrate.
3. The method of claim 1 , wherein the sol-gel material includes an organically modified siloxane and a metal oxide.
4. The method of claim 3 , wherein the organically modified siloxane includes MAPTMS.
5. The method of claim 3 , wherein the metal oxide includes zirconium propoxide.
6. The method of claim 3 , wherein the metal oxide includes titanium propoxide.
7. The method of claim 3 , wherein the metal oxide includes iron propoxide.
8. The method of claim 1 , wherein curing the sol-gel material further comprises thermally curing the sol-gel material.
9. The method of claim 1 , wherein curing the sol-gel material further comprises curing the sol-gel material by application of UV or microwave radiation.
10. An optical waveguide circuit formed in accordance with the method of claim 1 .
11. A method of forming an optical waveguide structure, comprising:
forming a lower cladding layer on a substrate;
forming a waveguiding core layer on the lower cladding layer;
applying as an upper cladding layer on the waveguiding core layer and the lower cladding layer a sol-gel material, the sol-gel material including an organically modified siloxane and a metal oxide;
selecting one or more curing parameters used to cure the sol-gel material such that after curing the optical waveguide structure exhibits reduced thermal dependent wavelength shifts at a specified optical wavelength over a specified temperature range relative to a silica cladded optical waveguide structure; and
curing the sol-gel material in accordance with the selected one or more curing parameters.
12. The method of claim 11 , wherein selecting the one or more curing parameters includes selecting the one or more curing parameters such that the thermal dependent wavelength shifts are minimized at the specified optical wavelength over the specified temperature range.
13. A method of forming an optical waveguide circuit, comprising:
forming on a substrate a waveguide structure defining the optical waveguide circuit;
applying as an upper cladding layer on the waveguide structure a sol-gel material that includes an organically modified siloxane and a metal oxide;
selecting one or more curing parameters used to cure the sol-gel material such that the thermo-optic coefficient of the sol-gel material after curing compensates for a thermo-optic coefficient of the waveguide structure so that an effective thermo-optic coefficient of the optical waveguide circuit at a specified optical wavelength is zero over a specified temperature range; and
curing the sol-gel material in accordance with the selected one or more curing parameters.
14. The method of claim 13 , wherein the optical waveguide circuit includes a ring resonator.
15. The method of claim 13 , wherein the optical waveguide circuit is selected from the group consisting of a Mach-Zehnder interferometer and an arrayed waveguide grating.
16. The method of claim 13 , wherein the substrate is a silicon-on-insulator (SOI) substrate.
17. The method of claim 14 , wherein the curing parameters being adjusted include curing time and/or curing temperature.
18. The method of claim 13 , wherein the organically modified siloxane includes MAPTMS.
19. The method of claim 13 , wherein the metal oxide includes zirconium propoxide.
20. The method of claim 13 , wherein the metal oxide includes titanium propoxide.
21. The method of claim 13 , wherein the metal oxide includes iron propoxide.
22. The method of claim 13 , wherein curing the sol-gel material further comprises thermally curing the sol-gel material.
23. The method of claim 13 , wherein curing the sol-gel material further comprises curing the sol-gel material by application of UV or microwave radiation.