Reducing junction resistance variation in two-step deposition processes

1. A method comprising:

providing a dielectric substrate;

forming a first resist layer on the dielectric substrate;

forming a second resist layer on the first resist layer; and

forming a third resist layer on the second resist layer,

wherein the first resist layer comprises a first opening extending through a thickness of the first resist layer, the second resist layer comprises a second opening aligned over the first opening and extending through a thickness of the second resist layer, and the third resist layer comprises a third opening aligned over the second opening and extending through a thickness of the third resist layer, and

wherein the first opening in the first resist layer and the third opening in the third resist layer are defined by exposing the first resist layer, the second resist layer, and the third resist layer in a first pattern, and the second opening in the second resist layer is defined by exposing the first resist layer, the second resist layer, and the third resist layer in a second pattern, and wherein the first resist layer, the second resist layer, and the third resist layer are subsequently developed.

2. The method of claim 1 , wherein the thickness of each of the first opening, the second opening and the third opening extend along a first direction normal to a surface of the dielectric substrate,

each of the first opening, the second opening, and the third opening has a corresponding width that extends along a second direction that is orthogonal to the first direction, and

the width of the second opening is less than the width of the first opening and less than the width of the third opening.

3. The method of claim 2 , comprising:

depositing a first layer of material through the first opening, the second opening, and the third opening at a first deposition angle with respect to the substrate;

depositing a second layer of material through the first opening, the second opening, and the third opening at a second deposition angle with respect to the substrate.

4. The method of claim 3 , wherein the first layer of material and the second layer of material are a superconducting material.

5. The method of claim 3 , further comprising performing a surface oxidation of the first layer of material to provide an oxidized region of the first layer of material prior to depositing the second layer of material.

6. The method of claim 5 , wherein a portion of the first layer of material, a portion of the oxidized region, and a portion of the second layer of material form a Josephson junction.

7. The method of claim 5 , wherein a portion of the first layer of material, a portion of the oxidized region, and a portion of the second layer of material form part of a quantum information processing device.

8. The method of claim 7 , wherein the quantum information processing device comprises a qubit.

9. The method of claim 3 , further comprising removing the first resist layer, the second resist layer, the third resist layer, and excess deposited material.

10. The method of claim 3 , wherein, during deposition of the first layer of material, the dielectric substrate and a material deposition source are arranged according to a first orientation with respect to one another, and

wherein, during deposition of the second layer of material, the dielectric substrate and the material deposition source are arranged according to a second orientation with respect to one another, the first orientation being different from the second orientation.

11. The method of claim 10 , comprising rotating the substrate after depositing the first layer of material and prior to depositing the second layer of material.

12. The method of claim 10 , comprising changing a position of the material deposition source with respect to the dielectric substrate after depositing the first layer of material and prior to depositing the second layer of material.

13. The method of claim 3 , wherein the first opening, the second opening and the third opening define a mask opening region that exposes a surface of the dielectric substrate,

wherein a first side of the mask opening region comprises

a first undercut width defined by a distance between a first edge of the second opening and a first edge of the third opening, and

wherein a second side of the mask opening region that is directly opposite to the first side of the mask opening region comprises

a second undercut width defined by a distance between a second edge of the second opening and a second edge of the third opening.

14. The method of claim 13 , wherein during the depositing of the first layer of material, the first side of the mask opening region is closer to a material deposition source than the second side of the mask opening region.

15. The method of claim 13 , wherein the second undercut width is greater than a thickness of material deposited on a sidewall of the third resist layer during the depositing the first layer of material through the first opening, the second opening, and the third opening at the first deposition angle with respect to the substrate.

16. The method of claim 13 , wherein the first undercut width is approximately zero.