Microelectronic assemblies
Microelectronic assemblies, and related devices and methods, are disclosed herein. For example, in some embodiments, a microelectronic assembly may include a package substrate having a first surface and an opposing second surface, and a die secured to the package substrate, wherein the die has a first surface and an opposing second surface, the die has first conductive contacts at the first surface and second conductive contacts at the second surface, and the first conductive contacts are coupled to conductive pathways in the package substrate by first non-solder interconnects.
1. A method of manufacturing a microelectronic assembly, the method comprising:
forming a first portion of a package substrate;
forming a plurality of conductive pillars on the first portion of the package substrate, wherein the conductive pillars are arranged around a region in which there are no conductive pillars, and the region includes conductive contacts;
forming first interconnects between a die and the first portion of the package substrate, wherein the die has a first surface and an opposing second surface, the die includes first conductive contacts at its first surface and second conductive contacts at its second surface, and the first interconnects are between the conductive contacts of the portion of the package substrate and the first conductive contacts of the die;
forming a second portion of the package substrate proximate to the second surface of the die; and
forming second interconnects between the second conductive contacts of the die and second conductive contacts of the second portion of the package substrate, wherein the second interconnects include metal-to-metal interconnects.
2. The method of claim 1 , further comprising:
after forming the first interconnects, providing a mold material around the conductive pillars and the die.
3. The method of claim 1 , wherein the first interconnects include solder or an anisotropic conductive material.
4. The method of claim 1 , further comprising:
before forming the first interconnects, forming a placement ring on the first portion of the package substrate around the region;
wherein forming the first interconnects includes placing the die at least partially in the placement ring.
5. The method of claim 1 , further comprising:
coupling the first portion of the package substrate and the second portion of the package substrate.
6. A method of manufacturing a microelectronic assembly, the method comprising:
forming a plurality of conductive pillars on a carrier, wherein the conductive pillars are arranged around a region in which there are no conductive pillars;
placing a die in the region, wherein the die has a first surface and an opposing second surface, the first surface is between the carrier and the second surface, and the die includes first conductive contacts at its first surface and second conductive contacts at its second surface; and
after placing the die in the region, forming a portion of a package substrate proximate to the second surface;
wherein forming the portion of the package substrate includes forming interconnects between the die and the portion of the package substrate, and the interconnects are between conductive contacts of the portion of the package substrate and the second conductive contacts of the die.
7. The method of claim 6 , further comprising:
after placing the die in the region, providing a mold material around the conductive pillars and the die.
8. The method of claim 6 , wherein an individual conductive pillar has an aspect ratio between 1:1 and 4:1.
9. The method of claim 6 , wherein an individual conductive pillar has a diameter between 30 microns and 300 microns.
10. The method of claim 6 , wherein an individual conductive pillar has a diameter between 50 microns and 400 microns.
11. The method of claim 6 , wherein the portion of the package substrate is a first portion, the interconnects are first interconnects, and the method further includes:
removing the carrier; and
forming a second portion of the package substrate proximate to the first surface of the die, wherein forming the second portion of the package substrate includes forming second interconnects between the first conductive contacts of the die and second conductive contacts of the second portion of the package substrate.
12. The method of claim 11 , wherein the second interconnects include metal-to-metal interconnects.
13. The method of claim 11 , wherein the die is a first die, and the method further includes:
forming third interconnects between the second portion of the package substrate and a second die.
14. The method of claim 13 , wherein the third interconnects include solder.
15. A method of manufacturing a microelectronic assembly, the method comprising:
forming a portion of a package substrate, wherein the package substrate has a recess with conductive contacts at a bottom of the recess;
forming first interconnects between a die and the portion of the package substrate, wherein the die has a first surface and an opposing second surface, the die includes first conductive contacts at its first surface and second conductive contacts at its second surface, the first surface of the die is between the portion of the package substrate and the second surface of the die, and the first interconnects are between the first conductive contacts of the die and the conductive contacts of the package substrate;
forming a second portion of the package substrate proximate to the second surface of the die; and
forming second interconnects between the second conductive contacts of the die and conductive contacts of the second portion of the package substrate.
16. The method of claim 15 , wherein the first interconnects include solder.
17. The method of claim 15 , wherein the first interconnects include an anisotropic conductive material.
18. The method of claim 15 , wherein the die is a first die, and the method further includes:
forming third interconnects between a second die and the second portion of the package substrate.
19. The method of claim 15 , wherein the second interconnects include metal-to-metal interconnects.