Method for thermally processing a substrate and associated system
A method for thermally processing a substrate having a surface region and a buried region with a pulsed light beam, the substrate presenting an initial temperature-depth profile and the surface region presenting an initial surface temperature, including steps of: illuminating the surface region with a preliminary pulse so that it generates an amount of heat and reaches a predetermined preliminary surface temperature; and illuminating the surface region with a subsequent pulse after a time interval so that it reaches a predetermined subsequent surface temperature. The time interval is determined such that the surface region reaches a predetermined intermediate surface temperature greater than the initial surface temperature, such that during the time interval, the amount of heat is diffused within the substrate down to a predetermined depth so that the substrate presents a predetermined intermediate temperature-depth profile.
1. A method for thermally processing a substrate with a pulsed light beam, the substrate having a surface region and a buried region, a substrate temperature of the substrate presenting an initial temperature-depth profile and a surface temperature of the surface region being at an initial surface temperature, the method comprising:
illuminating the surface region with a preliminary pulse of the pulsed light beam, the preliminary pulse thereby providing a preliminary amount of energy to the surface region, so that the surface region generates a preliminary amount of heat and the surface temperature reaches a predetermined preliminary surface temperature; and
illuminating the surface region of the substrate with a subsequent pulse of the pulsed light beam after a time interval, the subsequent pulse thereby providing a subsequent amount of energy to the surface region so that the surface region generates a subsequent amount of heat and the surface temperature reaches a predetermined subsequent surface temperature, the time interval being determined such that during the time interval the surface temperature reaches a predetermined intermediate surface temperature, said predetermined intermediate surface temperature being greater than the initial surface temperature, such that
during said time interval, said preliminary amount of heat is diffused in the buried region down to a predetermined depth of the substrate so that the substrate temperature presents a predetermined intermediate temperature-depth profile, a combination of values of an energy density and a number of pulses relative to the pulsed light beam being determined in order to obtain the predetermined intermediate temperature-depth profile.
2. The method according to claim 1 , wherein the illuminating the surface region with the preliminary pulse and the illuminating the surface region with the subsequent pulse are repeated until the surface temperature reaches a target surface temperature and the substrate temperature presents a target temperature-depth profile.
3. The method according to claim 2 , wherein the buried region of the substrate comprises a region implanted with dopant elements having a predetermined dopant elements concentration-depth profile, and
wherein the target temperature-depth profile activates the dopant elements of the implanted region.
4. The method according to claim 3 , wherein the implanted region is situated at a depth greater than 500 nanometers from surface region and has a thickness less than 50 micrometers.
5. The method according to claim 3 , wherein the dopant elements are configured to generate one type of unipolar carriers in the implanted region.
6. The method according to claim 3 , wherein the dopant elements are configured to generate two types of unipolar carriers in the implanted region.
7. The method according to claim 1 , wherein the substrate is a semiconductor material selected from the group consisting of silicon carbide, silicon germanium, germanium, gallium nitride, gallium arsenide, and diamond.
8. The method according to claim 2 , wherein the target temperature is the melt temperature of the surface region.
9. The method according to claim 1 , wherein the values are determined in order to reach the predetermined preliminary surface temperature, the predetermined intermediate surface temperature, and a predetermined subsequent temperature-depth profile,
wherein the values further include one or more of the time interval and a shape of a light spot formed by the pulsed light beam on the surface region.
10. The method according to claim 9 , further comprising scanning the pulsed light beam over the surface region,
wherein the values further include a scan speed of the pulsed light beam.
11. The method according to claim 1 , wherein the preliminary amount of energy delivered by the preliminary pulse is different from the subsequent amount of energy delivered by the subsequent pulse.
12. The method according to claim 1 , wherein the amount of energy delivered by each of the preliminary pulse and subsequent pulse is less than an amount of energy necessary for the surface region to reach a melt temperature of the surface region of the substrate.
13. The method according to claim 1 , wherein each of the preliminary pulse and subsequent pulse has a duration equal to or less than 1 nanosecond.
14. The method according to claim 1 , wherein the time interval between the preliminary pulse and the subsequent pulse is equal to or less than 25 nanoseconds.
15. The method according to claim 1 , wherein the pulsed light beam has a wavelength equal to or less than 532 nanometers.
16. The method according to claim 1 , wherein the energy density of the pulsed light beam is greater than 1 millijoule per centimeter squared.
17. A system for thermally processing a substrate with a pulsed light beam, the substrate having a surface region and a buried region, a substrate temperature of the substrate presenting an initial temperature-depth profile and a surface temperature of the surface region being at an initial surface temperature, said system comprising:
a light source configured to emit a light beam; and
a beam control system configured to generate the pulsed light beam from the emitted light beam, said beam control system being configured to generate a preliminary pulse and a subsequent pulse,
said preliminary pulse of the pulsed light beam illuminating the surface region of the substrate, the preliminary pulse thereby providing a preliminary amount of energy to said surface region, so that the surface region generates a preliminary amount of heat and the surface temperature reaches a predetermined preliminary surface temperature,
said subsequent pulse of the pulsed light beam illuminating the surface region of the substrate after a time interval, the subsequent pulse thereby providing a subsequent amount of energy to said surface region, so that said surface region generates a subsequent amount of heat and the surface temperature reaches a predetermined subsequent surface temperature,
wherein said system is configured to generate said subsequent pulse after said time interval, said time interval being determined such that during the time interval the surface temperature reaches a predetermined intermediate surface temperature, said predetermined intermediate surface temperature being greater than the initial surface temperature, such that during the time interval, the preliminary amount of heat is diffused within the buried region down to a predetermined depth of the substrate so that the substrate temperature presents a predetermined intermediate temperature-depth profile, a combination of values of an energy density and a number of pulses relative to the pulsed light beam being determined in order to obtain the predetermined intermediate temperature-depth profile.
18. The system according to claim 17 , wherein the system is configured to repeat the illumination of the surface region with the preliminary pulse and the illumination of the surface region with the subsequent pulse until the surface temperature reaches a target temperature and the substrate temperature presents a target temperature-depth profile.
19. The system according to claim 18 , wherein the buried region of the substrate comprises a region implanted with dopant elements having a predetermined dopant element concentration-depth profile, and
wherein the target temperature-depth profile activates the dopant elements of the implanted region.
20. The system according to claim 17 , wherein each of the preliminary pulse and subsequent pulse has a duration equal to or less than 1 nanosecond.
21. The system according to claim 17 , wherein the pulsed light beam has a wavelength equal to or less than 532 nanometers.
22. The system, according to claim 17 , wherein the time interval between the preliminary pulse and the subsequent pulse is equal to or less than 25 nanoseconds.
23. The system according to claim 17 , wherein the energy density of the pulsed light beam is greater than 1 millijoule per centimeter squared.
24. The system according to claim 17 , wherein the values are determined in order to reach the predetermined preliminary surface temperature, the predetermined intermediate surface temperature, and a predetermined subsequent temperature-depth profile,
wherein the values further include the time interval and a shape of a light spot formed by the pulsed light beam on the surface region.