Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method
A multi-charged particle beam writing apparatus according to one aspect of the present invention includes a region setting unit configured to set, as an irradiation region for a beam array to be used, the region of the central portion of an irradiation region for all of multiple beams of charged particle beams implemented to be emittable by a multiple beam irradiation mechanism, and a writing mechanism, including the multiple beam irradiation mechanism, configured to write a pattern on a target object with the beam array in the region of the central portion having been set in the multiple beams implemented.
1. A multi-charged particle beam writing apparatus comprising:
a region setting circuit configured to set, as an irradiation region for a beam array to be used, a region of a central portion of an irradiation region for all of multiple beams of charged particle beams implemented to be emittable by a multiple beam irradiation mechanism;
a writing mechanism that includes the multiple beam irradiation mechanism, configured to write a pattern on a target object with the beam array in the region of the central portion having been set in the multiple beams implemented; and
a shot cycle calculation circuit configured to calculate a shot cycle time based on the region of said central portion having been set in the irradiation region of the all of the multiple beams,
wherein the writing mechanism writes the pattern on the target object based on the shot cycle time calculated.
2. The apparatus according to claim 1 further comprising:
an electromagnetic lens configured to refract the multiple beams;
a lens control circuit configured to control the electromagnetic lens, using a lens control value; and
a storage device configured to store a table defining the lens control value for controlling the electromagnetic lens, and related to a number of beams to be used in the multiple beams,
wherein, referring to the table, the lens control circuit changes the lens control value based on the number of beams of the beam array in the region having been set.
3. The apparatus according to claim 1 , wherein
the multiple beams being emittable is divided into effective column multiple beams composed of a plurality of beam columns on a central side, and ineffective column multiple beams composed of beam columns located on both end sides of the effective column multiple beams, and
irradiation time data of beam OFF is always generated as irradiation time data of beams located on both end sides of each beam column of the plurality of beam columns in the effective column multiple beams on the central side.
4. A multi-charged particle beam writing method comprising:
setting, as an irradiation region of a beam array to be used, a region of a central portion of an irradiation region of all of multiple beams of charged particle beams implemented to be emittable by a multiple beam irradiation mechanism;
writing a pattern on a target object with the beam array in the region of the central portion having been set in the multiple beams implemented; and
calculating a shot cycle time based on the region of said central portion having been set in the irradiation region of the all of the multiple beams,
wherein the pattern is written on the target object based on the shot cycle time calculated.