Electron beam device
In an electron beam device provided with two columns including an irradiation optical system and an imaging optical system, a photoelectron image for use in adjusting the irradiation optical system is made sharper. The electron beam device includes: an irradiation optical system which irradiates a sample placed on a stage with an electron beam; a light irradiation unit 50 which irradiates the sample with light containing ultraviolet rays; a sample voltage control unit 44 which applies a negative voltage to the sample so that, before the electron beam reaches the sample, the electron orbit inverts; and an imaging optical system which acquires a mirror electron image by forming an image of mirror electrons reflected by application of the negative voltage. In the electron beam device, the imaging optical system includes a sensor 32 which obtains a mirror electron image and a stray light suppression part 27 which is provided between the sensor and the stage 31 and which suppresses reaching the sensor of the light emitted from the light irradiation unit.
1. An electron beam device, comprising:
an irradiation optical system that irradiates a sample placed on a stage with an electron beam;
a light irradiation unit that irradiates the sample with light containing ultraviolet rays;
a sample voltage control unit that applies a negative voltage to the sample so that, before the electron beam reaches the sample, the electron orbit inverts; and
an imaging optical system that acquires a mirror electron image by forming an image of mirror electrons reflected by application of the negative voltage,
wherein the imaging optical system includes a sensor that obtains the mirror electron image and a stray light suppression part that is provided between the sensor and the stage and that suppresses reaching the sensor of the light emitted from the light irradiation unit.
2. The electron beam device according to claim 1 , further comprising,
an objective lens and
a beam separator that deflects the electron beam emitted from the irradiation optical system so as to align the electron beam with the optical axis of the objective lens, the beam separator also separating the electron beam and the mirror electrons and guiding the mirror electrons to the optical axis of the imaging optical system.
3. The electron beam device according to claim 2 ,
wherein the stray light suppression part is provided between the sensor and the beam separator.
4. The electron beam device according to claim 1 ,
wherein the stray light suppression part is a cylindrical part disposed such that the optical axis of the imaging optical system extends therethrough, and
wherein the stray light suppression part has an inner wall processed to suppress reaching the sensor of the light emitted from the light irradiation unit.
5. The electron beam device according to claim 4 ,
wherein the inner wall of the stray light suppression part has an uneven surface formed to scatter or reflect the light emitted from the light irradiation unit or a surface coated with coating to absorb the light emitted from the light irradiation unit.
6. The electron beam device according to claim 4 ,
wherein the imaging optical system acquires a photoelectron image by forming an image of photoelectrons emitted when the light irradiation unit irradiates the sample with light containing ultraviolet rays.
7. The electron beam device according to claim 6 ,
wherein the imaging optical system includes an imaging lens and
wherein the imaging optical system performs control using the imaging lens such that the photoelectrons do not hit the inner wall of the stray light suppression part.
8. The electron beam device according to claim 6 ,
wherein the light irradiation unit includes an ultraviolet lamp and a filter that limits light emission from the ultraviolet lamp to a predetermined wavelength band and
wherein, when the imaging optical system is to obtain the photoelectron image, the light irradiation unit irradiates the sample with light emitted from the ultraviolet lamp in a state with the filter removed.
9. The electron beam device according to claim 1 ,
wherein the stray light suppression part is a shielding plate having an opening through which the optical axis of the imaging optical system extends.
10. The electron beam device according to claim 1 , further comprising a housing that houses a sample chamber including the stage and a column including the imaging optical system,
wherein the housing has an inner wall processed to suppress reaching the sensor of the light emitted from the light irradiation unit.