Active matrix substrate, X-ray imaging panel with the same, and method of manufacturing the same
An active matrix substrate includes a first electrode, a photoelectric conversion element, and a second electrode on a substrate. The first electrode, the photoelectric conversion element, and the second electrode are covered with a first inorganic insulating film including a first opening on the second electrode. The first organic insulating film including a second opening is provided on the first inorganic insulating film, and a surface of the first organic insulating film inside the second opening is covered with a second inorganic insulating film including a third opening overlapping the first opening in a plan view. A conductive film in contact with the second electrode in the first opening is provided on the second inorganic insulating film.
1. An active matrix substrate comprising:
a substrate;
a first electrode disposed on the substrate;
a photoelectric conversion element disposed on the first electrode;
a second electrode disposed on the photoelectric conversion element;
a first inorganic insulating film including a first opening on the second electrode and covering surfaces of the first electrode, the second electrode, and the photoelectric conversion element;
a first organic insulating film provided on the first inorganic insulating film and including a second opening at a position overlapping the first opening in a plan view;
a second inorganic insulating film covering a surface of the first organic insulating film inside the second opening and including a third opening at a position overlapping the first opening in a plan view; and
a conductive film provided on the second inorganic insulating film and in contact with the second electrode in the first opening.
2. The active matrix substrate according to claim 1 further comprising:
a third inorganic insulating film covering the conductive film; and
a second organic insulating film covering the third inorganic insulating film.
3. The active matrix substrate according to claim 2 ,
wherein at least one of the second inorganic insulating film or the third inorganic insulating film covers a part of an area in the photoelectric conversion element that does not overlap the second opening in a plan view.
4. The active matrix substrate according to claim 1 further comprising:
a switching element on the substrate,
wherein the first electrode is connected to a drain electrode of the switching element, and
the second electrode is applied with a bias voltage via the conductive film.
5. An imaging panel comprising:
the active matrix substrate according to claim 1 ; and
a scintillator configured to convert an emitted X-ray into fluorescence.
6. A method for manufacturing an active matrix substrate comprising:
forming a first electrode on a substrate;
forming a photoelectric conversion element on the first electrode;
forming a second electrode on the photoelectric conversion element;
forming a first inorganic insulating film including a first opening on the second electrode and covering surfaces of the first electrode, the second electrode, and the photoelectric conversion element;
forming, on the first inorganic insulating film, a first organic insulating film including a second opening at a position overlapping the first opening in a plan view;
forming a second inorganic insulating film covering a surface of the first organic insulating film in the second opening and including a third opening at a position overlapping the first opening in a plan view; and
forming, on the second inorganic insulating film, a conductive film in contact with the second electrode in the first opening.