Apparatus and system for filtrating liquid
A filtration apparatus is provided. The filtration apparatus includes a housing and a plurality of filtering sheets. The housing is enclosed by a first end cap and a second end cap. The first end cap includes a liquid inlet, and the second end cap includes a liquid outlet. The plurality of filtering sheets is disposed on an internal sidewall of the housing. A portion of the filtering sheets interlaces with another portion of the filtering sheets to form a winding flow path in the housing.
1. A filtration apparatus comprising:
a housing enclosed by a first end cap and a second end cap, the first end cap comprising a liquid inlet, and the second end cap comprising a liquid outlet; and
a plurality of filters disposed on an internal sidewall of the housing,
wherein a portion of the filters interlaces with another portion of the filters to form a winding flow path in the housing, each of the filters comprises a substrate extending from the internal sidewall and extending toward the other side of the internal sidewall, and at least one brush structure is disposed on a surface of the substrate, each of the at least one brush structure comprises a stem and branches protruding from the stem towards the internal sidewall.
2. The filtration apparatus of claim 1 , wherein the housing has a tubular structure.
3. The filtration apparatus of claim 1 , wherein each of the plurality of filters is perpendicular to the internal sidewall.
4. The filtration apparatus of claim 1 , wherein an angle formed between the internal sidewall and each of the plurality of filters falls within the range of 0 to 90 degrees.
5. The filtration apparatus of claim 1 , wherein the brush structure is used to capture silicon dioxide.
6. The filtration apparatus of claim 5 , wherein the brush structure is formed by an oxidebased material.
7. The filtration apparatus of claim 1 , wherein the first end cap further comprises a gas inlet, and the second end cap further comprises a gas outlet.
8. A filtration system comprising:
a wafer processing module, comprising:
an etching device;
a heater connected to the liquid input;
a concentration meter disposed between the heater and the etching device; and
a pump disposed between the etching device and the liquid output;
a first valve connected to a liquid output of the wafer processing module;
a second valve connected to a liquid input of the wafer processing module; and
at least one filtration apparatus connected to the wafer processing module, the at least one filtration apparatus comprising:
a housing enclosed by a first end cap and a second end cap, the first end cap comprising a liquid inlet, and the second end cap comprising a liquid outlet; and
a plurality of filters disposed on an internal sidewall of the housing,
wherein a portion of the filters interlaces with another portion of the filters to form a winding flow path in the housing, each of the filters comprises a substrate disposing on the internal sidewall and extending toward the other side of the internal sidewall, and at least one brush structure is disposed on a surface of the substrate, each of the at least one brush structure comprises a stem and branches protruding from the stem towards the internal sidewall.
9. The filtration system of claim 8 , wherein the liquid inlet is configured to receive a liquid from the first valve.
10. The filtration system of claim 9 , wherein the liquid is a phosphoric acid solution.
11. The filtration system of claim 8 , wherein the liquid outlet is configured to supply a filtrated liquid to the second valve.
12. The filtration system of claim 8 , wherein the first valve and the second valve are three-way valves.
13. The filtration system of claim 8 , further comprising:
a liquid supplier connected to the at least one filtration apparatus for supplying a cleaning agent; and
a drain for collecting the cleaning agent.
14. The filtration system of claim 13 , further comprising a third valve disposed between the liquid supplier and the liquid inlet, and a fourth valve disposed between the liquid outlet and the drain.
15. The filtration system of claim 8 , wherein each of the plurality of filters is perpendicular to the internal sidewall of the housing.
16. The filtration system of claim 8 , wherein the brush structure is used to capture silicon dioxide.
17. The filtration system of claim 8 , further comprising a control circuit for switching operation modes of the system.