IP Library › Granted Patent US 11,239,148
Granted Patent B2
US 11,239,148 · App. 16/684,808 · Granted Feb 1, 2022

Semiconductor package

Inventors: Youngkwan Lee (Suwon-si, KR); Youngsik Hur (Suwon-si, KR); Taehee Han (Suwon-si, KR)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
H01L23/49866H01L23/3157H01L23/49811H01L23/49827H01L23/49861H01L24/45H01L23/552
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,239,148
App. No.
16/684,808
Granted
Feb 1, 2022
Kind
B2
Abstract

A semiconductor package includes a core layer formed of a ferromagnetic material, and includes a frame passing through the core layer and having a through-hole, a semiconductor chip disposed in the through-hole of the frame, and having an active surface on which a connection pad is disposed, and an inactive surface opposite to the active surface, an encapsulant covering at least a portion of the semiconductor chip, and a first connection structure including a first redistribution layer disposed on the active surface of the semiconductor chip and electrically connected to the connection pad.

Claims (40)

1. A semiconductor package, comprising:

a frame including:

a core layer formed of a ferromagnetic material;

a through-hole passing through the core layer;

a semiconductor chip disposed in the through-hole of the frame, and having an active surface on which a connection pad is disposed and an inactive surface opposite to the active surface

a first wiring layer disposed on an upper surface of the core layer and a second wiring layer disposed on a lowermost surface of the core layer, a lower surface of the second wiring layer being lower than the lowermost surface of the core layer; and

a connection via passing through the core layer and disposed between the first wiring layer and the second wiring layer; and

a core insulating layer covering at least a portion of a surface of the core layer, the core insulating layer being provided directly between the lowermost surface of the core layer and an upper surface of the second wiring layer;

an encapsulant covering at least a portion of the semiconductor chip; and

a first connection structure disposed on the active surface of the semiconductor chip, and including a first redistribution layer electrically connected to the connection pad.

2. The semiconductor package of claim 1 , wherein the frame further includes:

the first wiring layer and the second wiring layer being electrically connected to the connection pad; and

the connection via having a side surface surrounded by the core insulating layer.

3. The semiconductor package of claim 1 , wherein the first wiring layer and the second wiring layer are respectively spaced apart from the core layer by the core insulating layer.

4. The semiconductor package of claim 1 , wherein the connection via has a cylindrical shape with a constant width.

5. The semiconductor package of claim 1 , further comprising:

a second connection structure including a via passing through the encapsulant and connected to the first wiring layer of the frame and a second redistribution layer disposed on the via.

6. The semiconductor package of claim 1 , wherein the ferromagnetic material includes a ferromagnetic metal material.

7. The semiconductor package of claim 1 , wherein the ferromagnetic material includes at least one selected from a group consisting of iron (Fe), nickel (Ni), cobalt (Co), and alloys thereof.

8. The semiconductor package of claim 1 , wherein the ferromagnetic material is uniformly distributed in the core layer.

9. A semiconductor package, comprising:

a frame including a core layer formed of a ferromagnetic material, and a through-hole passing through the core layer;

a semiconductor chip disposed in the through-hole of the frame, and having an active surface on which a connection pad is disposed and an inactive surface opposite to the active surface;

an encapsulant covering at least a portion of the semiconductor chip; and a first connection structure disposed on the active surface of the semiconductor chip, and including a first redistribution layer electrically connected to the connection pad,

wherein the frame further includes a first wiring layer and a second wiring layer disposed on both sides of the core layer, respectively, first and second build-up layers disposed on both sides of the core layer, respectively, and covering at least portions the first and second wiring layers, respectively, a third wiring layer disposed on the first build-up layer, and a fourth wiring layer disposed on the second build-up layer, and

the first to fourth wiring layers are electrically connected to the connection pad.

10. The semiconductor package of claim 9 , wherein the frame further includes a core insulating layer disposed between the core layer and each of the first and second build-up layers.

11. The semiconductor package of claim 10 , wherein the core insulating layer is interposed between the core layer and each of the first and second wiring layers.

12. A semiconductor package, comprising:

a frame having a through-hole and a core layer formed of a ferromagnetic material wherein the core layer surrounds the through-hole;

a semiconductor chip disposed in the through-hole of the frame, and having an active surface on which a connection pad is disposed and an inactive surface opposite to the active surface;

an encapsulant covering at least a portion of the semiconductor chip; and

a connection structure disposed on the active surface of the semiconductor chip, and including a redistribution layer electrically connected to the connection pad,

wherein the frame has magnetic properties due to the core layer,

wherein the frame further includes a core insulating layer covering at least a portion of a surface of the core layer,

wherein the core insulating layer includes prepreg or an Ajinomoto Build-up Film (ABF).

13. The semiconductor package of claim 12 , wherein the frame further includes a connection via passing through the core layer and spaced apart from the core layer by the core insulating layer.

14. The semiconductor package of claim 1 , wherein the core insulating layer covers a side surface of the core layer except for an outmost side surface forming a side surface of the semiconductor package, the upper surface of the core layer, and the lowermost surface of the core layer.

15. The semiconductor package of claim 1 , wherein the core insulating layer is disposed between the upper surface of the core layer and a lower surface of the first wiring layer.

16. The semiconductor package of claim 9 , wherein the core layer has a thickness greater than thicknesses of the first and the second build-up layers.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 15, 2019
From: LEE, YOUNGKWAN; HUR, YOUNGSIK; HAN, TAEHEE
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 051020/0293 →
Priority Claims (1)
KR 10-2018-0156736 · Dec 7, 2018 · national
Continuity (1)
Related Publication 20200185321A1 · Jun 11, 2020
Cited By (1)
US 12,451,438