Granted Patent B2

US 12,498,635 · App. 16/686,925 · Granted Dec 16, 2025

Inventors: KhanhTin Nguyen (Kawasaki, JP); Mari Murata (Kawasaki, JP); Masatoshi Arai (Kawasaki, JP); Nobuhiro Michibayashi (Kawasaki, JP)

Assignee: TOKYO OHKA KOGYO CO., LTD.

G03F7/0045C07C65/05C07C321/30G03F7/162G03F7/20G03F7/30

Abstract

Claims (14)

1 . A resist composition which generates an acid upon exposure and whose solubility in a developing solution is changed due to an action of the acid, the resist composition comprising:

a base material component (A) whose solubility in a developing solution is changed due to the action of an acid; and

a compound (DO) formed of an anion moiety and a cation moiety, which is represented by Formula (d0),

wherein the cation moiety of the compound (DO) has a Log P value of less than 7.7,

wherein M m+ represents an m-valent organic cation represented by Formula (ca-d0), m represents 1, R d0 represents a substituent, p represents an integer of 0 to 3, and in a case where p represents 2 or 3, a plurality of substituents as R d0 may be the same as or different from one another, q represents an integer of 0 to 3, n represents an integer of 2 or greater, where a relationship of “n+p≤(q×2)+5” is satisfied,

wherein R d1 represents an aryl group which may have a substituent; and R d2 and R d3 each independently represent an aryl group which may have a substituent or may be bonded to each other to form a ring with a sulfur atom in Formula (ca-d0); provided that when any of R d1 , R d2 and R d3 has a substituent represented by any of Formula (ca-r-1) to (ca-r-7), R′ 201 in Formula (ca-r-1) to (ca-r-7) is a hydrogen atom, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent,

2 . A method of forming a resist pattern, comprising:

forming a resist film on a support using the resist composition according to claim 1 ;

exposing the resist film; and

developing the exposed resist film to form a resist pattern.

3 . A compound formed of an anion moiety and a cation moiety, which is represented by Formula (d0),

wherein a Log P value of the cation moiety is less than 7.7,

wherein M m+ represents an m-valent organic cation represented by Formula (ca-d0), m represents 1, R d0 represents a substituent, p represents an integer of 0 to 3, and in a case where p represents 2 or 3, a plurality of substituents as R d0 may be the same as or different from one another, q represents an integer of 0 to 3, n represents an integer of 2 or greater, where a relationship of “n+p≤(q×2)+5” is satisfied,

wherein R d1 represents an aryl group which may have a substituent; and R d2 and R d3 each independently represent an aryl group which may have a substituent or may be bonded to each other to form a ring with a sulfur atom in Formula (ca-d0); provided that when any of R d1 , R d2 and R d3 has a substituent represented by any of Formula (ca-r-1) to (ca-r-7), R′ 201 in Formula (ca-r-1) to (ca-r-7) is a hydrogen atom, a chain-like alkyl group which may have a substituent, or a chain-like alkenyl group which may have a substituent,

Assignments (1)

Priority Claims (1)

Continuity (1)

References Cited (9)