Cryogenic refrigeration for low temperature devices
An active cooling structure, comprising a non-superconducting layer, a superconducting layer, and an array of Superconductor-Insulator-Normal Metal (NIS) tunnel junctions. The non-superconducting layer may comprise a plurality of non-superconducting traces. The superconducting layer may comprise a plurality of superconducting traces. The array of Superconductor-Insulator-Normal Metal (NIS) tunnel junctions may be located between the plurality of non-superconducting traces and the plurality of superconducting traces.
1. An active cooling structure, comprising:
a non-superconducting layer comprising a plurality of non-superconducting traces;
a superconductor layer comprising a plurality of superconducting traces,
wherein the plurality of non-superconducting traces run orthogonal to the plurality of superconducting traces; and
a grid of Superconductor-Insulator-Normal Metal (NIS) tunnel junctions between the plurality of non-superconducting traces and the plurality of superconducting traces.
2. The active cooling structure of claim 1 , further comprising a first plurality of common pads that electrically connect the plurality of superconducting traces in parallel.
3. The active cooling structure of claim 2 , further comprising a second plurality of common pads that electrically connect the plurality of non-superconducting traces in parallel.
4. The active cooling structure of claim 1 , further comprising an insulator layer between the non-superconducting layer and the superconductor layer.
5. The active cooling structure of claim 4 , wherein:
the non-superconducting layer comprises silver;
the insulator layer comprises silicon dioxide; and
the superconductor layer comprises aluminum.
6. The active cooling structure of claim 4 , wherein:
the non-superconducting layer comprises silver;
the insulator layer comprises silicon dioxide; and
the superconductor layer comprises niobium.
7. The active cooling structure of claim 4 , wherein:
the non-superconducting layer comprises silver;
the insulator layer comprises hafnium dioxide; and
the superconductor layer comprises aluminum.
8. The active cooling structure of claim 4 , wherein:
the non-superconducting layer comprises silver;
the insulator layer comprises hafnium dioxide; and
the superconductor layer comprises niobium.
9. A quantum processor, comprising:
a first substrate, wherein the first substrate comprises a first surface and a second surface;
a plurality of qubits formed on the first substrate; and
an active cooling structure in thermal communication with the qubits, the active cooling structure comprising:
a non-superconducting layer;
a superconductor layer; and
an insulator layer between the non-superconducting layer and the superconductor layer;
wherein the plurality of qubits are formed on the first surface and the active cooling structure is formed on the second surface.
10. The quantum processor of claim 9 , wherein:
the non-superconducting layer comprises a plurality of non-superconducting traces;
the superconductor layer comprises a plurality of superconducting traces orthogonal to the plurality of non-superconducting traces; and
a grid of Superconductor-Insulator-Normal Metal (NIS) tunnel junctions formed between the plurality of non-superconducting traces and the plurality of superconducting traces.
11. The quantum processor of claim 9 , wherein the active cooling structure is adjacent to the plurality qubits.
12. The quantum processor of claim 9 , wherein the active cooling structure is between the plurality of qubits.
13. The quantum processor of claim 9 , wherein:
the non-superconducting layer consists essentially of a flat plane of non-superconducting material; and
the superconductor layer consists essentially of a flat plane of superconductor material.
14. The quantum processor of claim 9 , wherein:
the non-superconducting layer comprises a plurality of non-superconducting traces;
the superconductor layer comprises a plurality of superconducting traces orthogonal to the plurality of non-superconducting traces; and
a grid of Superconductor-Insulator-Normal Metal (NIS) tunnel junctions formed between the plurality of non-superconducting traces and the plurality of superconducting traces.
15. The quantum processor of claim 14 , wherein the active cooling structure further comprises:
a first plurality of common pads that electrically connects the plurality of superconducting traces in parallel; and
a second plurality of common pads that electrically connects the plurality of non-superconducting traces in parallel.
16. A quantum processor, comprising:
a first substrate;
a second substrates a plurality of qubits formed on the first substrate; and
an active cooling structure in thermal communication with the qubits, the active cooling structure comprising:
a non-superconducting layer;
a superconductor layer; and
an insulator layer between the non-superconducting layer and the superconductor layer;
wherein the plurality of qubits are formed on the first substrate and the active cooling structure is formed on the second substrate.
17. The quantum processor of claim 16 , wherein:
the first substrate comprises a first surface and a second surface;
the second substrate comprises a third surface and a fourth surface; and
the plurality of qubits are formed on the first surface of the first substrate and the active cooling structure is formed on the third surface of the second substrate.
18. The quantum processor of claim 17 , wherein the second surface is in contact with the fourth surface.
19. The quantum processor of claim 16 , further comprising a fluid channel between the first substrate and the second substrate.
20. The quantum processor of claim 16 , wherein:
the non-superconducting layer comprises a plurality of non-superconducting traces;
the superconductor layer comprises a plurality of superconducting traces orthogonal to the plurality of non-superconducting traces; and
a grid of Superconductor-Insulator-Normal Metal (NIS) tunnel junctions formed between the plurality of non-superconducting traces and the plurality of superconducting traces.