Transparent substrate with multilayer antireflective film containing an oxide of molybdenum
Provided is an antireflective-film attached transparent substrate having a luminous transmittance of 20% to 84% and a b* value of a transmission color being 5 or smaller under a D65 light source, in which the antireflective film has a luminous reflectance being 1% or lower and a sheet resistance being 10 4 Ω/□ or higher, and in which the antireflective film has a multilayer structure built up of at least two layers, at least one layer is constituted mainly of silicon oxide, and at least another layer is constituted mainly of a mixed oxide of at least one oxide of Mo and W and at least one oxide of Si, Nb, Ti, Zr, Ta, Al, Sn, and In, and has an extinction coefficient at 550 nm being in a range of 0.005 to 3.
1. An antireflective-film attached transparent substrate, comprising a transparent substrate having two principal surfaces and an antireflective film formed on one of the principal surfaces of the transparent substrate,
wherein the antireflective-film attached transparent substrate has a luminous transmittance being in a range of 20% to 84% and a b* value of a transmission color being 5 or smaller under a D65 light source,
wherein the antireflective film has a luminous reflectance being 1% or lower and a sheet resistance being 10 4 Ω/□ or higher,
wherein the antireflective film has a multilayer structure built up of at least two layers differing from each other in refractive index,
at least one layer of the layers in the multilayer structure is constituted mainly of silicon oxide, and
at least another layer of the layers in the multilayer structure is constituted mainly of a mixed oxide of group A, which is an oxide of Mo and at least one oxide selected from the group B consisting of oxides of Si, Nb, Ti, Zr, Ta, Al, Sn, and In, and has an extinction coefficient at a wavelength of 550 nm being in a range of 0.005 to 3.
2. The antireflective-film attached transparent substrate according to claim 1 , wherein the extinction coefficient at a wavelength of 550 nm of said at least another layer is in a range of 0.04 to 0.38.
3. The antireflective-film attached transparent substrate according to claim 1 , wherein the antireflective film has a sheet resistance of 10 8 Ω/□ or higher.
4. The antireflective-film attached transparent substrate according to claim 1 , wherein the transparent substrate is a resin film.
5. The antireflective-film attached transparent substrate according to claim 1 , further comprising an antifouling film on the antireflective film.
6. An image display device comprising the antireflective-film attached transparent substrate described in claim 1 .