Deep trench isolation and substrate connection on SOI
An apparatus includes a first trench formed in a semiconductor layer. The first trench has a first width and a first depth. A second trench is formed in the semiconductor layer. The second trench has a second width and a second depth. The first width is wider than the second width. A buried dielectric layer is disposed between a bottom semiconductor surface of the semiconductor layer and a substrate. The buried dielectric layer contacts a first bottom surface of the first trench. A liner dielectric is formed on the first bottom surface and a first sidewall of the first trench. A first layer is formed on the liner dielectric. A second layer is formed on the first layer and extends to the substrate through an opening formed on the first bottom surface.
1. An apparatus comprising:
a first trench formed in a semiconductor layer, the first trench comprising a first width and a first depth;
a second trench formed in the semiconductor layer, the second trench comprising a second width and a second depth, wherein the first width is wider than the second width and the second depth is measured along a first portion of a second sidewall and a second portion of the second sidewall;
a buried dielectric layer disposed between a bottom semiconductor surface of the semiconductor layer and a substrate, the buried dielectric layer contacting a first bottom surface of the first trench;
a liner dielectric formed on the first bottom surface, a first sidewall of the first trench, a second bottom surface of the second trench and the first portion of the second sidewall of the second trench, wherein the first portion extends from the second bottom surface of the second trench;
a first layer formed on the liner dielectric; and
a second layer formed on the first layer and extending to the substrate through an opening formed on the first bottom surface and the second layer formed on the second portion of the second sidewall, filling the second trench by the second width and spanning the second portion of the second sidewall.
2. The apparatus of claim 1 wherein the first depth of the first trench is equal to the second depth of the second trench, and the first layer formed on the liner dielectric in the second trench.
3. The apparatus of claim 1 wherein the second sidewall of the second trench contacts a shallow trench isolation disposed on a top semiconductor surface of the semiconductor layer.
4. The apparatus of claim 1 wherein the first depth of the first trench is equal to the second depth of the second trench and a buried conductive layer contacts the second portion of the second sidewall.
5. The apparatus of claim 4 wherein the second layer contacts a side portion of the first layer, wherein the first layer extends into the second portion of the second sidewall.
6. The apparatus of claim 1 wherein the second depth of the second trench is less than the first depth of the first trench, the second layer formed on the second bottom surface of the second trench and the second sidewall of the second trench, wherein the second bottom surface is separated from the buried dielectric layer by the semiconductor layer.
7. The apparatus of claim 6 wherein the second sidewall of the second trench is separated from the shallow trench isolation by the semiconductor layer.