Substrate comprising plasmonic continuous film with curved surface and manufacturing method thereof
A substrate including plasmonic continuous film with curved surface and a method for manufacturing the same. More particularly, a substrate for an ultrasensitive spectroscopic sensor includes bowl-shaped plasmonic curved nanodimples and spiked plasmonic nanotips formed at contact points between the nanodimples at the same time, thereby greatly increasing the total volume of hotspots and being capable of concentrating and analyzing an extremely small amount of a sample.
1. A substrate comprising:
a base substrate comprising bowl-curved-shaped nanodimples and spiked nanotips formed at contact points between the bowl-curved-shaped nanodimples; and
a plasmonic continuous film with a curved surface formed on the base substrate, the curved surface comprising plasmonic nanodimples formed over the bowl-curved-shaped nanodimples,
wherein a depth-to-radius ratio of each of the plasmonic nanodimples formed of the plasmonic continuous film is 1.5 or above,
wherein inclination angles of side surfaces of each of the bowl-curved-shaped nanodimples are in a range from 30 to 60 degrees.
2. The substrate of claim 1 , wherein an inclination angle of a side surface of each plasmonic nanodimple of the plasmonic continuous film is in a range from 30 to 60 degrees.
3. The substrate of claim 1 , wherein the base substrate is made of one or more selected from polymer, glass, silicon, and paper.
4. The substrate of claim 1 , wherein a depth-to-radius ratio of each of the bowl-curved-shaped nanodimples of the base substrate is 1.5 or above.
5. The substrate of claim 1 , wherein a surface density of each of the bowl-curved-shaped nanodimples of the base substrate is in a range from 30/μm 2 to 80/μm 2 .
6. The substrate of claim 1 , wherein a surface density of the spiked nanotips formed of the base substrate is in a range from 40/μm 2 to 90/μm 2 .
7. The substrate of claim 1 , wherein the bowl-curved-shaped nanodimples and the spiked nanotips are formed by ion beam treatment, plasma etching, soft lithography, nanoimprint lithography, or photo lithography.
8. The substrate of claim 1 , wherein a diameter of each plasmonic nanodimple of the plasmonic continuous film is in a range from 10 nm to 100 nm.
9. The substrate of claim 1 , wherein a surface density of the plasmonic nanodimples of the plasmonic continuous film is in a range from 30/μm 2 to 80/μm 2 .
10. The substrate of claim 1 , wherein the curved surface comprises plasmonic nanotips formed over the spiked nanotips of the base substrate, wherein a surface density of the plasmonic nanotips of the plasmonic continuous film is in a range from 40/μm 2 to 90/μm 2 .
11. The substrate of claim 1 , wherein a thickness of the plasmonic continuous film is 10 nm to 200 nm.
12. The substrate of claim 1 , wherein the plasmonic continuous film is formed by a vacuum deposition or a solution process.
13. The substrate of claim 1 , wherein the plasmonic continuous film is a metal-containing film.
14. The substrate of claim 13 , wherein the metal is Au, Ag, Cu, Al, Pt, Pd, Ti, Rd, Ru, or an alloy thereof.
15. The substrate of claim 13 , further comprising metal-containing nanoparticles formed on the metal-containing film.
16. The substrate of claim 13 , further comprising an insulating layer and an additional metal-containing film formed on the metal-containing film.
17. The substrate of claim 1 , wherein the bowl-curved-shaped nanodimples and spiked nanotips of the base substrate are made of polyethylene naphthalate (PEN).