Relief precursor having low cupping and fluting
A digitally imageable, photopolymerizable relief precursor at least comprising, arranged one above another in the order stated, (A) a dimensionally stable carrier; (AH) optionally, an adhesion-promoting layer; (B) a relief-forming layer, at least comprising a crosslinkable elastomeric binder, a first ethylenically unsaturated monomer, and a photoinitiator; (C) at least one interlayer, at least comprising a first, non-radically crosslinkable elastic polymer; (D) a laser-ablatable mask layer, at least comprising a second, non-radically crosslinkable elastic polymer, a UVA light-absorbing material, and an IR light-absorbing material; and optionally (E) a removable cover layer; characterized in that the layer (C) and optionally the layer (D) comprise at least one second ethylenically unsaturated monomer.
1. A digitally imageable, photopolymerizable relief precursor at least comprising, arranged one above another in the order stated,
(A) a dimensionally stable carrier;
(AH) optionally, an adhesion-promoting layer;
(B) a relief-forming layer, at least comprising a crosslinkable elastomeric binder, a first ethylenically unsaturated monomer, and a photoinitiator;
(C) at least one interlayer, at least comprising a first, non-radically crosslinkable elastic polymer;
(D) a laser-ablatable mask layer, at least comprising a second, non-radically crosslinkable elastic polymer, a UVA light-absorbing material, and an IR light-absorbing material; and optionally
(E) a removable cover layer;
characterized in that the layer (C) and optionally the layer (D) comprise at least one second ethylenically unsaturated monomer, and in that the concentration of the first ethylenically unsaturated monomer in layer (B) and the concentration of the second ethylenically unsaturated monomer in interlayer (C) differ by not more than ±2 wt %, based in each case on all the components of the layers (B) and (C) respectively.
2. The relief precursor as claimed in claim 1 , characterized in that the layer thickness S of the interlayer (C) is from 0.1 to 30 μm.
3. The relief precursor as claimed in claim 1 , characterized in that the first and second ethylenically unsaturated monomers are the same ethylenically unsaturated monomer.
4. The relief precursor as claimed in claim 1 , characterized in that the second ethylenically unsaturated monomer is present in the interlayer (C) in a concentration K which is the same as or lower than the concentration of the first ethylenically unsaturated monomer in the relief-forming layer (B).
5. The relief precursor as claimed in claim 1 , characterized in that the second ethylenically unsaturated monomer is present in the interlayer (C) in a concentration K of 0.1 to 25 wt %, based on all the components of the interlayer (C).
6. The relief precursor as claimed in claim 1 , characterized in that the ratio of the layer thickness S of the interlayer (C) in μm to the concentration K of the first ethylenically unsaturated monomer in wt % is from 30:0.1 to 0.1:25 μm/wt %.
7. The relief precursor as claimed in claim 1 , characterized in that the first and second ethylenically unsaturated monomers have at least 2 ethylenically unsaturated groups and a molecular weight of less than 600 g/mol.
8. The relief precursor as claimed in claim 1 , characterized in that the first elastic, non-radically crosslinkable polymer has a solubility parameter of 15 to 26 (MPa) 1/2 .
9. The relief precursor as claimed in claim 1 , characterized in that the first and second elastic, non-radically crosslinkable polymers have a solubility parameter of 15 to 26 (MPa) 1/2 .
10. The relief precursor as claimed in claim 1 , characterized in that the first elastomeric, non-radically crosslinkable polymer in interlayer (C) has an oxygen permeability of less than or equal to 1.5*10 5 cm 3 *μm/(m 2 *d*bar).
11. The relief precursor as claimed in claim 1 , characterized in that the first elastomeric, non-radically crosslinkable polymer in interlayer (C) has an oxygen permeability of greater than 1.5*10 5 cm 3 *μm/(m 2 *d*bar).
12. The relief precursor as claimed in claim 1 , characterized in that the interlayer (C) comprises the first elastomeric, non-radically crosslinkable polymer in a concentration of 60 to 99 wt %, based on all the components of the interlayer (C).
13. The relief precursor as claimed in claim 1 , characterized in that the interlayer (C) comprises particles having a particle size of 0.2 to 30 μm.
14. The relief precursor as claimed in claim 1 , characterized in that the interlayer (C) comprises particles in a concentration of 0.5 to 35 wt %, based on all the components of the interlayer (C).
15. The relief precursor as claimed in claim 13 , characterized in that the particles comprise the second ethylenically unsaturated monomer.
16. The relief precursor as claimed in claim 1 , characterized in that between the relief-forming layer (B) and the interlayer (C) or between the interlayer (C) and the mask layer (D) it comprises a further layer (F) which is impermeable to oxygen.
17. The relief precursor as claimed in claim 16 , characterized in that the layer (F) comprises a second ethylenically unsaturated monomer.
18. The relief precursor as claimed in claim 1 , characterized in that the mask layer (D) comprises a second ethylenically unsaturated monomer.
19. A digitally imageable, photopolymerizable relief precursor at least comprising, arranged one above another in the order stated,
(A) a dimensionally stable carrier;
(AH) optionally, an adhesion-promoting layer;
(B) a relief-forming layer, at least comprising
a crosslinkable elastomeric binder,
a first ethylenically unsaturated monomer, and
a photoinitiator;
(C) at least one interlayer, at least comprising
a first, non-radically crosslinkable elastic polymer;
(D) a laser-ablatable mask layer, at least comprising
a second, non-radically crosslinkable elastic polymer,
a UVA light-absorbing material, and
an IR light-absorbing material; and optionally
(E) a removable cover layer;
characterized in that
the layer (C) comprises at least
a second ethylenically unsaturated monomer, and
in that the concentration of the first ethylenically unsaturated monomer in layer (B) and the concentration of the second ethylenically unsaturated monomer in interlayer (C) differ by not more than ±2 wt %, based in each case on all the components of the layers (B) and (C) respectively; and
in that the first elastic, non-radically crosslinkable polymer has a solubility parameter of 15 to 27 (MPa) 1/2 to allow the second ethylenically unsaturated monomer to be dissolved in layer (C).
20. A digitally imageable, photopolymerizable relief precursor at least comprising, arranged one above another in the order stated,
(A) a dimensionally stable carrier;
(AH) optionally, an adhesion-promoting layer;
(B) a relief-forming layer, at least comprising
a crosslinkable elastomeric binder,
a first ethylenically unsaturated monomer, and
a photoinitiator;
(C) at least one interlayer, at least comprising
a first, non-radically crosslinkable elastic polymer;
(D) a laser-ablatable mask layer, at least comprising
a second, non-radically crosslinkable elastic polymer,
a UVA light-absorbing material, and
an IR light-absorbing material; and optionally
(E) a removable cover layer;
characterized in that
the layer (C) comprises at least
a second ethylenically unsaturated monomer, and in that the concentration of the first ethylenically unsaturated monomer in layer (B) and the concentration of the ethylenically unsaturated monomer in interlayer (C) differ by not more than ±2 wt %, based in each case on all the components of the layers (B) and (C) respectively; and in that
the first, non-radically crosslinkable elastic polymer is chosen from hydrolyzed polyvinyl acetates having a degree of hydrolysis of 30 to 80 mol %, ethylene-vinyl acetate copolymers, ethylene-vinyl alcohol copolymers, ethylene-vinyl acetate-vinyl alcohol copolymers, cyclic acetals of polyvinyl alcohol, copolymers containing two or more different vinyl acetal units selected from vinyl formal, vinyl ethyral, vinyl propyral, and vinyl butyral units.