IP Library Granted Patent US 11,713,375
Granted Patent B2
US 11,713,375 · App. 16/759,566 · Granted Aug 1, 2023

Barrier material formation composition, barrier material, production method for barrier material, product, and production method for product

Inventors: Tomohiko Kotake (Tokyo, JP); Tatsuya Makino (Tokyo, JP); Yuta Akasu (Tokyo, JP)
Assignee: RESONAC CORPORATION
C08G77/398C08G77/18C08G77/38C08G77/58C08G79/10C08J5/18C09D183/04
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Quick Facts
Patent No.
US 11,713,375
App. No.
16/759,566
Granted
Aug 1, 2023
Kind
B2
Abstract

The present invention provides a barrier material formation composition comprising a silane oligomer, at least a part of the silane oligomer being modified with a metal alkoxide.

Claims (22)

1. A barrier material formation composition comprising a silane monomer selected from the group consisting of alkyltrialkoxysilane, aryltrialkoxysilane, and tetraalkoxysilane, and an oligomer of silane,

at least a part of the oligomer of silane being modified with a metal alkoxide, and the oligomer of silane having a silicon atom bonded to three oxygen atoms,

wherein the content of the silane monomer is 100 parts by mass or less relative to 100 parts by mass of the oligomer of silane.

2. The composition according to claim 1 , wherein the ratio of the total number of silicon atoms bonded to three oxygen atoms each and silicon atoms bonded to four oxygen atoms each relative to the total number of silicon atoms in the oligomer of silane is 50% or more.

3. The composition according to claim 1 , wherein the silane monomer contains a silicon atom bonded to three or four oxygen atoms.

4. The composition according to claim 1 , wherein the metal alkoxide is an aluminum alkoxide.

5. A production method for a barrier material formation composition, comprising:

a first step of providing an oligomer of silane oligomer with at least a part thereof modified with a metal alkoxide; and

a second step of mixing the oligomer of silane and a silane monomer selected from the group consisting of alkyltrialkoxysilane, aryltrialkoxysilane, and tetraalkoxysilane to obtain a barrier material formation composition,

wherein the content of the silane monomer is 100 parts by mass or less relative to 100 parts by mass of the oligomer of silane.

6. The production method according to claim 5 , wherein the first step comprises a step of causing a reaction between an oligomer of silane and a metal alkoxide to modify at least a part of the oligomer of silane with the metal alkoxide.

7. The production method according to claim 5 , wherein the first step comprises a step of causing a reaction between a silane monomer and a metal alkoxide to form an oligomer of silane with at least a part thereof modified with the metal alkoxide.

8. A production method for a barrier material, comprising a step of heating the barrier material formation composition according to claim 1 to form a barrier material.

9. A production method for a product having a moisture resistant treated member comprising:

a first step of applying the barrier material formation composition according to claim 1 to a member; and

a second step of heating the applied composition to form a barrier material on the member.

10. A production method for a product having a first member and a second member joined to the first member, and a moisture resistant treated joint between the first member and the second member, the production method comprising:

a first step of disposing the barrier material formation composition according to claim 1 between a first member and a second member; and

a second step of heating the composition to form a barrier material to join the first member to the second member via the barrier material.

11. A production method for a product having a moisture resistant member, the production method comprising:

a first step of heating the barrier material formation composition according to claim 1 to make a moisture resistant member having a barrier material; and

a second step of putting a plurality of members including the moisture resistant member together.

Assignments (4)
CHANGE OF ADDRESS Recorded Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →
CHANGE OF NAME Recorded Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
CHANGE OF NAME Recorded Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 5, 2020
From: KOTAKE, TOMOHIKO; MAKINO, TATSUYA; AKASU, YUTA
To: HITACHI CHEMICAL COMPANY, LTD.
Reel/Frame 052848/0801 →