Display panel with a thermal insulation layer, manufacturing method thereof, and display apparatus
A display panel may include a substrate ( 12 ), a bank layer ( 14 ) on the substrate ( 12 ), and a thermal insulation layer on the bank layer( 14 ). The bank layer ( 14 ) defines a plurality of pixel areas (PA) on the substrate ( 12 ). The thermal insulation layer ( 20 ) may have a low thermal conductivity of about 0.01W/mk to about 0.5 W/mK. The thermal insulation layer ( 20 ) may be a porous thermal insulation layer.
1. An organic light emitting diode (OLED) display panel, comprising:
a substrate;
a bank layer on the substrate, the bank layer defining a plurality of pixel areas on the substrate; and
a thermal insulation layer on the bank layer;
wherein
the OLED display panel further includes a modification layer on the thermal insulation layer, a main electrode on the modification layer, and an auxiliary electrode on the main electrode.
2. The OLED display panel of claim 1 ,
wherein the thermal insulation layer has a thermal conductivity of about 0.01 W/mk to about 0.5 W/mK.
3. The OLED display panel of claim 1 , wherein the thermal insulation layer is porous.
4. The OLED display panel of claim 3 , wherein the thermal insulation layer has porosity in a range of about 5% to about 15%.
5. The OLED display panel of claim 1 , wherein the thermal insulation layer comprises one or more selected from the group consisting of hypercrosslinked porous organic polymers; polymers comprising an aromatic repeating unit having a chloromethyl group; polymers comprising a repeating unit having a benzyl alcohol group; porous cellulose triacetate and derivatives thereof, polyetherimides, and polyimides.
6. The OLED display panel of claim 1 , wherein the bank layer and the thermal insulation layer are made of a same material.
7. The OLED display panel of claim 1 , wherein the thermal insulation layer has a thickness in a range of about 0.2 μm to about 10 μm.
8. The OLED display panel of claim 1 , wherein the auxiliary electrode is of a grid structure.
9. The OLED display panel of claim 1 , wherein the modification layer comprises an electron transport layer and/or an electron injection layer.
10. The OLED display panel of claim 1 , further comprising a pixel electrode, a light emitting layer, the modification layer, and the main electrode sequentially on the substrate in at least one of the plurality of pixel areas.
11. A method of forming an organic light emitting diode (OLED) display panel, comprising:
providing a substrate;
forming a bank layer on the substrate, the bank layer defining a plurality of pixel areas on the substrate; and
forming a thermal insulation layer on the bank layer;
wherein
forming the thermal insulation layer on the bank layer includes:
coating a layer of porous thermal insulation material on the bank layer to form a porous thermal insulation layer.
12. The method of forming the OLED display panel of claim 11 , wherein
the thermal insulation layer has a thermal conductivity of about 0.01 W/mk to about 0.5 W/mK.
13. The method of forming the OLED display panel of claim 11 , wherein forming the thermal insulation layer on the bank layer comprises:
depositing a layer of organic resin doped with carbon elements on the bank layer; and
irradiating the layer of organic resin with UV light,
wherein the carbon elements in the layer of organic resin are oxidized by ozone generated by a interaction of UV light with oxygen to form carbon dioxide, thereby forming a porous thermal insulation layer.
14. The method of forming the OLED display panel of claim 11 , further comprising:
forming a modification layer on the thermal insulation layer;
forming a main electrode on the modification layer; and
forming an auxiliary electrode on the main electrode.
15. The method of forming the OLED display panel of claim 14 , wherein forming the auxiliary electrode on the main electrode comprises:
forming a grid composed of metal solution on the main electrode;
performing a first curing of the grid composed of metal solution at a first temperature to form a first metal grid; and
performing a second curing of the first metal grid at a second temperature by applying a low frequency alternating current to the first metal grid while the substrate is maintained to be at a third temperature lower than the second temperature during the second curing to form the auxiliary electrode.
16. The method of forming the OLED display panel of claim 15 , wherein the low frequency alternating current is applied to the first metal grid in a first direction and a second direction, respectively, during the second curing, the first direction being different from the second direction.
17. The method of forming the OLED display panel of claim 15 , wherein the second temperature is in a range from about 90° C. to about 170° C. and the first temperature is in a range from about 80° C. to about 100° C.
18. The method of forming the OLED display panel of claim 15 , wherein the low frequency alternating current has a frequency in a range from about 50 Hz to about 60 Hz and the third temperature is about room temperature.
19. The method of forming the OLED display panel of claim 15 , wherein the metal solution comprises one or more selected from the group consisting of silver particle, silver nitrate, gold particle, copper particle, or an alloy containing indium, tin, antimony, and/or zinc.
20. The method of forming the OLED display panel of claim 14 , wherein resistance of the auxiliary electrode is less than 1Ω/□.